G01M11/0292

Device for measuring an imaging property of an optical system
10386267 · 2019-08-20 · ·

A device for measuring the MTF or another imaging property of an optical system has a light pattern generating unit that generates a light pattern in a focal plane of the optical system. A reference axis of the device is oriented along an optical axis of the optical system. The device further comprises an arrangement of N, N=2, 3, 4, . . . , cameras that are separated from one another. Each camera has an objective and a light sensor that is arranged in a focal plane of the objective. The cameras are arranged on a side opposite the light pattern generating unit such that the light sensor of each camera detects an image of exactly one section of the light pattern. At least one beam deflecting element is arranged between the optical system and at least one of the cameras such that it deflects light away from the reference axis before the light impinges on the at least one camera.

Optical inspection device having a mirror for reflecting light rays, a method of producing a lens using the optical inspection device, and an optical inspection method using the optical inspection device

An optical inspection device includes: an LED; a chart; a collimator; and a mirror. The LED irradiates the chart with light to deliver light rays to the collimator as on-axis light rays. This allows a pattern on the chart to be projected onto a center of an image sensor through the collimator and an optical system under inspection. The mirror reflects light rays delivered to the mirror through the collimator among the on-axis light rays. This allows the pattern on the chart to be projected onto a periphery of the image sensor through the optical system under inspection.

Method for producing a lens for a lithography apparatus, and measurement system

A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.

Aberration computing device, aberration computing method, image processor, image processing method, and electron microscope
10332721 · 2019-06-25 · ·

An aberration computing device (100) includes a fitting section (48) for fitting line profiles of a diffractogram taken in radial directions to a fitting function and finding fitting parameters of the fitting function and a computing section (49) for finding at least one of an amount of defocus and two-fold astigmatism, based on the fitting parameters.

Method and apparatus for reducing non-normal incidence distortion in glazing films
12017398 · 2024-06-25 · ·

A method of manufacturing a polymer film includes melting a resin, extruding the melted resin through a die to produce a polymer film, shaping the polymer film, cooling the polymer film, capturing an image of a test pattern through the polymer film, calculating a modulation transfer function value from the image, and adjusting a process parameter of the melting, the extruding, the shaping, or the cooling based on the calculated modulation transfer function value.

Method and apparatus for optimizing the optical performance of interferometers
10267617 · 2019-04-23 · ·

Method include using an apparatus to measure a first surface field, at a first surface of the apparatus, of an artifact having one or more surface features with known topography. The method includes determining a first focus metric at the first surface based on at least a portion of a first surface profile containing the one or more surface features. Methods include digitally transforming, the first surface field into a second surface field at a second surface of the apparatus, deriving, a second surface profile from the second surface field and computing a second focus metric for the second surface profile, and determining, based on two or more focus metric values, an optimum surface for evaluating the instrument transfer function. Method include determining the instrument transfer function of the apparatus based on at least a portion of the surface profile derived from the surface field of the optimum surface.

APPARATUS FOR DETECTING A MODULATION TRANSFER FUNCTION AND CENTERING OF AN OPTICAL SYSTEM

The invention relates to an apparatus (2) for detecting imaging quality of an optical system (4) with at least one lens (6) or lens group. The apparatus (2) includes an MTF measuring apparatus (10) for measuring a modulation transfer function at a plurality of field points in the field of view of the optical system (4), and a centering measuring apparatus (18) for measuring a centered state of the optical system (4). Furthermore, the invention relates to a method for detecting imaging quality of an optical system (4) having such a apparatus (2).

Apparatus, systems and methods for improving visual outcomes for pseudophakic patients

A system and method of characterizing through-focus visual performance of an IOL using metrics based on an area under the modulation transfer function for different spatial frequencies at different defocus positions of the IOL. Also disclosed is a system and method of characterizing through-focus visual performance of an IOL using a metric based on an area under a cross-correlation coefficient for an image of a target acquired by the IOL at different defocus positions of the IOL.

Methods and Systems for Measuring Image Quality
20180275015 · 2018-09-27 ·

Methods and systems for measuring the asymmetrical image quality or image features of an intraocular lens (IOL), design, refractive and diffractive designs, such as IOLs with Extended tolerance of astigmatic effects are provided by through-focus and meridian response. Measurements are taken at various focal plane and meridian positions to allow for determination of areas of better performance away from 0 meridian or the start position and meridian.

METHOD AND APPARATUS FOR REDUCING NON-NORMAL INCIDENCE DISTORTION IN GLAZING FILMS
20240300159 · 2024-09-12 ·

A method of manufacturing a polymer film includes melting a resin, extruding the melted resin through a die to produce a polymer film, shaping the polymer film, cooling the polymer film, capturing an image of a test pattern through the polymer film, calculating a modulation transfer function value from the image, and adjusting a process parameter of the melting, the extruding, the shaping, or the cooling based on the calculated modulation transfer function value.