G01B11/303

Planar waveguide apparatus with diffraction element(s) and system employing same

A waveguide apparatus includes a planar waveguide and at least one optical diffraction element (DOE) that provides a plurality of optical paths between an exterior and interior of the planar waveguide. A phase profile of the DOE may combine a linear diffraction grating with a circular lens, to shape a wave front and produce beams with desired focus. Waveguide apparati may be assembled to create multiple focal planes. The DOE may have a low diffraction efficiency, and planar waveguides may be transparent when viewed normally, allowing passage of light from an ambient environment (e.g., real world) useful in AR systems. Light may be returned for temporally sequentially passes through the planar waveguide. The DOE(s) may be fixed or may have dynamically adjustable characteristics. An optical coupler system may couple images to the waveguide apparatus from a projector, for instance a biaxially scanning cantilevered optical fiber tip.

DEVICE AND METHOD FOR CHARACTERISING THE ROUGHNESS PROFILE OF A TISSUE SAMPLE

The invention describes a device (1) for characterizing the rough profile of a tissue sample comprising: a laser source (2) that illuminates the surface (100) of the tissue; a photodetector (3) that receives the light backscattered by the surface (100) of the tissue; and further a displacement means (4) configured to alternate between a first position wherein a rotating ground glass (5) is disposed within the path of the laser beam towards the surface (100), a second position wherein a rotating half wave blade (6) is disposed within the path of the laser beam towards the surface (100); and a third position wherein within the path of the laser beam towards the surface (100) neither the ground glass plate (5) nor the half wave blade (6) are arranged, or the half wave blade (6) is arranged in a fixed non-rotating position.

Method and apparatus for real time, in situ sensing and characterization of roughness, geometrical shapes, geometrical structures, composition, defects, and temperature in three-dimensional manufacturing systems
11465240 · 2022-10-11 · ·

Methods and apparatuses for manufacturing are disclosed, including (a) providing an apparatus having: a laser; scanner; powder injection system; powder spreading system; dichroic filter; imager-and-processor; and computer; (b) programming the computer with specifications of a sample; (c) using the computer to set initial parameters based on the sample specifications; (d) adjusting a stage to position the sample; (e) focusing and scanning electromagnetic radiation onto the sample while powder is concurrently injected onto the sample in order to deposit a layer; (f) capturing two-dimensional images of the sample and probing the sample to determine whether the deposited layer was manufactured per the specifications; (g) use the computer to adjust the three-dimensional manufacturing parameters based on the determination made in step (f) prior to additively manufacturing a subsequent layer or making repairs; and (h) repeating steps (d), (e), (f), and (g) until the manufacture is complete. Other embodiments are described and claimed.

Surface topography measurement apparatus and method

Apparatus and methods for measuring surface topography are described. The analysis apparatus and methods detect light reflected from the reflective backside of a cantilever assembly including a tip, calculate a background level (BGL) value obtained from an optical scan of a reference sample using a power spectral density (PSD) value obtained from a topographical scan of a reference sample to generate a correlational coefficient between the BGL and the PSD values. The correlational coefficient between the BGL and PSD values is used to measure the BGL value of additional EUV mask blanks by a topographical scan of the EUV mask blanks using the same tip mounted to the cantilever.

Rapid effective case depth measurement of a metal component using physical surface conditioning
11625844 · 2023-04-11 · ·

A method for determining an effective case depth of a metal component includes forming a conditioned core surface by blasting or shot peening an exposed surface of the metal component with blast media. The exposed surface is a contiguous exposed surface of the case and core. The method includes measuring surface texture, compressive stresses, or another suitable characteristic of the conditioned core surface using a surface metrology sensor, and identifying a case-core boundary using the measured characteristic, including identifying a location at which a predetermined difference or gradient in the characteristic is present within the exposed surface. The method also includes measuring the effective case depth as a perpendicular distance between a reference surface of the case and the case-core boundary.

WAFER INSPECTION METHOD AND APPARATUS THEREOF

The disclosure provides a wafer inspection method and wafer inspection apparatus. The method includes: receive scanning information of at least one wafer, wherein the scanning information includes a plurality of haze values; the scanning information is divided into a plurality of information blocks according to the unit block, and the feature value of each the plurality of information blocks is calculated according to the plurality of haze values included in each the plurality of information blocks; and converting the feature value into a color value according to the haze upper threshold and the haze lower threshold, and generating the color value corresponding to the at least one wafer according to the converted color value according to the feature value, the color graph displays the texture content of the at least one wafer.

LASER DEVICE AND METHOD OF USING THE SAME
20230155341 · 2023-05-18 ·

Some implementations described herein provide a laser device. The laser device includes a first portion of the laser device, at a proximal end of the laser device, that includes one or more optical devices, where the first portion is configured to emit first electromagnetic waves having a first wavelength. The laser device includes a second portion of the laser device, at a distal end of the laser device, that includes an optical crystal configured to receive the first electromagnetic waves and to emit second electromagnetic waves having a second wavelength based on reception of the first electromagnetic waves, where the optical crystal includes a thin film coating disposed on an end of the optical crystal, the thin film coating configured to: support emission of the second electromagnetic waves from the optical crystal, and support internal reflection of the first electromagnetic waves within the optical crystal.

Systems, methods, and apparatus for tracking location of an inspection robot

Systems, methods, and apparatus for tracking location of an inspection robot are disclosed. An example apparatus for tracking inspection data may include an inspection chassis having a plurality of inspection sensors configured to interrogate an inspection surface, a first drive module and a second drive module, both coupled to the inspection chassis. The first and second drive module may each include a passive encoder wheel and a non-contact sensor positioned in proximity to the passive encoder wheel, wherein the non-contact sensor provides a movement value corresponding to the first passive encoder wheel. An inspection position circuit may determine a relative position of the inspection chassis in response to the movement values from the first and second drive modules.

Non-contact process for engine deposit layer measurement

Systems and processes are provided for measuring carbon deposits on an engine. In some examples, a light source can be transmitted through a viewing window of an engine onto an area of an internal surface of the engine and reflected back through the viewing window and detected using an optical sensor. A topography of the area can be determined based, at least in part, on the reflected light source detected by the optical sensor and used to determine whether carbon deposits have increased, decreased, or remained constant on the area.

METHOD AND SYSTEM FOR MEASURING A SURFACE TOPOGRAPHY OF AN OBJECT
20230204339 · 2023-06-29 ·

A method for measuring the surface topography of an object including the following steps: a) providing source radiation and dividing the source radiation into illumination radiation and reference radiation, b) illuminating the surface of the object with illumination radiation in a planar illumination field, the surface of the object being illuminated simultaneously with more than one spatial radiation mode and the radiation modes of the illumination being spatially and temporally coherent, but with a fixed phase difference from one another, and c) overlaying the reference radiation on illumination radiation back-scattered at the surface of the object, and detecting an interference signal of the overlaid radiation with a detector. Steps a) to c) are carried out for at least two different, fixed wavelengths. The surface topography of the object is determined by means of digital holography.