A rotation-rate sensor having a substrate, the rotation-rate sensor having a drive structure that is movable in relation to the substrate, the drive structure being attached to the substrate by a spring system, the spring system having a first spring component that connects the drive structure and the substrate, and a second spring component that connects the drive structure and the substrate, the first spring component and the second spring component being connected by an intermediate piece, wherein the intermediate piece includes a first edge bar and a second edge bar, a group of connecting bars being configured between the first and second edge bar, the connecting bars of the group of connecting bars each being disposed at an opening angle of between 1° and 89° on the first and/or second edge bar.

A rotation-rate sensor having a substrate, the rotation-rate sensor having a drive structure that is movable in relation to the substrate, the drive structure being attached to the substrate by a spring system, the spring system having a first spring component that connects the drive structure and the substrate, and a second spring component that connects the drive structure and the substrate, the first spring component and the second spring component being connected by an intermediate piece, wherein the intermediate piece includes a first edge bar and a second edge bar, a group of connecting bars being configured between the first and second edge bar, the connecting bars of the group of connecting bars each being disposed at an opening angle of between 1° and 89° on the first and/or second edge bar.

First reinforcement stripes are formed on a process surface of a base substrate. A first epitaxial layer covering the first reinforcement stripes is formed on the first process surface. Second reinforcement stripes are formed on the first epitaxial layer. A second epitaxial layer covering the second reinforcement stripes is formed on exposed portions of the first epitaxial layer. Semiconducting portions of transistor cells are formed in or portions of micro electromechanical structures are formed from the second epitaxial layer.

A vibration gyroscope includes: a mass part supported to be displaceable in a first direction and a second direction; an exciter vibrating the mass part in the first direction; and a detector detecting a displacement amount of the mass part in the second direction. The first direction and the second direction are orthogonal to each other. A resonance frequency of the mass part in the first direction coincides with a resonance frequency of the mass part in the second direction. A Q-factor of vibration of the mass part in the second direction is smaller than a Q-factor of vibration of the mass part in the first direction.

A vibration gyroscope includes: a mass part supported to be displaceable in a first direction and a second direction; an exciter vibrating the mass part in the first direction; and a detector detecting a displacement amount of the mass part in the second direction. The first direction and the second direction are orthogonal to each other. A resonance frequency of the mass part in the first direction coincides with a resonance frequency of the mass part in the second direction. A Q-factor of vibration of the mass part in the second direction is smaller than a Q-factor of vibration of the mass part in the first direction.

A three-axis rotation rate sensor including a substrate and a double rotor. The double rotor includes a first rotor and a second rotor which are elastically connected to one another via a first coupling element so that the two rotors are excitable to rotary oscillations in phase opposition. The first rotor includes a first seismic mass and a second seismic mass that are deflectably supported with respect to the first rotor, and the second rotor includes a third seismic mass and a fourth seismic mass that are deflectably supported with respect to the second rotor. The first mass is connected to the third mass via a first rocker element so that upon a lateral deflection of the first mass, the third mass is deflected in a direction opposite the lateral deflection of the first mass.

A three-axis rotation rate sensor including a substrate and a double rotor. The double rotor includes a first rotor and a second rotor which are elastically connected to one another via a first coupling element so that the two rotors are excitable to rotary oscillations in phase opposition. The first rotor includes a first seismic mass and a second seismic mass that are deflectably supported with respect to the first rotor, and the second rotor includes a third seismic mass and a fourth seismic mass that are deflectably supported with respect to the second rotor. The first mass is connected to the third mass via a first rocker element so that upon a lateral deflection of the first mass, the third mass is deflected in a direction opposite the lateral deflection of the first mass.

A bulk acoustic wave resonator apparatus includes a resonator member, at least one anchor structure coupling the resonator member to a substrate, and a comb-drive element connected to the resonator member. The comb-drive element includes first comb fingers protruding from the resonator member, and second comb fingers of a different material than the first comb fingers interdigitated with the first comb fingers to define sub-micron capacitive gaps therebetween. Respective sidewalls of the first comb fingers are oppositely-tapered relative to respective sidewalls of the second comb fingers along respective lengths thereof, such that operation of the comb-drive element varies the sub-micron capacitive gaps at the respective sidewalls thereof. Respective tuning electrodes, which are slanted at respective angles parallel to an angle of respective sidewalls of the resonator member, may also be provided for quadrature tuning between different resonance modes of the resonator member. Related devices and fabrication methods are also discussed.

Columnar multi-axis microelectromechanical systems (MEMS) devices (such as gyroscopes) balanced against undesired linear and angular vibration are described herein. In some embodiments, the columnar MEMS device may comprise at least two multiple-mass columns, each having at least three proof masses and being configured to sense rotation about a respective axis. The motion and mass of the proof masses may be controlled to achieve linear and rotational balancing of the MEMS device. The columnar MEMS device may further comprise one or more modular drive structures disposed alongside each multiple-mass column to facilitate displacement of the proof masses of a respective column. The MEMS devices described herein may be used to sense roll, yaw, and pitch angular rates.

Columnar multi-axis microelectromechanical systems (MEMS) devices (such as gyroscopes) balanced against undesired linear and angular vibration are described herein. In some embodiments, the columnar MEMS device may comprise at least two multiple-mass columns, each having at least three proof masses and being configured to sense rotation about a respective axis. The motion and mass of the proof masses may be controlled to achieve linear and rotational balancing of the MEMS device. The columnar MEMS device may further comprise one or more modular drive structures disposed alongside each multiple-mass column to facilitate displacement of the proof masses of a respective column. The MEMS devices described herein may be used to sense roll, yaw, and pitch angular rates.