A method of fit testing includes providing a respirator; providing a sensor having a sensing element removably positioned substantially within an interior gas space of the respirator; providing a reader configured to be in wireless communication with the sensor; positioning the respirator over a mouth and a nose of a user while the sensor is positioned substantially within an interior gas space of the respirator; and observing respirator fit assessment data communicated from the sensor to the reader.

A mobile monitoring device for monitoring controlled contamination areas may include a motorized mobile structure, a sampling unit, and a central management and control unit. The motorized mobile structure is configured to move within an area to be monitored. The sampling unit is positioned on said mobile structure, and configured to perform sampling operations of air and/or surfaces of said area and obtain sampling data. The central management and control unit is operatively connected to the mobile structure and to said sampling unit. The mobile structure may be controlled by the central unit to reach predefined points of the area to be monitored. The sampling unit may be selectively activated and/or deactivated by said central unit in correspondence with said predefined starting points of said sampling operations.

Devices, systems, and associated methods for detecting drops dispensed by a dropper are provided. For example, a drop detection device may include a light source and a light detector configured to be coupled to a drop dispenser such that the light source and light detector are disposed proximal of a distal dispensing tip of the drop dispenser. The light detector may be configured to receive a reflected portion of a beam of light from the light source, which is reflected by a drop dispensed through the dispensing tip of the drop dispenser. In some embodiments, a processing circuit is configured to analyze a signal provided by the light detector to detect the dispensed drop.

A gas detection device manufactured by a semiconductor process includes a substrate, a microelectromechanical element, a light-emitting element, a particle-sensing element, a gas-sensing element, a driving-chip element and an encapsulation layer. The driving-chip element controls driving operations of the microelectromechanical element, the light-emitting element, the particle-sensing element and the gas-sensing element, respectively. When the microelectromechanical element is enabled to actuate transportation of gas, the gas is introduced into the gas detection device through an inlet aperture of the substrate. Scattered light spots generated by the light beam of the light-emitting element irradiating on suspended particles contained in the gas are received by the particle-sensing element to generate a detection datum of the suspended particles. The gas-sensing element detects the gas passing through and generates a detection datum of hazardous gas contained in the gas. Finally, the gas is discharged from an outlet aperture of the encapsulation layer.

The present invention relates to a hazardous material measuring apparatus capable of analyzing concentration and components of various hazardous materials. The hazardous material measuring apparatus analyzes an optical spectrum obtained by a spectrometer or a hyperspectral image obtained by a hyperspectral camera, thereby analyzing concentration and components of the hazardous materials to be measured.

An apparatus for analyzing the particulate matter content of an aerosol includes an aerosol chamber configured to receive an aerosol, the particulate matter content of which should be analyzed, at least one ultrasonic generator configured to produce ultrasonic waves in the aerosol received in the aerosol chamber, an ultrasonic detector configured to detect ultrasonic waves produced by the at least one ultrasonic generator in the aerosol, and an evaluator having a data exchange communication link with the ultrasonic detector and configured to ascertain the matter content on the basis of signals output by the ultrasonic detector. The ultrasonic generator and the ultrasonic detector are positioned relative to one another such that a path length to be traversed by ultrasonic waves between the ultrasonic generator and the ultrasonic detector is less than 1 cm.

Modular docking station and methods for sampling and monitoring gas and other fluids, where a sampling device is able to be removably attached to the docking station, thereby allowing the sampling device to be replaced without having to remove or disconnect the docking station from the rest of the sampling system. This allows the docking station to remain connected to the rest of the system with minimal or no interruption and reduces maintenance costs and time when replacing the sampling device.

A manifold system and methods of collecting samples, where the manifold system comprises multiple input sample ports and a preferably rotatable flow focusing element. The manifold system is able to sample aerosols and gases from multiple sample points, such as from cleanrooms and manufacturing environments, for collection and analysis. The flow focusing element reduces cross talk and cross contamination of particles, including nanoparticles, between different samples.

A system comprises a particle sensor assembly, which includes a light source that transmits a light beam into an external interrogation air region; a set of receive optics that provides a receive channel, the receive optics configured to collect a scattered portion of the light beam from a particle in the interrogation air region; and an optical detector that receives the collected scattered portion. The optical detector measures a signal intensity as a function of time from the scattered portion, with the signal intensity indicating a particle size and a signal duration indicating motion of the particle through the interrogation air region. A processor is in communication with the optical detector and is operative to determine a transit time of the particle through the interrogation air region based on the signal duration, and compute an airspeed based on parameters comprising the transit time and a size of the light beam.

The present disclosure provides a method and a system therefore for processing wafer. The method includes: monitoring a distribution of particles in a chamber while processing the wafer; determining at least one parameter according to the distribution of the particles for configuring at least one device of the chamber; configuring the at least one device of the chamber according to the at least one parameter; and processing another wafer based on a recipe after configuring the at least one device of the chamber.