The present invention provides a reflective condensing interferometer for focusing on a preset focus. The reflective condensing interferometer includes a concave mirror set, a convex mirror, a light splitting element, and a reflecting element. The concave mirror set has first and second concave surface portions which are oppositely located on two sides of a central axis passing through the preset focus and are concave on a surface facing the central axis and the preset focus. Light is preset to be incident in parallel to the central axis in use. The convex mirror is disposed between the concave mirror set and the preset focus on the central axis, and is convex away from the preset focus. The light splitting element vertically intersects with the central axis between the convex mirror and the preset focus. The reflecting element is disposed between the light splitting element and the convex mirror.

A measurement system is provided for use in optical metrology measurements. The measurement system comprises a control system which processes raw measured data indicative of spectral interferometric signals measured on a sample in response to illuminating electromagnetic field incident onto a top portion of the sample and comprising at least one spectral range to which said sample is substantially not absorbing. The processing comprises: extracting, from the raw measured data, a portion of spectral interferometric signals describing signal intensity variation with change of optical path difference during interferometric measurements, the extracted signal portion being independent of interferometric signals returned from a bottom portion of the sample in response to said illuminating electromagnetic field; and directly determining, from said extracted portion, both spectral amplitude and phase of reflection of the electromagnetic field from the top portion of the sample, thereby determining measured spectral signature characterizing the SA, SC, SD, SE, SG, SK, SL, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, WS, ZA, ZM, ZW.

A fast measurement method for micro-nano deep groove structure based on white light interference, including: establishing a white light interference system, using the white light interference system to measure the structure of the groove, the CCD camera collects and obtains multiple groups of groove interferograms and the serial number corresponding to each groove interferogram in each group; processing each group of groove interferograms of the groove sample to obtain the maximum contrast of each group of groove interferograms and the 3D reconstruction diagram of the local structure; extracting the interface reconstruction diagram in the 3D reconstruction diagram of the local structure according to each group of the groove interferograms; after splicing the interface reconstruction diagrams corresponding to all groups of groove interferograms, obtaining a 3D structural reconstruction diagram of the groove sample, and measuring the depth and width of the groove sample according to the 3D structural reconstruction diagram.

A metrology frame configured to receive and secure a workpiece in preparation for an interferometric determination of a spatial profile of the workpiece with the use of one or more retroreflectors removably cooperated with the frame in known pre-determined spatial relationship with respect the fiducial features of not only the workpiece but those of the metrology frame itself The metrology frame is necessarily devoid of a holographic optical element, while the measurement apparatus containing such metrology frame employs a hologram configured to generate at least one alignment optical wavefront that spatially converges on the retroreflector. The hologram is preferably structured as a set of constituent holographic regions (contained in the same, unitary or spatially-complementary housing and/or substrate) that perform different but operationally-complementary functions to facilitate the alignment of the metrology frame with respect to the converging optical wavefront with or without the workpiece in the frame. The optical measurement system employing the metrology frame and the hologram. Methods of optical alignment with use of same.

The invention relates to the field of interferometry, in particular to Fizeau interferometers for improving a contrast of an interferogram. The Fizeau interferometer comprises a light source, a reference surface, a test surface positioned in on a support of the Fizeau interferometer and an imaging system. The Fizeau interferometer utilizes a polarizing reference surface to improve the contrast of the interferogram. The invention further relates to a method for using the Fizeau interferometer of the invention for improving contrast of an interferogram obtained by the Fizeau interferometer.

A metrology system including a heterodyne light source is provided. The heterodyne light source includes a first light source, an acousto-optic modulator and a source optical arrangement. The acousto-optic modulator receives at least one wavelength laser beam from the first light source and generates at least one corresponding frequency shifted laser beam (e.g., with orthogonal polarization). The source optical arrangement includes a receiving optical element portion and a birefringent optical element portion. The receiving optical element portion receives the wavelength laser beam(s) and the corresponding frequency shifted laser beam(s) and directs the beams along an optical path toward the birefringent optical element portion. The birefringent optical element portion combines the beams to output a combined beam (e.g., which may be utilized as part of a measurement process to determine at least one measurement distance to at least one surface point on a workpiece, etc.).

Systems and methods for unwrapping a phase map are disclosed. Such systems and methods may include receiving a wrapped phase map associated with an interferometric measurement of a sample including patterned features; removing a tilt from the wrapped phase map; generating a background; detecting features in the wrapped phase, the features in the wrapped phase map corresponding to least some of the patterned features of the sample; replacing phases of the features with the background at corresponding locations in the wrapped phase map; unwrapping the modified wrapped phase map using a global phase-unwrapping; applying local phase-unwrapping to restore the phases of the features; and reapplying the tilt to generate an output unwrapped phase map.

A low-coherence Fizeau interferometer includes a first beamsplitter, a test arm and a reference arm, the first beamsplitter splits light into a first portion of light directed to the test arm and a second portion of light directed to the reference arm, and an imaging arm comprising a first collimating lens, a flat reference surface, and a test element. The test arm focuses the first portion of light at a first focal point, such that a virtual image of the first focal point appears at a focal point of the test element. The reference arm focuses the second portion of light at a second focal point, the first collimating lens collimates the light that then reflects off the flat reference surface. The second beamsplitter directs the first portion of light to reflect off the test element. The reflection of the first and second portion of light form an interference pattern.

The invention describes a metrology system allowing for the reduction of the errors caused by vibration of the production floor and allowing for measurements of the thickness of wafers in motion. This is accomplished by performing simultaneous measurements of spectra containing interference signals containing distance information using a plurality of probes positioned on both sides of the measured wafer on the same detector at the same time or by means of plurality of synchronized detectors. System is also able to measure thickness of the individual optically accessible layers present in the sample.

A polarization-separated, phase-shifted interferometer can generate interferograms without moving parts. It uses a phase shifter, such as an electro-optic phase modulator, to modulate the relative phase between sample and reference beams. These beams are transformed into orthogonal polarization states (e.g., horizontally and vertically polarized states) and coupled via a common path (e.g., polarization-maintaining fiber) to a polarizing beam splitter (PBS), which sends them into separate sample and reference arms. Quarter-wave plates in the sample and reference arms rotate the polarization states of the sample and reference beams so they are coupled out of the PBS to a detector via a 45° linear polarizer. The polarizer projects the aligned polarization components of the sample and reference beams onto the detector, where they interfere with known relative phase to produce an output that can be used to map surface topography of the test object.