G01B9/02097

METROLOGY FOR ADDITIVE MANUFACTURING

3D metrology techniques are disclosed for determining a changing topography of a substrate processed in an additive manufacturing system. Techniques include fringe scanning, simultaneous fringe projections, interferometry, and x-ray imaging. The techniques can be applied to 3D printing systems to enable rapid topographical measurements of a 3D printer powder bed, or other rapidly moving, nearly continuous surface to be tested. The techniques act in parallel to the system being measured to provide information about system operation and the topography of the product being processed. A tool is provided for achieving higher precision, increasing throughput, and reducing the cost of operation through early detection and diagnosis of operating problems and printing defects. These techniques work well with any powder bed 3D printing system, providing real-time metrology of the powder bed, the most recently printed layer, or both without reducing throughput.

Defect detection device

[PROBLEM] To provide a defect detection device capable of detecting not only a defect within a visible range but also a defect outside the visible range among the objects to be inspected. [SOLUTION] A defect detection device 10 includes: an excitation source 11 capable of being placed at any position on a surface of an inspection target object S, the excitation source 11 being configured to excite an elastic wave within the inspection target object S, the elastic wave being predominant in one vibration mode and propagating in a predetermined direction; an illumination unit (pulsed laser light source 13, illumination light lens 14) configured to perform stroboscopic illumination on an illumination area of the surface of the inspection target object by using a laser light source; a displacement measurement unit (speckle shearing interferometer 15) configured to collectively measure a displacement of each point in a front-back direction within the illumination area in at least three different phases of the elastic wave, by speckle interferometry or speckle shearing interferometry; and a reflected wave/scattered wave detector 16 configured to detect either one or both of a reflected wave and a scattered wave of the elastic wave, based on the displacement measured by the displacement measurement unit.

SCANNING SELF-MIXING INTERFEROMETRY SYSTEM AND SENSOR

Self-mixed interferometer (SMI) devices and techniques are described for measuring depth and/or velocity of objects. The SMI devices and techniques may be used for eye-tracking. A light source of an SMI sensor emits coherent light that is directed to a target location with a scanning module. One or more SMI signals are measured. The one or more SMI signals are generated by the SMI sensor in response to feedback light received from the target location. The feedback light is a portion of the coherent light that illuminated the target location.

Surface quality sensing using self-mixing interferometry
11460293 · 2022-10-04 · ·

An electronic device is described. The electronic device includes a housing, a set of one or more SMI sensors attached to the housing, and a processor. The set of one or more SMI sensors includes a set of one or more electromagnetic radiation emitters having a set of one or more resonant cavities and configured to emit a set of one or more beams of electromagnetic radiation. The set of one or more SMI sensors also includes a set of one or more detectors configured to generate indications of self-mixing within the set of one or more resonant cavities. The processor is configured to characterize, using the indications of self-mixing, an optical field speckle of a target. The processor is also configured to characterize, using the characterization of the optical field speckle, a surface quality of the target.

Surface quality sensing using self-mixing interferometry
11460293 · 2022-10-04 · ·

An electronic device is described. The electronic device includes a housing, a set of one or more SMI sensors attached to the housing, and a processor. The set of one or more SMI sensors includes a set of one or more electromagnetic radiation emitters having a set of one or more resonant cavities and configured to emit a set of one or more beams of electromagnetic radiation. The set of one or more SMI sensors also includes a set of one or more detectors configured to generate indications of self-mixing within the set of one or more resonant cavities. The processor is configured to characterize, using the indications of self-mixing, an optical field speckle of a target. The processor is also configured to characterize, using the characterization of the optical field speckle, a surface quality of the target.

Two-Dimensional Second Harmonic Dispersion Interferometer
20220091032 · 2022-03-24 ·

An interferometer having a fundamental beam generator, a first second harmonic generator, a waveplate, a second second harmonic generator, a harmonic separator, and a polarizing beam splitter, mounted uniaxially, (i.e., the components are aligned along one optical axis), wherein the interferometer is adapted to change a diameter of a beam to match a diameter of a sample, and to change the diameter of the beam back to its original diameter.

Surface Quality Sensing Using Self-Mixing Interferometry
20220099436 · 2022-03-31 ·

An electronic device is described. The electronic device includes a housing, a set of one or more SMI sensors attached to the housing, and a processor. The set of one or more SMI sensors includes a set of one or more electromagnetic radiation emitters having a set of one or more resonant cavities and configured to emit a set of one or more beams of electromagnetic radiation. The set of one or more SMI sensors also includes a set of one or more detectors configured to generate indications of self-mixing within the set of one or more resonant cavities. The processor is configured to characterize, using the indications of self-mixing, an optical field speckle of a target. The processor is also configured to characterize, using the characterization of the optical field speckle, a surface quality of the target.

APPARATUS, METHOD AND SYSTEM FOR GENERATING A FOVEATED IMAGE

The present disclosure relates to an apparatus, method and system for generating a foveated image. According to the present disclosure, an apparatus for generating a foveated image, the apparatus may comprise a communicator configured to transmit and receive a signal and a processor configured to control the communicator, wherein the processor distinguishes objects comprised in a hologram, which is generated for a front field of view by using input light, selects an object to be targeted among the distinguished objects, and generates a foveated image by using depth information of the targeted object.

COMPRESSED ULTRAFAST IMAGING VELOCITY INTERFEROMETER SYSTEM FOR ANY REFLECTOR

The present disclosure provides a compressed ultrafast imaging velocity interferometer system for any reflector, comprising a light source and target system, an etalon interference system, a compressed ultrafast imaging system, a timing control system and a data processing system. An imaging device in the traditional imaging velocity interferometer system for any reflector is replaced by a compressed ultrafast imaging system, a compressed ultrafast Photography (CUP) is introduced in an imaging process, multi-frame images, i.e. three-dimensional images for two-dimensional space and one-dimensional time, are reconstructed via a single measurement by a CUP-VISAR two-dimensional ultrafast dynamic image imaging, a complete dynamic process of a two-dimensional interference fringes image is restored, and spatiotemporal evolution information of a shock wave is effectively acquired, improving an imaging performance of the imaging velocity interferometer system for any reflector in dimension, and achieving a goal that could not be achieved before.

Retro-reflective interferometer
11092478 · 2021-08-17 · ·

There is provided retro-reflective interferometer device for detection and/or measurement of displacements and/or rotations and/or mechanical vibrations, the device includes a transceiver unit including at least one radiation source capable of emitting a radiation beam and at least one radiation receiver; a movable unit movably mounted with respect to said transceiver unit, the movable unit includes one or more movable elements that are susceptible to displacement and/or vibration by an external force; and at least one retro-reflective element capable of reflecting back the radiation beam to form a sequence of radiation patterns; and an analyzing element operationally associated with the radiation receiver for analyzing a displacement change, an intensity change and/or a frequency change in the sequence of radiation patterns. Further provided are systems including the device and methods utilizing the same.