Patent classifications
G01J9/0215
RECONSTRUCTION OF A WAVEFRONT OF A LIGHT BEAM CONTAINING OPTICAL VORTICES
A method for reconstructing the wavefront of a light beam by analyzing wavefront-gradient data of said light beam, the light beam containing at least one optical vortex, considering the contribution of the optical vortices to the wavefront. The method including providing a phase-gradient map g of the wavefront of the light beam, generating a Laplacian of a vector potential based on the phase gradient map g, the resulting Laplacian of the vector potential map, called “Laplacian map”, exhibiting peaks, the location of each peak corresponding to the location of an optical vortex and the integral of the peak being proportional to a topological charge n of said optical vortex, computing a singular phase map φ.sub.s based on the topological charge n and location of each optical vortex, the singular phase φ.sub.s map being representative of the contribution of the optical vortex.
Light interference generator and interference imaging device
An interference imaging device includes a light interference generator that includes: a light wave splitter configured to reflect a part of incident light and to allow a remaining part of the incident light to pass through; a phase modulator configured to modulate a phase of incident light that has passed through the light wave splitter; and a reflector configured to reflect the phase-modulated incident light from the phase modulator so that the reflected, phase-modulated incident light overlaps with incident light that has been reflected by the light wave splitter.
Method for compensation during the process of wavefront reconstruction in grating-based lateral shearing interferometry
Method for simultaneously compensating pupil coordinate distortion and shear amount change in a process of wavefront reconstruction in grating transverse shear interference. Where a wavefront is diffracted by a grating, the shapes and light paths of the diffracted wavefronts of all the orders are different, so that on one hand, a coordinate system detected by a detector plane is distorted relative to a pupil coordinate system, and on the other hand, a shear amount changes along with a coordinate position.
Defect detection device
[PROBLEM] To provide a defect detection device capable of detecting not only a defect within a visible range but also a defect outside the visible range among the objects to be inspected. [SOLUTION] A defect detection device 10 includes: an excitation source 11 capable of being placed at any position on a surface of an inspection target object S, the excitation source 11 being configured to excite an elastic wave within the inspection target object S, the elastic wave being predominant in one vibration mode and propagating in a predetermined direction; an illumination unit (pulsed laser light source 13, illumination light lens 14) configured to perform stroboscopic illumination on an illumination area of the surface of the inspection target object by using a laser light source; a displacement measurement unit (speckle shearing interferometer 15) configured to collectively measure a displacement of each point in a front-back direction within the illumination area in at least three different phases of the elastic wave, by speckle interferometry or speckle shearing interferometry; and a reflected wave/scattered wave detector 16 configured to detect either one or both of a reflected wave and a scattered wave of the elastic wave, based on the displacement measured by the displacement measurement unit.
Sensor apparatus and method for lithographic measurements
A sensor apparatus (300) for determining a position of a target (330) of a substrate (W) comprising, projection optics (315;321) configured to project a radiation beam (310) onto the substrate, collection optics (321) configured to collect measurement radiation (325) that has scattered from the target, a wavefront sensing system (335) configured to determine a pupil function variation of at least a portion (355) of the measurement radiation and output a signal (340) indicative thereof, and a measurement system (350) configured to receive the signal and to determine the position of the target in at least partial dependence on the collected measurement radiation and the determined pupil function variation of at least a portion of the measurement radiation.
Regularized shearograms for phase resolved shearography
A shearography a system and method for regularizing phase resolved shearograms with an arctan regularization function to produce regularized phase resolved shearogram outputs is provided. The system and method of the present disclosure optimizes the processing of phase resolved shearography allowing interference fringe analysis techniques to be applied to the regularized phase resolved shearogram output results of the processing.
METHOD FOR HIGH-ACCURACY WAVEFRONT MEASUREMENT BASE ON GRATING SHEARING INTERFEROMETRY
A method for high-accuracy wavefront measurement based on grating shearing interferometry, which adopts a grating shearing interferometer system comprising an illuminating system, an optical imaging system under test, an object plane diffraction grating plate, an image plane diffraction grating plate, a two-dimensional photoelectric sensor, and a calculation processing unit. The object plane diffraction grating plate and the image plane diffraction grating plate are respectively arranged on the object plane and the image plane of the optical imaging system under test. The shearing phase of 1.sup.st-order diffracted beam and −1.sup.st-order diffracted beam is exactly extracted through phase shifting method, and the original wavefront is obtained by carrying out reconstruction algorithm according to a shear ratio of 2s, such that the accuracy of wavefront measurement of the optical imaging system under test is improved, wherein s is the shear ratio of the grating shearing interferometer.
WAVEFRONT SENSOR AND METHOD OF RECONSTRUCTING DISTORTED WAVEFRONTS
A wavefront sensor includes a mask and a sensor utilized to capture a diffraction pattern generated by light incident to the mask. A reference image is captured in response to a plane wavefront incident on the mask, and another measurement image is captured in response to a distorted wavefront incident on the mask. The distorted wavefront is reconstructed based on differences between the reference image and the measurement image.
Sensor Apparatus and Method for Lithographic Measurements
A sensor apparatus (300) for determining a position of a target (330) of a substrate (W) comprising, projection optics (315;321) configured to project a radiation beam (310) onto the substrate, collection optics (321) configured to collect measurement radiation (325) that has scattered from the target, a wavefront sensing system (335) configured to determine a pupil function variation of at least a portion (355) of the measurement radiation and output a signal (340) indicative thereof, and a measurement system (350) configured to receive the signal and to determine the position of the target in at least partial dependence on the collected measurement radiation and the determined pupil function variation of at least a portion of the measurement radiation.
METHOD FOR MEASURING COMPLEX DEGREE OF COHERENCE OF RANDOM OPTICAL FIELD BY USING MUTUAL INTENSITY-INTENSITY CORRELATION
The invention discloses a method for measuring a complex degree of coherence of a random optical field by using a mutual intensity-intensity correlation, including the steps of: building a test optical path; rotating a quarter-wave plate to enable the fast axis of the quarter-wave plate to be consistent with a polarization direction of reference light, to obtain light intensity distribution information of a first combined light; rotating the quarter-wave plate to enable the slow axis of the quarter-wave plate to be consistent with the polarization direction of the reference light, to obtain light intensity distribution information of a second combined light; blocking the reference light to obtain light intensity distribution information of to-be-tested light; blocking the to-be-tested light to obtain light intensity distribution information of the reference light; and calculating the amplitude and phase of a complex degree of coherence of the to-be-tested light.