Patent classifications
G01B9/02049
TESTING APPARATUS AND TESTING METHOD
Disclosed are a testing apparatus and a testing method. When the testing apparatus is used to test a sample (11) to be tested, a first detection apparatus (21) and a second detection apparatus (22) can be switched by means of an objective lens switching apparatus (20), so as to acquire height information and structure information of the sample (11) to be tested. In the process, the sample (11) to be tested does not need to be transferred between testing apparatuses, thus, not only is pollution potentially created in the process of transferring the sample (11) to be tested avoided, and the probability of the sample (11) to be tested being polluted in the testing process reduced, but also a region to be tested of the sample (11) to be tested does not need to be determined repeatedly, improving the testing speed for the sample (11) to be tested.
FIVE-DEGREE-OF-FREEDOM HETERODYNE GRATING INTERFEROMETRY SYSTEM
A five-degree-of-freedom heterodyne grating interferometry system comprises: a single-frequency laser for emitting single-frequency laser light, the single-frequency laser light can be split into a reference light beam and a measurement light beam; an interferometer lens set and a measurement grating for converting the reference light and the measurement light into a reference interference signal and a measurement interference signal; and multiple optical fiber bundles, respectively receiving the measurement interference signal and the reference interference signal, wherein each optical fiber bundle has multiple multi-mode optical fibers respectively receiving interference signals at different positions on the same plane. The measurement system is not over-sensitive to the environment, is small and light, and is easy to arrange. Six-degree-of-freedom ultra-precision measurement can be achieved by arranging multiple five-degree-of-freedom interferometry systems and using redundant information, thereby meeting the needs of a lithography machine workpiece table for six-degree-of-freedom position and orientation measurement.
OPTICAL MODULE
An optical module includes a mirror unit and a beam splitter unit. The mirror unit includes a base with a main surface, a movable mirror, a first fixed mirror, and a drive unit. The beam splitter unit constitutes a first interference optical system for measurement light along with the movable mirror and the first fixed mirror. A mirror surface of the movable mirror and a mirror surface of the first fixed mirror follow a plane parallel to the main surface and face one side in a first direction perpendicular to the main surface. The movable mirror, the drive unit, and at least a part of an optical path between the beam splitter unit and the first fixed mirror are disposed in an airtight space.
STITCHING-MEASUREMENT DEVICE AND STITCHING-MEASUREMENT METHOD
Disclosed is a stitching-measurement device adapted for performing stitching-measurement on a surface of a concave spherical lens, including: an interferometer, a reference lens, a first plane mirror, a second plane mirror, a first adjustment mechanism, a second adjustment mechanism, a concave spherical object to be measured, a motion table and a control mechanism, the first plane mirror being mounted on the first adjustment mechanism configured to change a position of the first plane mirror; the second plane mirror being mounted on the second adjustment mechanism configured to change a position of the second plane mirror; the concave spherical object to be measured being placed on the motion table configured to change a position of the concave spherical object to be measured; the control mechanism communicating with the interferometer, the first adjustment mechanism, the second adjustment mechanism, and the motion table for issuing control signals, wherein by the first adjustment mechanism and the second adjustment mechanism, an included angle between the first plane mirror and the second plane mirror is adjusted in such a way that light beam incident on the concave spherical object to be measured is inclined by a first angle relative to light beam emitted from the reference lens, thereby avoiding an operation of inclining the concave spherical object to be measured during the stitching-measurement.
Systems, methods, and media for multiple reference arm spectral domain optical coherence tomography
In some embodiments, systems, methods, and media for multiple reference arm spectral domain optical coherence tomography are provided which, in some embodiments, includes: a sample arm coupled to a light source; a first reference arm having a first path length; a second reference arm having a longer second path length; a first optical coupler that combines light from the sample arm and the first reference arm; a second coupler that combines light from the sample arm and the second reference arm; and an optical switch comprising: a first input port coupled to the first optical coupler; a second input coupled to the second coupler via an optical waveguide that induces a delay at least equal to an acquisition time of an image sensor; and an output coupled to the image sensor.
MICRO OPTIC ASSEMBLIES AND OPTICAL INTERROGATION SYSTEMS
Example embodiments include an optical assembly for an optical interrogation system having a single core or a multicore sensing fiber, a measurement fiber to couple light into the sensing fiber, and a reference fiber arranged with the measurement fiber as part of an optical interferometer. A beam splitter combines light from the sensing fiber and with light from the reference fiber. A polarization beam splitting prism separates the combined light into first polarized light and second polarized light that is orthogonal to the first polarized light. The optical assembly can substantially reduce the size, complexity, or cost associated with the traditional optical components in an optical interrogation system that it replaces. Other example optical assemblies are described. Embodiments describe optical interrogation systems using the example optical assemblies.
Optical module
An optical module includes a mirror unit and a beam splitter unit. The mirror unit includes a base with a main surface, a movable mirror, a first fixed mirror, and a drive unit. The beam splitter unit constitutes a first interference optical system for measurement light along with the movable mirror and the first fixed mirror. A mirror surface of the movable mirror and a mirror surface of the first fixed mirror follow a plane parallel to the main surface and face one side in a first direction perpendicular to the main surface. The movable mirror, the drive unit, and at least a part of an optical path between the beam splitter unit and the first fixed mirror are disposed in an airtight space.
TOOL ARCHITECTURE FOR WAFER GEOMETRY MEASUREMENT IN SEMICONDUCTOR INDUSTRY
A semiconductor equipment architecture WGT for wafer shape and flatness measurement is disclosed. The semiconductor equipment architecture WGT includes a reflective air-bearing chuck and a hybrid wafer thickness gauge. Also disclosed are the corresponding methods of measuring wafer shape and flatness using the architecture, the air-bearing chuck and the hybrid wafer thickness gauge.
LASER INTERFERENCE DEVICE
A laser interference device includes: a measurement mirror being movable in an X direction; a reference mirror disposed at a position different from a position of the measurement mirror in a Y direction; a beam splitter having a splitting surface that divides a laser beam into a measurement light and a reference light; a first light guide configured to guide the measurement light incident from the beam splitter and emit the measurement light toward the measurement mirror; and a second light guide configured to guide the reference light incident from the beam splitter and emit the reference light toward the reference mirror, in which a first distribution path formed by the first light guide and a second distribution path formed by the second light guide are mutually equal in a mechanical path length and an optical path length.
SUBSTRATE HOLDER FOR USE WITH INTERFEROMETER
A substrate holder for use with an interferometer comprises a first and second support each comprising a bearing land and a bearing base arranged to form a bearing pocket and a gas inlet fluidly coupled to the bearing pocket. The first support and the second support are positioned relative to one another such that the first bearing pocket is opposed to the second bearing pocket thereby forming a measurement cavity between the first support and the second support. At least one of the first support and the second support comprises reference optics through which one or more interferometric or optical measurements can be taken. Gas supplied to the first bearing pocket and gas supplied to the second bearing pocket form an air bearing in the measurement cavity for supporting a substrate in the measurement cavity without contact between the substrate, the first support, and the second support.