A method for assessing the similarity between a power profile of a manufactured optic device and a nominal power profile upon which the power profile of the manufactured optic device is based. The method comprises measuring the power profile of manufactured optic device, identifying a region of interest from the measured power profile of manufactured optic device, and applying an offset to the measured power profile to substantially minimize a statistical quantifier for quantifying the similarity between the nominal power profile and the offset measured power profile. The method further comprises comparing the offset and the statistical quantifier to predefined quality control metrics, determining whether the measured power profile meets the predefined quality control metrics based, at least in part on the comparison. In exemplary embodiments, the method may further comprise determining whether to associate the manufactured optic device with another nominal power profile, if the measured power profile does not meet the predefined quality control metrics.

A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating an irradiance profile for at least one optical element of the projection system from a power and illumination source pupil of the radiation beam, estimating a temperature distribution as a function of time in the at least one optical element of the projection system using the calculated irradiance profile for the at least one optical element of the projection system; calculating the thermally induced aberrations of the projection system based on the estimated temperature distribution and a thermal expansion parameter map associated with the at least one optical element of the projection system, wherein the thermal expansion parameter map is a spatial map indicating spatial variations of thermal expansion parameters in the at least one optical element of the projection system or a uniform map.

A spectacle lens which has permanent markings is mounted on a mounting, in particular a suction mounting. The apparent location of the permanent markings is detected on the spectacle lens with a detection device. Additionally, the spectacle lens is illuminated eccentrically with respect to an optical axis of the detection device using eccentric light sources. Reflections from the lights sources on the spectacle lens are likewise detected. On the basis of the detected reflections and the apparent location of the permanent markings, the position and/or orientation of the mounted spectacle lens are determined.

A system includes a detector and a computing device communicatively coupled to the detector. The detector detects spatial or temporal spectral features of a light beam after transmission of the light beam through a turbulent or aberrated medium and generate a measurement signal indicative of the spectral feature. The computing device receives the measurement signal and a comparative signal indicative of a spectral feature of the light beam prior to or after transmission of the light beam through the medium. The computing device compares the measurement signal and the comparative signal and determines, based on the comparison of the measurement signal and the comparative signal, one or more values related to variations in refractive indices of the medium.

Determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks involves firstly focus-dependently measuring a 3D aerial image of the imaging optical unit as a sequence of 2D intensity distributions in different measurement planes in the region of and parallel to an image plane of an imaging of an object by use of the imaging optical unit. A spectrum of a speckle pattern of the 3D aerial image is then determined by Fourier transformation of the measured 2D intensity distributions having speckle patterns. For a plurality of spectral components in the frequency domain, a focus dependence of a real part RS(z) and an imaginary part IS(z) of said spectral component is then determined. From the determined values of the focus dependence of the real part RS(z) and the imaginary part IS(z), a contribution made to the speckle pattern spectrum by a mask structure, which contribution is to be eliminated, is then separated from an imaging aberration contribution made to the speckle pattern spectrum by the imaging optical unit. The imaging aberration contribution is then represented. This results in a method for determining the imaging aberration contribution of the imaging optical unit having little additional time expenditure in comparison with the measurement time on the respective lithography mask.

Techniques are disclosed for systems and methods to provide improved ocular aberrometry. An ocular aberrometry system includes a wavefront sensor configured to provide wavefront sensor data associated with an optical target monitored by the ocular aberrometry system and a logic device configured to communicate with the wavefront sensor. The logic device is configured to determine a complex analysis engine for the ocular aberrometry system based, at least in part, on an aberrometer model and/or an eye model associated with the ocular aberrometry system, wherein the aberrometer model and the eye model are based, at least in part, on wavefront sensor data provided by the wavefront sensor. The logic device is also configured to generate a compact analysis engine for the ocular aberrometry system based, at least in part, on the determined complex analysis engine.

A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.

A method for qualitatively detecting aberration and determine aberration types in a photolithography system is disclosed. The method includes using a digital micromirror device (DMD) pattern to project an optical signal on a reflective substrate, acquiring a return optical signal reflected from the substrate at different focus heights (ranging from above to below best focus), forming a through focus curve based off of the return optical signal at various focus heights, comparing the through focus curve to a predetermined curvethe predetermined curve being a function of focus, and determining if a lens aberration is present. By using the existing hardware of the photolithography system to determine if a lens aberration exists, costs are maintained at a minimum and the DMD pattern creates a through focus curve (TFC) image in less than five minutes allowing for quick correction.

A wavefront measurement apparatus includes a light source unit, a holding unit, a light reception optical system, a wavefront measurement unit, and a wavefront data generation unit. The light source unit is configured to apply light beams toward the subject optical system. The wavefront measurement unit is configured to measure light beams transmitted through the subject optical system. The wavefront data generation unit is configured to generate wavefront aberration data from results of the measurement by the wavefront measurement unit. A neighborhood of the opening portion and a neighborhood of the wavefront measurement unit are made to be optically conjugate with each other by the light reception optical system. The measurement of the light beams includes at least measurement of the light beams in a state in which a center of the opening portion is separated away from the measurement axis by a predetermined distance.

Disclosed is a method for checking at least one geometric characteristic and one optical characteristic of a trimmed ophthalmic lens (10) including the following steps: a) arranging the trimmed ophthalmic lens on a support (110), b) capturing at least one image of the trimmed ophthalmic lens, c) determining, from the image, a measured geometric characteristic of the trimmed ophthalmic lens, d) determining at least one measured optical characteristic of the trimmed ophthalmic lens in a reference frame of the image captured in step b), e) comparing the measured geometric characteristic associated with the measured optical characteristic to a predefined desired ophthalmic lens model, including at least one desired geometric characteristic and one associated desired optical characteristic. Also disclosed is an associated checking device.