Provided is a wafer inspection apparatus including a monochromator that extracts monochromatic light, a collimator that outputs the monochromatic light as parallel light, a first polarization assembly that polarizes the parallel light and radiates the polarized light to a wafer, an imaging optical system that condenses light reflected from the wafer, a spectroscope that splits the condensed light into a plurality of spectrums, a first lens that condenses the plurality of spectrums, a second polarization assembly that outputs the plurality of spectrums as a plurality of polarized lights having different diffraction orders and a difference of 90, a second lens that condenses the plurality of polarized lights, a third polarization assembly that outputs common polarized light based on the plurality of polarized interfering with each other, a camera that generates a phase difference image based on the common polarized light, and a signal processor that analyzes the phase difference image.

A device (1) for gas measurement in a measuring environment (7) with a first camera (3) configured to detecting an invisible image area (33) in the measuring environment (7) and with a second camera (5) configured to detecting a visible image area (55) in the measuring environment (7). A control unit (13) initiates a detection of invisible image information (33) within at least one detection area (11, 33, 55) and a detection of visible image information (55) in the detection area (11, 33, 55). The control unit (13) determines special image areas (66), which indicate individual persons (9) or a plurality of persons (9). The control unit (13) is configured to determine at least one gas concentration (21) on the basis of the image information (33), taking into account the special image areas (66).

Provided is an imaging ellipsometry (IE)-based inspection method including selecting a mode from among a first mode of an IE-based inspection device having a first field of view (FOV) and a second mode of an IE-based inspection device having a second FOV, measuring an inspection target by the IE-based inspection device based on the selected mode, and determining whether the inspection target is normal based on a result of the measuring, wherein the measuring of the inspection target comprises simultaneously measuring patterns included in a plurality of cells provided in a region of the inspection target, the region corresponding to an FOV of the selected mode.

A method for evaluating the quality of a component produced by means of an additive laser sintering and/or laser melting method, in particular a component for an aircraft engine, includes at least the steps of providing a first data set, which comprises spatially resolved color values, which each characterize the temperature of the component at an associated component location during the laser sintering and/or laser melting of the component, providing a second data set, which comprises spatially resolved color values corresponding to the first data set, which color values each characterize the temperature of a reference component at an associated reference component location during the laser sintering and/or laser melting of the reference component.

The present invention discloses a method and an apparatus for measuring leaf nitrogen content (LNC), and belongs to the spectral analysis and artificial intelligence (AI) field. The method includes the following steps: (1) obtaining a single-band image of a target leaf illuminated by a light source in a single feature band; (2) repeating step (1), to collect image information in four feature bands; (3) combining the collected images in the four feature bands into a four-channel spectral image; (4) training a deep learning model by using the spectral image and a corresponding nitrogen content label, to obtain a nitrogen content prediction model; (5) transplanting the trained nitrogen content prediction model into an AI control system; (6) collecting information about a to-be-predicted leaf sample, predicting nitrogen content by using an AI sensor equipped with the AI control system, and outputting the predicted nitrogen content.

Aspects of the present disclosure include reconfigurable integrated circuits for characterizing particles of a sample in a flow stream. Reconfigurable integrated circuits according to certain embodiments are programmed to calculate parameters of a particle in a flow stream from detected light; compare the calculated parameters of the particle with parameters of one or more particle classifications; classify the particle based on the comparison between the parameters of the particle classifications and the calculated parameters of the particle; and adjust one or more parameters of the particle classifications based on the calculated parameters of the particle. Methods for characterizing particles in a flow stream with the subject integrated circuits are also described. Systems and integrated circuit devices programmed for practicing the subject methods, such as on a flow cytometer, are also provided.

An interference image acquisition apparatus includes a light source, a beam splitter, a second reflection mirror, an imager, and a first reflection mirror. A cell is placed on one side of a transparent material, and the first reflection mirror is placed on the other side of the transparent material. In a two-beam interferometer, an optical path difference between an optical path length of a first light beam reflected by the first reflection mirror and an optical path length of a second light beam reflected by the second reflection mirror is set to a coherence length of light output from the light source or less. The imager acquires an interference image in a state in which the cell is placed at a position conjugate to an imaging plane in a first optical system between the imaging plane and the first reflection mirror.

An inspection apparatus including an illumination light source, a sensing probe and a processing device is provided. The illumination light source emits an illumination beam to simultaneously irradiate the plurality of light-emitting diode. The sensing probe is configured to measure a charge distribution, an electric field distribution, or a voltage distribution on the plurality of light-emitting diodes simultaneously irradiated by the illumination beam. The processing device determines a plurality of electro-optical characteristics of the plurality of light-emitting diodes through the charge distribution, the electric field distribution, or the voltage distribution on the plurality of light-emitting diodes simultaneously irradiated by the illumination beam. Moreover, a method of for inspecting light-emitting diodes is also provided.

This invention relates to a method of and system for facilitating detection of a particular predetermined gas in a scene under observation. The gas in the scene is typically associated with a gas leak in equipment. To this end, the system comprises an infrared camera arrangement; a strobing illuminator device having a strobing frequency matched to a frame rate of the camera; and a processing arrangement. The processing arrangement is configured to store a prior frame obtained via the infrared camera arrangement; and compare a current frame with the stored prior frame and generate an output signal in response to said comparison. The system also comprises a display device configured to display an output image based at least on the output signal generated by the processing arrangement so as to facilitate detection of the particular predetermined gas, in use.

Methods are provided for the automated detection of micro-objects in a microfluidic device. In addition, methods are provided for repositioning micro-objects in a microfluidic device. In addition, methods are provided for separating micro-objects in a spatial region of the microfluidic device.