Method for determining an ophthalmic lens which comprises an aspherical continuous layer and an aspherical Fresnel layer. The aspherical continuous layer is supported by one of the faces of the lens, the same holds for the aspherical Fresnel layer.

A process is provided for determining characteristics of a lens, the process including obtaining a captured image of a pattern through a corrective lens; transforming the captured image to an ideal coordinate system; processing the captured image to determine an overall distortion from a reference pattern to the pattern of the captured image; determining a distortion of the captured pattern attributable to the corrective lens; and measuring at least one characteristic of the corrective lens. In some embodiments, the overall distortion is determined by detecting, in the captured image, at least one captured pattern landmark; determining a transformation from at least one ideal pattern landmark to the at least one captured pattern landmark; and determining for the corrective lens, from the transformation, a spherical power measurement, a cylinder power measurement, and an astigmatism angle measurement.

Disclosed is a method for checking at least one geometric characteristic and one optical characteristic of a trimmed ophthalmic lens (10) including the following steps: a) arranging the trimmed ophthalmic lens on a support (110), b) capturing at least one image of the trimmed ophthalmic lens, c) determining, from the image, a measured geometric characteristic of the trimmed ophthalmic lens, d) determining at least one measured optical characteristic of the trimmed ophthalmic lens in a reference frame of the image captured in step b), e) comparing the measured geometric characteristic associated with the measured optical characteristic to a predefined desired ophthalmic lens model, including at least one desired geometric characteristic and one associated desired optical characteristic. Also disclosed is an associated checking device.

Disclosed herein is a method including: providing a light guiding arrangement (LGA) configured to redirect light, incident thereon in a direction perpendicular to an external surface of the sample, into or onto the sample, such that light impinges on an internal facet of the sample nominally normally thereto; generating a first incident light beam (LB), directed at the external surface normally thereto, and a second incident LB, parallel to the first incident LB and directed at the LGA; obtaining a first returned LB by reflection of the first incident LB off the external surface, and a second returned LB by redirection by the LGA of the second incident LB into or onto the sample, reflection thereof off the internal facet, and inverse redirection by the LGA; measuring an angular deviation between the returned LBs and deducing therefrom an actual inclination angle of the internal facet relative to the external surface.

Techniques are disclosed for systems and methods to provide improved ocular aberrometry recovery. An ocular aberrometry system includes a wavefront sensor configured to provide wavefront sensor data associated with an optical target monitored by the ocular aberrometry system and a logic device configured to communicate with the wavefront sensor. The logic device is configured to receive ocular aberrometry output data including at least the wavefront sensor data provided by the wavefront sensor, identify imaging artifact induced singularities in the received ocular aberrometry output data, determine corrected aberrometry output data based, at least in part, on the identified singularities and the received ocular aberrometry output data, and generate user feedback corresponding to the received ocular aberrometry output data based, at least in part, on the corrected aberrometry output data.

A method comprising illuminating a patterning device (MA) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.

A wavefront measurement apparatus includes alight source unit, a holding unit, a light reception optical system, a wavefront measurement unit, and a wavefront data generation unit. The light source unit is configured to apply light beams toward the subject optical system. The wavefront measurement unit is configured to measure light beams transmitted through the subject optical system. The wavefront data generation unit is configured to generate wavefront aberration data from results of the measurement by the wavefront measurement unit. A neighborhood of the opening portion and a neighborhood of the wavefront measurement unit are made to be optically conjugate with each other by the light reception optical system. The measurement of the light beams includes at least measurement of the light beams in a state in which a center of the opening portion is separated away from the measurement axis by a predetermined distance.

A method is provided for deriving a surface profile of a free-form master lens for patterning one or two photo-alignment layers of a planar optical component. The method includes obtaining a desired optical function of the planar optical component; and obtaining an actual optical function of the planar optical component, the actual optical function being described as recorded using a free-form test lens with a surface profile configured to provide the desired optical function. The method includes estimating a deviation between the desired optical function and the actual optical function; and correcting the surface profile of the free-form test lens using the estimated deviation, thereby deriving a surface profile for the free-form master lens.

A method for optical characterization of a target optical objective to be manufactured by stacking several optical elements, the method including a characterization phase of the following steps: determining an assembly including, for each element at least one characteristic parameter of the optical element; and providing, as a function of the assembly set, an estimated geometric set, including data relating to at least one geometric parameter of at least one optical interface of the stack, by a geometric characterization model trained beforehand with a database, called training database, of training sets constituted based on optical objectives with architecture identical to that of the target objective, and further relates to
a device for geometric characterization of optical objectives implementing such a geometric characterization method and to a method and a system for the manufacture of optical objectives implementing such a characterization method or device.

At least three light fluxes of the test pattern projected from optical module 1 are acquired by wavefront sensor 9, the parallelism of the respective light fluxes is calculated, and the orientation of display panel 5 of the optical module is adjusted so that the parallelism of each light flux coincides.