Patent classifications
G01F15/002
Flow rate adjusting device
Provided is a flow rate adjusting device including: an ultrasonic flow metering portion; a flow rate adjusting portion; a control portion configured to control the flow rate adjusting portion so that the flow rate of the fluid measured by the ultrasonic flow metering portion matches a set value; a pressure sensor configured to measure a pressure of the fluid flowing into an upstream side of a measurement flow channel from an inflow port; and a storage portion configured to store information that associates the flow rate of the fluid obtained from the propagation time difference measured by the ultrasonic flow metering portion, the set value of the target flow rate, and the pressure measured by the pressure sensor with each other when the control portion controls the flow rate adjusting portion.
System and method for improved indicated flow in mass flow controllers
A mass flow controller and associated methods for providing indicated flow from the mass flow controller are disclosed. The method may include obtaining a measured flow signal indicative of a mass flow rate of a fluid that is controlled by the mass flow controller and filtering the measured flow signal to generate indicated flow that provides a representation of the actual mass flow rate of the fluid. The indicated flow is provided to an operator of the mass flow controller, and a rate of change of the mass flow rate of the fluid is determined based upon samples of the measured flow signal. A time constant used in connection with the filtering is then adjusted based upon the rate of change of the mass flow rate.
SUBSTRATE PROCESSING SYSTEM AND METHOD OF DETERMINING FLOW RATE OF GAS
A substrate processing system according to an exemplary embodiment includes a substrate processing apparatus and a measurement apparatus. The substrate processing apparatus includes a gas supply unit. The gas supply unit includes a flow rate controller and a secondary valve. The secondary valve is connected to a secondary side of the flow rate controller. The secondary valve is opened when a voltage is output from a first controller of the substrate processing system through a wiring. The measurement apparatus measures the flow rate of the gas output from the flow rate controller according to the instruction from the first controller. The measurement apparatus includes a second controller. The measurement apparatus includes a relay provided on the wiring. The second controller is configured to control the relay.
Method for determining the flow rate of combustible fluid injected into a combustion chamber without an additional orifice plate
A method for determining the flow rate of combustible fluid injected into a combustion chamber (120) of a turbine (100) includes determining the cross section of the orifice of the at least one injector (112, 113, 114, 115) through which the combustible fluid is injected into the combustion chamber (120). The pressure of the combustible fluid upstream of the orifice of the injector (112, 113, 114, 115) is determined. The pressure downstream of the orifice of the injector (112, 113, 114, 115) is determined. The flow rate of combustible fluid flowing through the orifice of the at least one injector (112, 113, 114, 115) is determined.
FLOW CONTROL SYSTEM, METHOD, AND APPARATUS
A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The second flow component mounting region has a second inlet port, a second outlet port, and a first auxiliary port.
Mass flow controller
A control means configured to perform flow rate control in which the control means outputs a control signal to a flow control valve to control a valve opening such that a measured flow rate of gas measured by a flow meter matches a set flow rate adjusts intensity of the control signal such that an absolute value of a change amount of the valve opening becomes larger as measured temperature of the gas measured by a thermometer becomes further higher than reference temperature, while the absolute value of the change amount of the valve opening becomes smaller as the measured temperature becomes further lower than the reference temperature. Thereby, change of response time on changing the valve opening of the flow control valve due to the difference between the measured temperature of the gas and the reference temperature can be reduced.
Systems and Methods for Reference Volume for Flow Calibration
A reference volume for use with pressure change flow rate measurement apparatus has an internal structure comprising elements with cross section and length comparable to the cross section and length of adjacent interstitial fluid regions. The reference volume may have one or more heat conduction elements exterior to and in good thermal contact with a corrosion resistant material that defines the internal fluid holding region.
Apparatus and Methods for Self-Correcting Pressure Based Mass Flow Controller
A self-correcting pressure-based mass flow control apparatus includes outlet pressure sensing to enable correction for non-ideal operating conditions. Further the mass flow control apparatus having a fluid pathway, a shutoff valve in the fluid pathway, a reference volume in the fluid pathway, a first pressure measuring sensor in fluid communication with the reference volume, a first temperature measuring sensor providing a temperature signal indicative of the fluid temperature within the reference volume, a proportional valve in the fluid pathway, and a second pressure measuring sensor in fluid communication with the fluid pathway.
Variable Restriction for Flow Measurement
A system comprises a flow restrictor connected to a fluid flow path and located upstream from a chamber. The flow restrictor comprises an adjustable flow restriction aperture defined by the flow path region between a first element and a second element of the flow restrictor, and a drive unit configured to adjust the relative positions of the first element, second element or both to modify the fluid flow path across the aperture. The first or second element provides a curved boundary in the aperture flow path to form a converging region, a region of closest approach and a diverging region, within the flow path. Flow rate may be determined using a reference volume upstream from the flow restrictor.
Vaporizer
A vaporizer for delivery of a volatile medium to a gas flow, the vaporizer comprising: a gas delivery unit (3) which receives a flow of gas and provides a flow of gas containing a metered amount of a vaporized medium; a reservoir unit (5) which contains a volatile medium and maintains a supply of the vaporized medium, wherein the reservoir unit is selectively fluidly connected to the gas delivery unit; a gas sensing unit (7) for sensing a flow rate and/or composition of the gas flow; a vaporized medium sensing unit (9) for sensing a flow rate of the vaporized medium; a manifold (10) which includes flow paths for the vaporized medium and fluidly connects the reservoir unit and the vaporized medium sensing unit; and a control unit (11) for controlling a flow rate of the gas flow and an amount of the vaporized medium which is metered into the gas flow.