Preparing a metrologically-relevant entangled state includes: providing a plurality of atoms in a regular lattice, wherein each atom is in an initial quantum state of a first state in a ground state manifold; initializing a central atom in the regular lattice to a (|0+|1)/?2 state while all other atoms remain in the first state |0 as remaining atoms; and proceeding, starting with the central atom, to propagate preparation of Greenberger-Horne-Zeilinger (GHZ) states in a nonlinear progression by increasing a number of GHZ states in each iteration through the remaining atoms in a recursive manner, to produce an intermediate GHZ state, such that the intermediate GHZ state acts as an initial GHZ state for a next iteration, until a final GHZ state is formed to prepare the metrologically-relevant entangled state of the atoms.

The invention concerns an apparatus (50) for measuring the polarization of an electromagnetic radiation (100) in the Extreme Ultraviolet, comprising a source (200) of said radiation (100) and a polarimeter (10) on which said radiation (100) is incident. The polarimeter (10) can be configured at least to detect the polarization angle of the radiation (100) and, possibly, to calculate the degree of polarization. The invention also concerns a method for using said apparatus (50).

A quantum computing system, method and computer readable medium involve a vacuum chamber, an atom source input associated with the vacuum chamber, a Photonic Integrated Circuit (PIC) having an interaction region configured to interact with an atom from the atom source, a coupling location for atom positioning, a trapping laser for trapping the atom in the coupling location, an excitation laser for manipulating an electronic state or a nuclear state of the atom, a waveguide for guiding input light to the coupling location, and an output channel for directing quantum light generated at the coupling location, out of the vacuum chamber as a resource for quantum computing. The coupling location is associated with the PIC, and the interaction region of the PIC is arranged for at least partial exposure to the vacuum.

An EUV light source serves for generating a usable output beam of EUV illumination light for a projection exposure apparatus for projection lithography. The light source has an EUV generation device which generates an EUV raw output beam. The latter is circularly polarized. For the purposes of setting the polarization of the usable output beam and in respect of the polarization direction, a polarization setting device has a linearly polarizing effect on the raw output beam. This results in an EUV light source, which provides an improved output beam for a resolution-optimized illumination.

An EUV light source serves for generating a usable output beam of EUV illumination light for a projection exposure apparatus for projection lithography. The light source has an EUV generation device which generates an EUV raw output beam. The latter is circularly polarized. For the purposes of setting the polarization of the usable output beam and in respect of the polarization direction, a polarization setting device has a linearly polarizing effect on the raw output beam. This results in an EUV light source, which provides an improved output beam for a resolution-optimized illumination.

An apparatus for generating electromagnetic radiation comprises a polarizable or magnetizable medium. A polarization or magnetisation current can be generated, in a controlled manner, whose distribution pattern has an accelerated motion, so that non-spherically decaying and intense spherically decaying components of electromagnetic radiation can be generated. The coordinated motion of aggregates of charged particles can give rise to extended electric charges and currents. The charged distribution patterns can propagate with a phase speed exceeding the speed of light in vacuo and that, once created, such propagating charged patterns act as sources of electromagnetic fields in precisely the same way as any other moving sources of these fields. That the distribution patterns of these sources travel faster than light is not, of course, in any way incompatible with the requirements of special relativity. The superluminally moving charged pattern is created by the coordinated motion of aggregates of subluminally moving particles.

An apparatus for generating electromagnetic radiation comprises a polarizable or magnetizable medium. A polarization or magnetisation current can be generated, in a controlled manner, whose distribution pattern has an accelerated motion, so that non-spherically decaying and intense spherically decaying components of electromagnetic radiation can be generated. The coordinated motion of aggregates of charged particles can give rise to extended electric charges and currents. The charged distribution patterns can propagate with a phase speed exceeding the speed of light in vacuo and that, once created, such propagating charged patterns act as sources of electromagnetic fields in precisely the same way as any other moving sources of these fields. That the distribution patterns of these sources travel faster than light is not, of course, in any way incompatible with the requirements of special relativity. The superluminally moving charged pattern is created by the coordinated motion of aggregates of subluminally moving particles.

An optics-integrated confinement apparatus is provided. The optics-integrated confinement apparatus includes a first substrate, a plurality of electrical components formed on the first substrate, and an on-chip beam delivery system. The plurality of electrical components define a confinement apparatus configured/operable to confine one or more quantum objects. The on-chip beam delivery system includes a waveguide, a coupler, and an optical element. The coupler is configured to couple an optical beam out of the waveguide and toward the optical element. The optical element is configured to modify a polarization of the optical beam and direct the optical beam toward a target location defined by the optics-integrated confinement apparatus.

An optics-integrated confinement apparatus is provided. The optics-integrated confinement apparatus includes a first substrate, a plurality of electrical components formed on the first substrate, and an on-chip beam delivery system. The plurality of electrical components define a confinement apparatus configured/operable to confine one or more quantum objects. The on-chip beam delivery system includes a waveguide, a coupler, and an optical element. The coupler is configured to couple an optical beam out of the waveguide and toward the optical element. The optical element is configured to modify a polarization of the optical beam and direct the optical beam toward a target location defined by the optics-integrated confinement apparatus.

An apparatus for generating electromagnetic radiation comprises a polarizable or magnetizable medium. A polarization or magnetisation current can be generated, in a controlled manner, whose distribution pattern has an accelerated motion, so that non-spherically decaying and intense spherically decaying components of electromagnetic radiation can be generated. The coordinated motion of aggregates of charged particles can give rise to extended electric charges and currents. The charged distribution patterns can propagate with a phase speed exceeding the speed of light in vacuo and that, once created, such propagating charged patterns act as sources of electromagnetic fields in precisely the same way as any other moving sources of these fields. That the distribution patterns of these sources travel faster than light is not, of course, in any way incompatible with the requirements of special relativity. The superluminally moving charged pattern is created by the coordinated motion of aggregates of subluminally moving particles.