A sensor package includes a semiconductor sensor chip having multiple light sensitive regions each of which defines a respective light sensitive channel. An optical filter structure is disposed over the sensor chip and includes filters defining respective spectral functions for different ones of the light sensitive channels. In particular, the optical filter structure includes at least three optical filters defining spectral functions for tristimulus detection by a first subset of the light sensitive channels, and at least one additional optical filter defining a spectral function for spectral detection by a second subset of the light sensitive channels encompassing a wavelength range that differs from that of the first subset of light sensitive channels.

An optical detector (100, 200, 300) for detecting gas and suspended matter therein includes a test chamber (111, 113), at least one light source (12), a sensing object (131, 133), a test optical sensor (141) and a processor (19). The test chamber (111, 113) accommodates a gas to be analyzed. The at least one light source (12) emits an incident light that enters the test chamber (111, 113). The sensing object (131, 133) is exposed to gas in the test chamber (111, 113), receives the incident light, and reflects or transmits a portion of the incident light to form a test light. The test optical sensor (141) receives the test light and generates a detected spectral signal. The processor (19) receives the detected spectral signal and calculates a detection result according to the detected spectral signal.

A measuring apparatus for measuring a spectrum of a gaseous sample includes a tunable laser light source to provide an illuminating light beam, a sample cell with an inner surface to provide scrambled light that is transmitted through the gaseous sample, a detector to detect intensity of transmitted scrambled light and a pressure control system to maintain an absolute pressure of the gaseous sample smaller than 50 kPa inside the sample cell to reduce spectral widths of spectral features of the gaseous sample. The measuring apparatus measures spectral transmittance values of the sample by modulating the spectral position of the illuminating light, and detecting the intensity of the transmitted light at different spectral positions. The divergence of the illuminating light beam in a transverse direction is greater than 20° to cause multiple consecutive reflections of the scrambled light from the inner surface.

An imaging apparatus includes an image sensor, a filter array disposed on an optical path from a target object to the image sensor and including two-dimensionally-arranged optical filters, and a processing circuit that generates at least four pieces of spectral image data based on an image acquired by the image sensor. The optical filters include various types of optical filters with different spectral transmittance. Each of the at least four pieces of spectral image data indicates an image corresponding to one of at least four wavelength bands. The filter array includes at least one characteristic section. The processing circuit detects a relative position between the filter array and the image sensor based on the at least one characteristic section in the image acquired by the image sensor, and compensates for deviation between the relative position and a preliminarily-set relative position when the processing circuit detects the deviation.

A spectrometer includes: a diffraction means that diffracts light being measured which has entered via an entrance unit; a main sensor that receives the light being measured which has been diffracted by the diffraction means; at least one auxiliary sensor disposed in an optical path of a luminous flux that does not reach the main sensor among luminous fluxes that have entered via the entrance unit, the auxiliary sensor receiving the luminous flux; and a correction means that corrects an output value of the main sensor on the basis of an output value of the auxiliary sensor.

In an illustrative configuration, a method for monitoring air quality is disclosed. The method includes accepting analyte gas into a cell and reflecting light rays into the analyte gas repeatedly across the cell into at least one sensor. The light scattered by particulate matter in the analyte gas and amount of spectra-absorption due to presence of a gaseous chemical is then measured. Based on the determined amount of spectra-absorption and the measured scattered light the gaseous chemical is then measured.

Provided are an automatic analyzer and an optical measurement method for correcting a variation in the multiplication factor of a photoelectric element with high accuracy. The automatic analyzer comprises: a photoelectric element which generates electrons by light and outputs a current signal; a voltage application unit which applies a voltage to the photoelectric element; and a processing unit which corrects a variation in the multiplication factor of the photoelectric element, wherein the photoelectric element outputs a pulse signal as the current signal, and the processing unit corrects the variation in the multiplication factor on the basis of the pulse area of the pulse signal.

An optical sensing system includes at least one electro-optical sensor having an adjustable field of view and at least one reflective member including a diffuse reflector surface positioned within the field of view of the at least one electro-optical sensor. The system also includes at least one controller configured to generate calibration parameters for the at least one electro-optical sensor based on data for at least one exposure detected by the electro-optical sensor when the diffuse reflector surface is within the field of view of the at least one electro-optical sensor. Methods for calculating the calibration parameters and for directly measuring reflectivity of objects in a scene with at least one electro-optical sensor are also disclosed herein.

Disclosed are embodiments of an improved apparatus and system, and associated methods for optically diagnosing a semiconductor manufacturing process. A hyperspectral imaging system is used to acquire spectrally-resolved images of emissions from the plasma, in a plasma processing system. Acquired hyperspectral images may be used to determine the chemical composition of the plasma and the plasma process endpoint. Alternatively, a hyperspectral imaging system is used to acquire spectrally-resolved images of a substrate before, during, or after processing, to determine properties of the substrate or layers and features formed on the substrate, including whether a process endpoint has been reached; or before or after processing, for inspecting the substrate condition.

A sensor system includes an array of optical sensors on an integrated circuit and a plurality of sets of optical filters atop at least a portion of the array. Each set of optical filters is associated with a set of optical sensors of the array, with a set of optical filters including a plurality of optical filters, with each optical filter being configured to pass light in a different wavelength range. A first interface is configured to interface with the optical sensors and first processing circuitry that is configured to execute operational instructions for receiving an output signal representative of received light from the optical sensors and determining a spectral response for each set of optical sensors. A second interface is configured to interface with the first processing circuitry with second processing circuitry that is configured for determining, based on the spectral response for each set of optical sensors, an illuminant spectrum for each spectral response and then substantially remove the illuminant spectrum from the spectral response.