In a conventional moir method, achieving both measurement accuracy and dynamic measurement and balancing field of view and measurement accuracy have been difficult. The present invention makes it possible to handle conventional moir fringes as a grating for generating phase-shifted second-order moir fringes, use a spatial phase shift method algorithm to accurately analyze the phases of the second-order moir fringes before and after deformation, and determine shape from the phase differences between gratings projected onto the surface of an object of measurement and a reference surface and determine deformation and strain from the phase differences between the second-order moir fringes, before and after deformation, of a repeating pattern on the object surface or a produced grating. As a result, it is possible to measure the three-dimensional shape and deformation distribution of an object accurately and with a wide field of view or dynamically and with a high degree of accuracy.

According to the present disclosure, there is provided a device (2) and a method for measuring a wavelength for a laser device. The device (2) for measuring a wavelength for a laser device includes: a first optical path assembly and a second optical path assembly. The first optical path assembly and the second optical path assembly constitute a laser wavelength measurement optical path. The second optical path assembly includes: an FP etalon assembly (11) and an optical classifier (13). The homogenized laser beam passes through the FP etalon assembly (11) to generate an interference fringe. The optical classifier (13) is arranged after the FP etalon assembly (11) in the laser wavelength measurement optical path, and configured to deflect the laser beam passing through the FP etalon assembly (11).

A spectroscope for measuring a spectrum of input light includes a fringe former that forms first fringes having a first pitch by splitting the input light, a diffraction grating that disperses each of the first fringes, a moire pattern former that forms a moire pattern by overlaying the first fringes that have been dispersed, on second fringes having a second pitch different from the first pitch, and an image pickup device that measures the spectrum of the input light by detecting the moire pattern. At least one of the fringe former and the moire pattern former includes a cylindrical lens array.

In a conventional moir method, achieving both measurement accuracy and dynamic measurement and balancing field of view and measurement accuracy have been difficult. The present invention makes it possible to handle conventional moir fringes as a grating for generating phase-shifted second-order moir fringes, use a spatial phase shift method algorithm to accurately analyze the phases of the second-order moir fringes before and after deformation, and determine shape from the phase differences between gratings projected onto the surface of an object of measurement and a reference surface and determine deformation and strain from the phase differences between the second-order moir fringes, before and after deformation, of a repeating pattern on the object surface or a produced grating. As a result, it is possible to measure the three-dimensional shape and deformation distribution of an object accurately and with a wide field of view or dynamically and with a high degree of accuracy.

A collimation evaluation device includes a first reflection member, a second reflection member, a screen, and a housing. A first reflection surface of the first reflection member and a first reflection surface of the second reflection member face each other and are parallel to each other. Further, interference fringes are formed on the screen by light L.sub.12 reflected on the first reflection surface of the first reflection member and a second reflection surface of the second reflection member and light L.sub.21 reflected on a second reflection surface of the first reflection member and the first reflection surface of the second reflection member, and collimation of incident light is evaluated on the basis of a direction of the interference fringes.

Methods, systems and devices are described that improve optical spectroscopic techniques and particularly those that involve externally dispersed interferometer (EDI) techniques that result in an output spectrum having improved stability characteristics. The output spectrum minimizes the unwanted shifts in wavelength when the spectrograph component of the EDI instrument is under stresses that would otherwise shift or distort the wavelength positions of the spectrum.

This disclosure provides an imprint apparatus configured to form a pattern with an imprint material by bringing the imprint material on a substrate and a pattern of the mold into contact with each other including a drive unit to bring part of the pattern of the mold into contact with the imprint material, and bring the pattern into contact with the imprint material so a contact surface area between the pattern of the mold and the imprint material increases, an interference fringe detecting unit to detect an interference fringe generated by reflected light from the pattern of the mold and reflected light from the substrate, and a state detecting unit to detect a contact state between the pattern of the mold and the imprint material on the basis of the interference fringe.

This disclosure provides an imprint apparatus configured to form a pattern with an imprint material by bringing the imprint material on a substrate and a pattern of the mold into contact with each other including a drive unit to bring part of the pattern of the mold into contact with the imprint material, and bring the pattern into contact with the imprint material so a contact surface area between the pattern of the mold and the imprint material increases, an interference fringe detecting unit to detect an interference fringe generated by reflected light from the pattern of the mold and reflected light from the substrate, and a state detecting unit to detect a contact state between the pattern of the mold and the imprint material on the basis of the interference fringe.

This disclosure provides an imprint apparatus configured to form a pattern with an imprint material by bringing the imprint material on a substrate and a pattern of the mold into contact with each other including a drive unit to bring part of the pattern of the mold into contact with the imprint material, and bring the pattern into contact with the imprint material so a contact surface area between the pattern of the mold and the imprint material increases, an interference fringe detecting unit to detect an interference fringe generated by reflected light from the pattern of the mold and reflected light from the substrate, and a state detecting unit to detect a contact state between the pattern of the mold and the imprint material on the basis of the interference fringe.

A collimation evaluation device includes a first reflection member, a second reflection member, a screen, and a housing. A first reflection surface of the first reflection member and a first reflection surface of the second reflection member face each other and are parallel to each other. Further, interference fringes are formed on the screen by light L.sub.12 reflected on the first reflection surface of the first reflection member and a second reflection surface of the second reflection member and light L.sub.21 reflected on a second reflection surface of the first reflection member and the first reflection surface of the second reflection member, and collimation of incident light is evaluated on the basis of a direction of the interference fringes.