G01J2005/583

ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS

A method and apparatus for determining the temperature of a substrate within a processing chamber are described herein. The methods and apparatus described herein utilize an etalon assembly and a heterodyning effect to determine a first temperature of a substrate. The first temperature of the substrate is determined without physically contacting the substrate. A separate temperature sensor also measures a second temperature of the substrate and/or the substrate support at a similar location. The first temperature and the second temperature are utilized to calibrate one of the temperature sensors disposed within the substrate support, a model of the processes performed within the processing chamber, or to adjust a process parameter of the process performed within the processing chamber.

Fiber-optic sensor for strain-insensitive temperature measurements
09677949 · 2017-06-13 · ·

An in-line fiber-optic temperature sensor is disclosed. In an implementation, the in-line fiber-optic temperature sensor includes an optically transmissive fiber, a reflector, a microstructured fiber defining a channel therein for receiving a fluid, and a Fabry-Perot cavity in fluid communication with the microstructured fiber. The microstructured fiber can be retained between the optically transmissive fiber and the reflector. The Fabry-Perot cavity defined by a material and configured to receive a gas having an index of refraction that changes in a known way with temperature and pressure changes in fluid communication with the channel of the microstructured fiber. The in-line fiber-optic temperature sensor also includes a chamber defined between the optically transmissive fiber and the microstructured fiber for connecting in fluid communication with a vacuum/pressure source for changing pressure. The in-line fiber-optic temperature sensor also includes a sensor for determining an optical interferometric reflection spectrum associated with the Fabry-Perot cavity.

Method and system comprising entrance optics, interferometer, and transformation layer for detection of electromagnetic radiation

The invention relates to a device and method for imaging electromagnetic radiation from an object. The device comprises entrance optics for allowing the electromagnetic radiation to enter the device, comprising an image plane onto which an image of the object is to be imaged. The device comprises an interferometer having a measurement arm, wherein the image plane is in the measurement arm. The device comprises a transformation layer, at the image plane, for transforming the electromagnetic radiation into a spatiotemporal variation of the refractive index of the transformation layer for causing spatiotemporal optical phase differences in the measurement arm of the interferometer that are processed to result in a representative image of the object.