A method for monitoring flow of a medium by means of a pressure difference measuring device and a Coriolis mass flowmeter having two oscillators, which comprise, in each case, a bent measuring tube pair, which are arranged on top of one another and connected for parallel flow between the two pressure measuring points of the pressure difference measuring device, comprising steps as follows: Registering a pressure difference between the first pressure measuring point and the second pressure measuring point; registering a first density measured value based on at least a first oscillation frequency of the first oscillator; registering a second density measured value based on at least a second oscillation frequency of the second oscillator; ascertaining a flow measured value based on the pressure difference, when a difference between the first density measured value and the second density measured value is less than a density difference limit value.

Described is apparatus housing an instrumented device and an inner tube providing a fluid flow path therethrough. A strain gauge is on the outer surface of the inner tube. Bulkhead(s) transfers forces from an external housing to the inner tube to be detected by the strain gauge. Flow sensors measure fluid flow velocity and/or fluid flow volume rate. Pressure sensors sense pressure differential between an inlet side and an outlet side of the apparatus. Sensors provide for measurement of RPM, WOB, azimuth and rate of penetration. Communication means (such as a Wi Fi transceiver) and/or GPS device can communicate through EM transparent windows. The apparatus is used aboveground axially in-line in a drill string.

A substrate processing system includes a chamber group including chambers configured to process a substrate in a desired process gas, a gas box group including gas boxes configured to supply the process gas to each of the chambers, a flow rate measuring device configured to measure a flow rate of the process gas supplied from the gas box group, and an exhaust device connected to the chamber group and the flow rate measuring device. The flow rate measuring device includes a measuring instrument and a measurement pipe connected to the gas box group and the measuring instrument and configured to flow the process gas through the gas box group and the measuring instrument. The measurement pipe includes branch pipes connected to each of the gas boxes, a main pipe connected to each of the branch pipes and the measuring instrument, and branch pipe valves provided in the branch pipes.

A substrate processing system includes a chamber group including chambers configured to process a substrate in a desired process gas, a gas box group including gas boxes configured to supply the process gas to each of the chambers, a flow rate measuring device configured to measure a flow rate of the process gas supplied from the gas box group, and an exhaust device connected to the chamber group and the flow rate measuring device. The flow rate measuring device includes a measuring instrument and a measurement pipe connected to the gas box group and the measuring instrument and configured to flow the process gas through the gas box group and the measuring instrument. The measurement pipe includes branch pipes connected to each of the gas boxes, a main pipe connected to each of the branch pipes and the measuring instrument, and branch pipe valves provided in the branch pipes.

A flow rate of a gas is determined based on a predetermined relational expression including, as parameters: the flow rate of the gas; diameter and length of a hole; upstream and downstream pressures; and temperature, molecular weight, viscosity coefficient, and specific heat ratio of the gas. Additionally, setting conditions for a type and temperature of the gas, the length of the hole, and the pressures upstream and downstream from the hole are set; the relational expression is used to obtain the correspondence relationship between the diameter of the hole and the flow rate of the gas flowing through the hole; an approximation function approximating the obtained correspondence relationship is determined; the flow rate of a gas passing through a test piece having a hole of an unknown diameter is measured; and the diameter of the hole is estimated, based on the measured flow rate and the approximation function.

A flow rate of a gas is determined based on a predetermined relational expression including, as parameters: the flow rate of the gas; diameter and length of a hole; upstream and downstream pressures; and temperature, molecular weight, viscosity coefficient, and specific heat ratio of the gas. Additionally, setting conditions for a type and temperature of the gas, the length of the hole, and the pressures upstream and downstream from the hole are set; the relational expression is used to obtain the correspondence relationship between the diameter of the hole and the flow rate of the gas flowing through the hole; an approximation function approximating the obtained correspondence relationship is determined; the flow rate of a gas passing through a test piece having a hole of an unknown diameter is measured; and the diameter of the hole is estimated, based on the measured flow rate and the approximation function.

Disclosed herein are various techniques and devices for detecting a level of fluid within a fluid collection receptacle. These techniques and devices may further determine a flow rate of fluid entering the fluid collection receptacle or a volume of fluid collected within the fluid collection receptacle. Sensors, including pressure sensors, may be installed in, on, or within the fluid collection receptacle to detect information about the liquid within the receptacle including fluid level, flow rate, and volume.

Disclosed herein are various techniques and devices for detecting a level of fluid within a fluid collection receptacle. These techniques and devices may further determine a flow rate of fluid entering the fluid collection receptacle or a volume of fluid collected within the fluid collection receptacle. Sensors, including pressure sensors, may be installed in, on, or within the fluid collection receptacle to detect information about the liquid within the receptacle including fluid level, flow rate, and volume.

A sensor and method for use in measuring a physical characteristic of a fluid in a microfluidic system is provided. A microfluidic chip has a thin deformable membrane that separates a microfluidic channel from a microwave resonator sensor. The membrane is deformable in response to loading from interaction of the membrane with the fluid. Loading may be fluid pressure in the channel, or shear stress or surface stress resulting from interaction of the membrane with the fluid. The deformation of the membrane changes the permittivity in the region proximate the sensor. A change in permittivity causes a change in the electrical parameters of the sensor, thereby allowing for a characteristic of the fluid, such as flow rate, or a biological or chemical characteristic, to be measured. Also, a microwave sensor with improved sensitivity for characterizing a fluid in a microfluidic channel is provided. The sensor has a rigid and very thin layer, for example in the range of 10 um to 100 um, in the microfluidic chip allowing for the positioning of the sensor very close to the microfluidic channel, which enables very high resolution sensing.

A flow sensor includes a fluid chamber configured to receive a fluid. A diaphragm assembly is configured to be displaced whenever the fluid within the fluid chamber is displaced. A transducer assembly is configured to monitor the displacement of the diaphragm assembly and generate a signal based, at least in part, upon the quantity of fluid displaced within the fluid chamber.