Patent classifications
G01N21/55
Optical analyzer
The present invention intends to enable light path length to be kept the same between sample measurement and reference measurement and thereby improve measurement accuracy, and is an optical analyzer that analyzes a sample flowing through a pipe having translucency. In addition, the optical analyzer includes: a light source unit that has a light source and a condenser lens; a light detection unit that detects light of the light source unit; and a support mechanism that movably supports the light source unit and the light detection unit. Further, the support mechanism moves the light source unit and the light detection unit between a sample measurement position and a reference measurement position.
Method for inspecting surface of wafer, device for inspecting surface of wafer, and manufacturing method of electronic component
A method for inspecting a surface of a wafer, includes steps of: irradiating a surface of the wafer with a laser beam having three or more distinct wavelengths; detecting a reflected light from the surface of the wafer when the surface of the wafer is irradiated with the laser beam; and determining whether a foreign matter exists on the surface of the wafer based on reflectances of the surface of the wafer with respect to the laser beam having the three or more distinct wavelengths, wherein the step of determining whether the foreign matter exists includes a step of determining whether the foreign matter is a metal or a non-metal.
Method for inspecting surface of wafer, device for inspecting surface of wafer, and manufacturing method of electronic component
A method for inspecting a surface of a wafer, includes steps of: irradiating a surface of the wafer with a laser beam having three or more distinct wavelengths; detecting a reflected light from the surface of the wafer when the surface of the wafer is irradiated with the laser beam; and determining whether a foreign matter exists on the surface of the wafer based on reflectances of the surface of the wafer with respect to the laser beam having the three or more distinct wavelengths, wherein the step of determining whether the foreign matter exists includes a step of determining whether the foreign matter is a metal or a non-metal.
Transparent article
A glass article (10) as a transparent article has a haze value of 15% or less and a clarity value of 9% or less. Preferably, the product of the haze value, the clarity value, and the sparkle value is 0.5 or less.
Transparent article
A glass article (10) as a transparent article has a haze value of 15% or less and a clarity value of 9% or less. Preferably, the product of the haze value, the clarity value, and the sparkle value is 0.5 or less.
OPTICAL PROBE FOR BIO-SENSOR, OPTICAL BIO-SENSOR INCLUDING OPTICAL PROBE, AND METHOD FOR MANUFACTURING OPTICAL PROBE FOR BIO-SENSOR
An optical probe for a bio-sensor selectively conjugated to a target analyte and configured to retro-reflect incident light thereto is disclosed. The optical probe for the bio-sensor includes: a transparent core particle; a total-reflection inducing layer covering a portion of a surface of the core particle, the inducing layer is made of a material having a refractive index lower than a refractive index of the core; a modifying layer formed on the total-reflection inducing layer; and an analyte-sensing substance bound to the modifying layer, the sensing substance is selectively conjugated to the target analyte. This optical probe may serve as an excellent optical probe for both a non-spectral light source and a spectral light source.
METHODS AND SYSTEMS TO MEASURE PROPERTIES OF MOVING PRODUCTS IN DEVICE MANUFACTURING MACHINES
Described are systems and techniques directed to optical inspection of moving products (wafers, substrates, films, patterns) that are being transported to or from processing chambers in device manufacturing systems. Implementations include a system that has a first source of light to direct a first light to a first location on a surface of a product. The first light generates, at the first location, a first reflected light. The system further includes a first optical sensor to generate a first data representative of a first reflected light, and a processing device, in communication with the first optical sensor to determine, using the first data, a property of the product.
METHOD FOR OPTICAL MONITORING AND/OR DETERMINATION OF PROPERTIES OF SAMPLE
In the method for optical monitoring and/or determination of properties on samples, monochromatic electromagnetic radiation with a predetermined wavelength is sequentially directed from several radiation sources onto a sample influenced by an electronic evaluation unit. The respective intensity specific to the wavelength of the electromagnetic radiation scattered and/or reflected by the sample is detected by at least one detector and fed to the electronic evaluation unit for spectrally resolved evaluation in order to use it to monitor and/or determine properties of the respective sample.
Method for inspection of a target object, control system and inspection system
A method for inspection of a target object, the method including irradiating a reference surface having a non-flat reference profile with radiation; determining reference response data based on detected radiation having interacted with the reference surface; irradiating a target object with radiation, the target object including a target surface having a non-flat target profile corresponding to the reference profile; determining inspection response data based on detected radiation having interacted with the target object; and determining at least one parameter of the target object based on the reference response data and the inspection response data. An alternative method; a control system for controlling an emitter system and a detector system; and an inspection system including a control system, an emitter system and a detector system, are also provided.
Method for inspection of a target object, control system and inspection system
A method for inspection of a target object, the method including irradiating a reference surface having a non-flat reference profile with radiation; determining reference response data based on detected radiation having interacted with the reference surface; irradiating a target object with radiation, the target object including a target surface having a non-flat target profile corresponding to the reference profile; determining inspection response data based on detected radiation having interacted with the target object; and determining at least one parameter of the target object based on the reference response data and the inspection response data. An alternative method; a control system for controlling an emitter system and a detector system; and an inspection system including a control system, an emitter system and a detector system, are also provided.