Embodiments of the systems can be configured to receive electromagnetic emissions of a substrate (e.g., a build material of a part being made via additive manufacturing) by a detector (e.g., a multi-spectral sensor) and generate a ratio of the electromagnetic emissions to perform spectral analysis with a reduced dependence on location and orientation of a surface of the substrate relative to the multi-spectral sensor. The additive manufacturing process can involve use of a laser to generate a laser beam for fusion of the build material into the part. The system can be configured to set the multi-spectral sensor off-axis with respect to the laser (e.g., an optical path of the multi-spectral sensor is at an angle that is different than the angle of incidence of the laser beam). This can allow the multi-spectral sensor to collect spectral data simultaneously as the laser is used to build the part.

Embodiments of the systems can be configured to receive electromagnetic emissions of a substrate (e.g., a build material of a part being made via additive manufacturing) by a detector (e.g., a multi-spectral sensor) and generate a ratio of the electromagnetic emissions to perform spectral analysis with a reduced dependence on location and orientation of a surface of the substrate relative to the multi-spectral sensor. The additive manufacturing process can involve use of a laser to generate a laser beam for fusion of the build material into the part. The system can be configured to set the multi-spectral sensor off-axis with respect to the laser (e.g., an optical path of the multi-spectral sensor is at an angle that is different than the angle of incidence of the laser beam). This can allow the multi-spectral sensor to collect spectral data simultaneously as the laser is used to build the part.

A multipulse-induced spectroscopy method based on a femtosecond plasma grating includes: pre-exciting a sample on a stage by providing a femtosecond pulse to form the femtosecond plasma grating; providing a post-pulse on the sample at an angle to excite the sample to generate a plasma, wherein the post-pulse comprises one or more femtosecond pulses, there is a time interval between the femtosecond pulse and the post-pulse, and the time interval is less than a lifetime of the femtosecond plasma grating; and receiving and analyzing a fluorescence emitted from the plasma to determine element information of the sample.

A spectrometry system for spectroscopically analyzing a sample is provided. The system includes an excitation source for interacting with the sample; a detector for detecting at least a portion of light absorbed or emitted by the sample, the excitation source and detector being optically coupled via an optical pathway; and an aperture positioned in the optical pathway for limiting transmission of light from the excitation source to the detector; wherein the aperture is configured to have a spatially varying distribution of one or more geometric features that provide regions of variable transmission around an edge of the aperture. Also provided is a mask for use with a spectrometry system, the mask configured to be positioned in an optical pathway between an excitation source and a detector, wherein the mask has a spatially varying distribution of one or more geometric features that provide regions of variable transmission around an edge of the aperture. A method for limiting light throughput from an excitation source to a detector via an aperture in a spectrometry system is also provided.

A spectrometry system for spectroscopically analyzing a sample is provided. The system includes an excitation source for interacting with the sample; a detector for detecting at least a portion of light absorbed or emitted by the sample, the excitation source and detector being optically coupled via an optical pathway; and an aperture positioned in the optical pathway for limiting transmission of light from the excitation source to the detector; wherein the aperture is configured to have a spatially varying distribution of one or more geometric features that provide regions of variable transmission around an edge of the aperture. Also provided is a mask for use with a spectrometry system, the mask configured to be positioned in an optical pathway between an excitation source and a detector, wherein the mask has a spatially varying distribution of one or more geometric features that provide regions of variable transmission around an edge of the aperture. A method for limiting light throughput from an excitation source to a detector via an aperture in a spectrometry system is also provided.

A method of determining a peak intensity in an optical spectrum is described. The method includes producing a two-dimensional array of spectrum values by imaging the optical spectrum onto a detector array. An offset using an actual location and an expected location of a peak of an interpolated subarray is used to adjust an expected location of another peak that is within another two-dimensional subarray. Interpolated spectrum values are then used to produce a peak intensity value of the second peak.

A method of determining a peak intensity in an optical spectrum is described. The method includes producing a two-dimensional array of spectrum values by imaging the optical spectrum onto a detector array. An offset using an actual location and an expected location of a peak of an interpolated subarray is used to adjust an expected location of another peak that is within another two-dimensional subarray. Interpolated spectrum values are then used to produce a peak intensity value of the second peak.

An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.

A sample analysis system including: a droplet device that intermittently introduces a sample to a measurement region set in plasma; a light emission detection device that detects light emission in the measurement region at a detection timing, the detection timing being set at a predetermined cycle in advance; and an analysis device that analyzes the sample based on the detected light emission, the analysis device being provided with: a distribution computing unit that computes a time-spatial light intensity distribution based on the detected light emission, the time-spatial light intensity distribution being a distribution of a light intensity according to the detection timing, a position in the measurement region, and an wavelength component of the light emission; and a characteristic specifying unit that computes a feature amount that correlates with a sample characteristic indicating a property of the sample and specifies the sample characteristic based on the feature amount.

A sample analysis system including: a droplet device that intermittently introduces a sample to a measurement region set in plasma; a light emission detection device that detects light emission in the measurement region at a detection timing, the detection timing being set at a predetermined cycle in advance; and an analysis device that analyzes the sample based on the detected light emission, the analysis device being provided with: a distribution computing unit that computes a time-spatial light intensity distribution based on the detected light emission, the time-spatial light intensity distribution being a distribution of a light intensity according to the detection timing, a position in the measurement region, and an wavelength component of the light emission; and a characteristic specifying unit that computes a feature amount that correlates with a sample characteristic indicating a property of the sample and specifies the sample characteristic based on the feature amount.