An electronic device manufacturing system includes: a gas supply; a mass flow controller (MFC) coupled to the gas supply; an inlet coupled to the MFC; an outlet; a control volume serially coupled to the inlet to receive a gas flow; and a flow restrictor serially coupled to the control volume and the outlet. A controller is adapted to allow the gas supply to flow gas through the control volume and the flow restrictor to achieve a stable pressure in the control volume, terminate the gas flow from the gas supply, and measure a rate of pressure decay in the control volume over time. A process chamber is coupled to a flow path, which is coupled to the mass flow controller, the process chamber to receive one or more process chemistries via the mass flow controller.

The embodiments of the present disclosure provide a method and an Internet of Things (IoT) system for determining a gas meter measurement failure of a smart gas, the method including: by the smart gas data center, obtaining, based on the smart gas sensing network platform, gas flow information of pipelines of each level from at least one flow monitoring device, the at least one flow monitoring device being configured in the smart gas object platform; by the indoor smart gas device management sub-platform, determining a candidate area based on the gas flow information; determining a target gas meter based on gas meter reading information of the candidate area, and then determining a maintenance plan for the target gas meter; and sending the maintenance plan to the smart gas data center, and sending the maintenance plan to the smart gas user platform based on the smart gas service platform.

A method, meter and device capable of determining the accuracy, proof, or percent of error of a meter in service. The method is configured to establish one or more baseline flow measurements for the meter, the meter configured to measure a flow through the meter; obtain a current flow measurement for the meter; and determine a proving result in accordance with a comparing of the current flow measurement to the one or more baseline flow measurements.

An apparatus and method for use in determining one or more fluid flow properties of a fluid in a conduit is disclosed. The apparatus includes a substrate including a barrier, a first flow sensor coupled to the substrate and a second flow sensor coupled to the substrate. The first flow sensor is located at a first sensor distance from a first barrier surface, and the second flow sensor is located a second sensor distance from the second barrier surface. The first sensor distance is substantially equal to the second sensor distance. In operation, the first flow sensor produces a first sensor signal, and the second flow sensor produces a second sensor signal. The direction of flow for the fluid is determined by comparing the first sensor signal to the second sensor signal.

A system and method for metering fluid flow is disclosed which has improved diagnostic capabilities. As well as informing a flow meter operator of the presence of a malfunction and its likely cause, the new systems and methods can also quantify an associated flow prediction bias.

Techniques determine if an appliance having a fixed-rate of gas-consumption is degrading over time. In one example, a flowrate of gas at a service site is obtained. The flowrate of gas is disaggregated to obtain a flowrate of gas corresponding to an appliance having a generally fixed-rate of gas-consumption. The flowrate of gas of the appliance is compared to historical gas consumption by the appliance. Based at least in part on the comparing, it may be determined that performance of the appliance has changed over time. For example, the gas consumption of a hot water tank may increase due to mineral build-up in the bottom of the tank. Responsive to the determined degradation of the appliance, warnings may be sent, repairs may be made, and/or appliance(s) may be replaced.

A method for calibrating flow meters measuring fluid passing through a pipe wherein fluid pressures are detected and used to determine a volume or mass flow rate using an energy correlation calculation. The energy correlation calculation equates a change in potential energy for the flowing fluid with a change in kinetic energy for the flowing fluid. The energy correlation method of calculating flow rate offers lower measurement uncertainty than calculating flow by the Reynolds number versus discharge coefficient method.

Aspects generally relate to methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing system. In one aspect, a corrected flow curve is created for a range of target flow rates across a plurality of setpoints. In one implementation, a method of conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing system includes prioritizing the plurality of MFCs for the calibration operation. The prioritizing includes determining an operation time for each MFC of the plurality of MFCs, and ranking the plurality of MFCs in a rank list according to the operation time for each MFC. The method includes conducting the calibration operation for the plurality of MFCs according to the rank list and during an idle time for the substrate processing system.

Provided is a physical quantity measurement device capable of reducing a frequency analysis error of a gas flow rate as compared with the related art. A physical quantity measurement device 20 includes a flow rate sensor 205 and a signal processing unit 260. The signal processing unit 260 has a buffer 261, an offset adjustment unit 262, a gain calculation unit 263, a correction calculation unit 264, and a frequency analysis unit 265. The buffer 261 stores a flow rate data based on an output signal of the flow rate sensor 205 for a predetermined period. The offset adjustment unit 262 adjusts the zero point of the flow rate waveform. The gain calculation unit 263 calculates a correction gain of the flow rate waveform whose zero point has been adjusted. The correction calculation unit 264 performs the correction by multiplying the flow rate waveform whose zero point has been adjusted by the correction gain. The frequency analysis unit 265 performs a frequency analysis calculation of the corrected flow rate waveform and stores the data obtained by the calculation in the buffer 261. The gain calculation unit 263 calculates the correction gain at which the overflow does not occur in the frequency analysis unit 265.

A method for calibrating a gas flow metrology system for a substrate processing system includes a) measuring temperature using a first temperature sensor and a reference temperature sensor over a predetermined temperature range and determining a first transfer function; b) measuring pressure using a first pressure sensor and a reference pressure sensor over a predetermined pressure range using a first calibration gas and determining a second transfer function; c) performing a first plurality of flow rate measurements in a predetermined flow rate range with a first metrology system and a reference metrology system, wherein the first metrology system and the reference metrology system use a first orifice size and the first calibration gas; and d) scaling temperature and pressure using the first transfer function and the second transfer function, respectively, and determining a corresponding transfer function for the first calibration gas based on the first plurality of flow rate measurements.