A wafer includes a substrate layer, a first mirror layer having a plurality of two-dimensionally arranged first mirror portions, and a second mirror layer having a plurality of two-dimensionally arranged second mirror portions. A plurality of Fabry-Perot interference filter portions are formed in an effective area, in each of the plurality of Fabry-Perot interference filter portions a gap is formed between the first mirror portion and the second mirror portion. A plurality of dummy filter portions are formed in a dummy area disposed along an outer edge of the substrate layer and surrounding the effective area, in each of the plurality of dummy filter portions an intermediate layer is provided between the first mirror portion and the second mirror portion. At least the second mirror portion is surrounded by the first groove in each of the plurality of Fabry-Perot interference filter portions and the plurality of dummy filter portions.

A modular housing for a spectrometer, the housing comprising at least two modules, the housing further comprising: a sensor recess configured to receive a sensor, the sensor being configured for determining at least one light spectrum characteristic of light received after optical interaction of the light with a sample; an aperture configured for receiving and guiding the light received after the optical interaction along a reception path extending from an entrance of the aperture to the sensor recess; and at least two channels configured for guiding and emitting light out of the modular housing, such that the light, after the optical interaction with the sample, is received at the entrance of the aperture; wherein the at least two channels are arranged along intersecting or skew axes; and wherein at least two of the at least two modules comprise respective ones of the at least two channels.

Provided is a measurement device including a spectroscope, a movement mechanism configured to relatively move the spectroscope in one direction, and one or more processors configured to determine whether a measurement position measured by the spectroscope is moved into a color patch, in which the one or more processors cause the spectroscope to execute measurement processing for a plurality of wavelengths set in advance while relatively moving the spectroscope in the one direction, and when at least one of amounts of variation of measured values with respect to each of the plurality of wavelengths obtained in the measurement processing exceeds a first threshold value and then each of the amounts of variation of the measured values of the plurality of wavelengths falls below a second threshold value which is less than or equal to the first threshold value, determine that the measurement position is moved into the color patch.

A colorimetric apparatus has a shutter unit that can shift between a closed position and an open position. The apparatus body has: a shifting member that can shift between a projection position, at which the shifting member projects in a first direction, and a retraction position, at which the shifting member retracts in a second direction; a first pressing member that presses the shifting member in the first direction; and an operation conversion means that converts the shift operation of the shifting member with respect to the apparatus body to the shift operation of the shutter unit. In a state in which the shifting member is at the projection position, the shutter unit is at the closed position. When the shifting member shifts from the projection position to the retraction position, the shutter unit shifts from the closed position to the open position.

A spectroscopic module includes a plurality of beam splitters that are arranged along an X direction; a plurality of bandpass filters disposed on one side in a Z direction with respect to the plurality of beam splitters facing the plurality of beam splitters, respectively; a light detector disposed on the one side in the Z direction with respect to the plurality of bandpass filters and including a plurality of light receiving regions facing the plurality of bandpass filters, respectively; a first support body supporting the plurality of beam splitters; and a second support body supporting the plurality of bandpass filters. The second support body includes a support portion in which a support surface is formed so as to be open to the one side in the Z direction. The plurality of bandpass filters are disposed on the support surface.

Generally described, one or more aspects of the present application correspond to systems and techniques for spectral imaging using a multi-aperture system with curved multi-bandpass filters positioned over each aperture. The present disclosure further relates to techniques for implementing spectral unmixing and image registration to generate a spectral datacube using image information received from such imaging systems. Aspects of the present disclosure relate to using such a datacube to analyze the imaged object, for example to analyze tissue in a clinical setting, perform biometric recognition, or perform materials analysis.

A color measuring apparatus includes an opening portion that is provided in a bottom portion of the apparatus and takes light from a measurement target into the apparatus, an incident light processing unit that processes light that enters the apparatus through the opening portion, a housing that covers an apparatus internal unit including the incident light processing unit, at least one protrusion member that is configured to switch between a first state in which the protrusion member protrudes from a bottom surface of the housing and a second state in which the protrusion member does not protrude from the bottom surface of the housing, and at least one pressing member that presses the protrusion member in a protruding direction from the bottom surface of the housing.

A remote sampling sensor for determining characteristics of a sample includes measurement optics and an insertion probe. The measurement optics are configured to emit light and detect returned light. The insertion probe includes a chamber, the chamber being configured to permit the sample to enter the chamber, an insertion tip at a distal end of the insertion probe, and a retro-reflective optic adjacent the insertion tip. The retro-reflective optic is configured to return the light from the measurement optics through the chamber to the measurement optics. The insertion probe is configured to be remotely located from the measurement optics.

A reflectometry instrument includes a light source for emitting an illumination beam that illuminates the macula. A portion of the illumination beam is reflected from the macula and forms a detection beam. The detection beam is indicative of macular pigment in the macula. The instrument also includes a first mirror for reflecting the illumination beam toward the macula and for reflecting the detection beam from the macula. The instrument is configured so that the illumination beam and the detection beam remain separated between the macula and the first mirror.

A mirror unit 2 includes a mirror device 20 including a base 21 and a movable mirror 22, an optical function member 13, and a fixed mirror 16 that is disposed on a side opposite to the mirror device 20 with respect to the optical function member 13. The optical function member 13 is provided with a light transmitting portion 14 that constitutes a part of an optical path between the beam splitter unit 3 and the fixed mirror 16. The light transmitting portion 14 is a portion that corrects an optical path difference that occurs between an optical path between the beam splitter unit 3 and the movable mirror 22 and the optical path between the beam splitter unit 3 and the fixed mirror 16. The second surface 21b of the base 21 and the third surface 13a of the optical function member 13 are joined to each other.