A two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises a substrate provided with a square array of through-apertures, wherein the diffraction grating is self-supporting. It will be appreciated that for a substrate provided with a square array of through-apertures to be self-supporting at least some substrate material is provided between each through-aperture and the adjacent through apertures. A method of designing a two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises: selecting a general geometry for the two-dimensional diffraction grating, the general geometry having at least one parameter; and selecting values for the least one parameter that result in a grating efficiency map for the two-dimensional diffraction grating so as to control the contributions to a first harmonic of a phase stepping signal.

A method for testing a display module may include providing light to the display module, obtaining an image of the display module, measuring a first center of a hole in the display module, measuring a first distance from the first center to an edge of the hole, measuring a second center of a closed line formed by a signal line of the display module, measuring a second distance from the second center to the signal line, calculating a third distance between the first center and the second center, and comparing the second distance with a sum of the first distance and the third distance.

A spectacle lens with has permanent markings is mounted on a mounting, in particular a suction mounting. The apparent location of the permanent markings is detected on the spectacle lens with a detection device. Additionally, the spectacle lens is illuminated eccentrically with respect to an optical axis of the detection device using eccentric light sources. Reflections from the lights sources on the spectacle lens are likewise detected. On the basis of the detected reflections and the apparent location of the permanent markings, the position and/or orientation of the mounted spectacle lens are determined.

A method for assessing the similarity between a power profile of a manufactured optic device and a nominal power profile upon which the power profile of the manufactured optic device is based. The method comprises measuring the power profile of manufactured optic device, identifying a region of interest from the measured power profile of manufactured optic device, and applying an offset to the measured power profile to substantially minimize a statistical quantifier for quantifying the similarity between the nominal power profile and the offset measured power profile. The method further comprises comparing the offset and the statistical quantifier to predefined quality control metrics, determining whether the measured power profile meets the predefined quality control metrics based, at least in part on the comparison. In exemplary embodiments, the method may further comprise determining whether to associate the manufactured optic device with another nominal power profile, if the measured power profile does not meet the predefined quality control metrics.

This application discloses a system and method for measuring the optical performance of an HOE or a population of HOEs in a single or mass production environment using light.

Embodiments described herein relate to apparatus for measuring and characterizing performance of augmented and virtual reality waveguide structures utilizing glass substrates. The waveguide performance measuring systems generally include a light source configured to direct light towards an incoupling grating area on waveguide and one or more light detectors configured to collect light from an outcoupling grating area on a second side of the waveguide. The light source and one or more light detectors are disposed on one or more adjustable stages positioned about the waveguide. In certain embodiments, the one or more adjustable stages are configured to move in a linear fashion or revolve and/or rotate around the waveguide in an orbital motion.

A lensmeter system may include a mobile device having a camera. The camera may capture a first image of a pattern through a lens that is separate from the camera, while the lens is in contact with a pattern. The mobile device may determine the size of the lens based on the first image and known features of the pattern. The camera may capture a second image of the pattern, while the lens is at an intermediate location between the camera and the pattern. The second image may be transformed to an ideal coordinate system, and processed determine a distortion of the pattern attributable to the lens. The mobile device may measure characteristics of the lens based on the distortion. Characteristics of the lens may include a spherical power, a cylinder power, and/or an astigmatism angle.

A method comprising illuminating a patterning device (MA) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.

A lensmeter system may include a mobile device having a camera. The camera may capture a first image of a pattern through a lens that is separate from the camera, while the lens is in contact with a pattern. The mobile device may determine the size of the lens based on the first image and known features of the pattern. The camera may capture a second image of the pattern, while the lens is at an intermediate location between the camera and the pattern. The second image may be transformed to an ideal coordinate system, and processed determine a distortion of the pattern attributable to the lens. The mobile device may measure characteristics of the lens based on the distortion. Characteristics of the lens may include a spherical power, a cylinder power, and/or an astigmatism angle.

A process is provided for determining characteristics of a lens, the process including obtaining a captured image of a pattern through a corrective lens; transforming the captured image to an ideal coordinate system; processing the captured image to determine an overall distortion from a reference pattern to the pattern of the captured image; determining a distortion of the captured pattern attributable to the corrective lens; and measuring at least one characteristic of the corrective lens. In some embodiments, the overall distortion is determined by detecting, in the captured image, at least one captured pattern landmark; determining a transformation from at least one ideal pattern landmark to the at least one captured pattern landmark; and determining for the corrective lens, from the transformation, a spherical power measurement, a cylinder power measurement, and an astigmatism angle measurement.