An optical displacement sensor comprises a reflective surface and one or more diffraction gratings which, together with the reflective surface, each define a respective interferometric arrangement. The reflective surface is moveable relative to the diffraction grating(s) or vice versa. Light from a light source propagates via the interferometric arrangement(s) to produce an interference pattern at a respective set of photo detectors. Each interference pattern depends on the separation between the reflective surface and the respective grating. A collimating optical arrangement at least partially collimates the light between the light source and the diffraction grating(s). For the or each interferometric arrangement, when the reflective surface or the diffraction grating is in a zero-displacement position, the optical path length L of the light propagating between the diffraction grating and the reflective surface satisfies the relationship:

[00001]$L=\frac{T_{z}n}{2},$

to within 20% of

[00002]$\frac{T_z}{2},$

where n is an integer; where T.sub.z is the Talbot length, defined by:

[00003]$T_z=\frac{}{1-\sqrt{1-\frac{{}^2}{p^2}}},$

where is the wavelength of the light, and where p is the grating period of the respective diffraction grating.

A self-mixing interferometry sensor module, comprising a light emitter (LE), a detector unit (DU) and an optical element (OE), wherein the light emitter (LE) is operable to emit coherent electromagnetic radiation towards an external object (ET) to be placed outside the sensor module and undergo self-mixing interference, SMI, caused by reflections of the emitted electromagnetic radiation from the external object back inside the sensor module. The detector unit (DU) is operable to generate output signals indicative of an optical power output of the light emitter (LE) due to the SMI. The optical element (OE) is aligned with respect to the light emitter (LE) such that a first fraction of electromagnetic radiation is directed towards the external target (ET) or the light emitter (LE) and a second fraction of electromagnetic radiation is directed towards the detector unit (DU). An optical power ratio determined by the first and second fractions meets a pre-determined value.

A self-mixing interferometry sensor module, comprising a light emitter (LE), a detector unit (DU) and an optical element (OE), wherein the light emitter (LE) is operable to emit coherent electromagnetic radiation towards an external object (ET) to be placed outside the sensor module and undergo self-mixing interference, SMI, caused by reflections of the emitted electromagnetic radiation from the external object back inside the sensor module. The detector unit (DU) is operable to generate output signals indicative of an optical power output of the light emitter (LE) due to the SMI. The optical element (OE) is aligned with respect to the light emitter (LE) such that a first fraction of electromagnetic radiation is directed towards the external target (ET) or the light emitter (LE) and a second fraction of electromagnetic radiation is directed towards the detector unit (DU). An optical power ratio determined by the first and second fractions meets a pre-determined value.

Systems and methods for improved interferometric imaging are presented. One embodiment is a partial field frequency-domain interferometric imaging system in which a light beam is scanned in two directions across a sample and the light scattered from the object is collected using a spatially resolved detector. The light beam could illuminate a spot, a line or a two-dimensional area on the sample. Additional embodiments with applicability to partial field as well as other types of interferometric systems are also presented.

Systems and methods for improved interferometric imaging are presented. One embodiment is a partial field frequency-domain interferometric imaging system in which a light beam is scanned in two directions across a sample and the light scattered from the object is collected using a spatially resolved detector. The light beam could illuminate a spot, a line or a two-dimensional area on the sample. Additional embodiments with applicability to partial field as well as other types of interferometric systems are also presented.

A semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. The control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. The illumination unit and/or the optical unit may include a polarizer and a compensator having a ? wave plate.

A semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. The control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. The illumination unit and/or the optical unit may include a polarizer and a compensator having a ? wave plate.

Systems and methods for improved interferometric imaging are presented. One embodiment is a partial field frequency-domain interferometric imaging system in which a light beam is scanned in two directions across a sample and the light scattered from the object is collected using a spatially resolved detector. The light beam could illuminate a spot, a line or a two-dimensional area on the sample. Additional embodiments with applicability to partial field as well as other types of interferometric systems are also presented.

Systems and methods for improved interferometric imaging are presented. One embodiment is a partial field frequency-domain interferometric imaging system in which a light beam is scanned in two directions across a sample and the light scattered from the object is collected using a spatially resolved detector. The light beam could illuminate a spot, a line or a two-dimensional area on the sample. Additional embodiments with applicability to partial field as well as other types of interferometric systems are also presented.

An interferometer includes a first interferometer arm and a second interferometer arm. A first central beam, originating from a central image point of an image, passes through the first interferometer arm. A second central beam, originating from the central image point, passes through the second interferometer arm. The first central beam and the second central beam are superimposed and generate a k.sub.perpendicular=0 interference at a superposition point. A first light beam perpendicular to the first central beam, originating from an image point of the image, passes through the first interferometer arm. A second light beam perpendicular to the second central beam, originating from the image point, passes through the second interferometer arm. The first light beam and the second light beam overlap at the superposition point. At the superposition point, a wave vector component of the first light beam opposes a wave vector component of the second light beam.