An indium phosphide substrate, a method of inspecting thereof and a method of producing thereof are provided, by which an epitaxial film grown on the substrate is rendered excellently uniform, thereby allowing improvement in PL characteristics and electrical characteristics of an epitaxial wafer formed using this epitaxial film. The indium phosphide substrate has a first main surface and a second main surface, a surface roughness Ra1 at a center position on the first main surface, and surface roughnesses Ra2, Ra3, Ra4, and Ra5 at four positions arranged equidistantly along an outer edge of the first main surface and located at a distance of 5 mm inwardly from the outer edge. An average value m1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.5 nm or less, and a standard deviation 1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.2 nm or less.

A jig for inspecting a display module, the display module including a display module body and a lug, the jig including a bottom plate and a cover plate, the cover plate operatively covering the bottom plate; the bottom plate being provided with a first flat portion and the cover plate being provided with a second flat portion, wherein the bottom plate is provided with a first concave portion surrounded by the first flat portion, and/or the cover plate provided with a second concave portion surrounded by the second flat portion, the first concave portion and/or the second concave portion form(s) a receiving area for the display module body, and the first flat portion and the second flat portion are configured to clamp the lug.

The present invention provides a method for shape error in-situ measurement of toruses, and is realized based on a system for shape error in-situ measurement of large-scale toruses. The system for in-situ measurement comprises an attitude adjusting part, a rotating part and a measuring part. The attitude adjusting part comprises an attitude adjusting platform, an attitude adjusting platform motor and an adapter panel; the rotating part comprises a rotating index plate base and a high-precision rotating index plate; and the measuring part comprises a sensor clamp, sensor holders, contact sensors and associated equipment. The present invention realizes the application of the three-point method in shape error measurement of the torus, also realizes algorithm improvement of the three-point method in realizing shape error in-situ measurement of the torus, can realize shape error in-situ measurement of the torus, can greatly reduce the processing time of the part and can reduce the influence of repeated clamping on part precision.

Disclosed is a system for shape error in-situ measurement of large-scale torus, which comprises an attitude adjusting part, a rotating part and a measuring part. The attitude adjusting part comprises an attitude adjusting platform, an attitude adjusting platform motor and an adapter panel, wherein the attitude adjusting platform can adjust the rotation angles along z-axis and x-axis, the angle adjusted is controlled by the attitude adjusting platform motor, and the attitude adjusting part is connected with the rotating part through the adapter panel; the rotating part comprises a rotating index plate base and a high-precision rotating index plate which is released from fixation by a lever for rotating, rotated manually for a required angle, and then fixed again by restoring the lever; the measuring part comprises a sensor clamp, sensor holders, contact sensors and associated equipment, wherein the sensor clamp is positioned with the rotating index plate by a mandrel and then fixed by two bolts and nuts; and the sensor clamp has four groups of sensor jacks in total, with at least three jacks in each group, and a sensor holder is installed in each sensor jack and used for fixing each sensor.

A sensor roller for determining planarity errors and/or for determining the tension of a strip tangentially engaging the roller has a roller body rotatable about an axis, having an outer surface, and formed with a plurality of radially outwardly open recesses axially spaced on the surface. Rigid sensor bodies each in a respective one of the recess each have an outer surface generally flush with the outer surface of the roller body. Each sensor body forms with a side surface of the respective recess a peripheral circumferentially fully extending gap. Respective force-measuring sensors in the recesses are each braced between a respective one of the sensor bodies and the roller body radially inward of the respective sensor body. An annular weld seam of welding compound is formed in each of the gaps

A flange checking apparatus for performing on-site flange run-out checks on the flange surface includes a hub structure, a plurality of support legs, a measuring arm, and a transmission. The plurality of support legs mounted radially around a hub structure selectively fastens the flange checking apparatus adjacent to the flange. A measuring arm measures the flange surface for imperfections. A transmission transmits a rotational input to a rotational output which causes the measuring arm to rotate in a circular path over the flange surface. An adjustable clamp mounted terminally to a leg body of the plurality of support legs forms a friction bond with the flange. A surface variation indicator mounted terminally to the measuring arm travels over the flange and inspects microscopic variations on the flange surface. A guiding mechanism guides that measuring arm along a fixed circular path around the flange.

A flatness detector includes a positioning plate, a positioning assembly arranged on a top surface of the positioning plate, a dial indicator arranged on the positioning assembly, and a sliding block. The positioning assembly includes a first positioning rod and a second positioning rod perpendicularly coupled together and pin-jointed. The dial indicator includes a detecting post maintained as a plumb line by the positioning assembly. The sliding block defines a groove for conforming to the detecting post. A measurement value of the dial indicator is obtained when the groove of the sliding block is conformed to the detecting post.

To provide a process for producing a cylindrical target which has almost no distortion in the longitudinal direction. The process for producing a cylindrical target according to the present invention comprises the steps of: processing a target material into a cylindrical shape; providing an adapter for attachment to a sputtering apparatus, in the target material processed into the cylindrical shape; and measuring a straightness in a longitudinal direction of an appearance of the target material having the adapter to confirm whether the straightness of the target material having the adapter is within a predetermined range.

Disclosed is a wheel flange planeness detection device, comprising a frame, a lifting cylinder, a lifting platform, guide posts, a support frame, a servo motor, a bearing seat, a shaft, a bearing, a rotating platform, guide rails, a sliding block, a small chain wheel, a large chain wheel, a clamping cylinder, a chain wheel driving motor, a left sliding plate, rotating shafts, rotating wheels, a visual sensor, clamping guide rails, gear rack structures, a right sliding plate, intelligent dial indicators, a support plate, a linear motor and a motor support. The device may monitor the state of flange planeness in an automatic production line in real time; when the flange planeness is out of tolerance, the device may immediately give an alarm, and the technologist adjusts the machining process in time after receiving the alarm, thereby avoiding a large batch of rejects.

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.