According to a first aspect of the present invention there is provided a method of measuring the optical reflectance R of a target using a detection system comprising a light emitter and a light detector spaced apart from one another. The method comprises illuminating the target with the light emitter, detecting light reflected from the target using the light detector, wherein the light detector provides an electrical output signal S.sub.S indicative of the intensity of the detected light, and determining the optical reflectance R of the target according to (Formula 1), where R.sub.R is the spectral reflectance of a reference standard, S.sub.R is the detector electrical output signal with the reference standard in place, S.sub.H is the detector electrical output signal with no target in front of the light emitter and light detector, and M is a calibration factor.

[00001]$\begin{array}{cc}R=M.Math.R_R\frac{s_s-s_H}{M.Math..Math.s_R-s_H.Math.-R_R.Math.s_R-s_s.Math.},& \left(1\right)\end{array}$

A measurement device includes: a first measurement unit, disposed at a first opposing position facing a portion of a sheet-like measurement target, that measures a first physical property of the measurement target by causing the measurement target to vibrate with an ultrasonic wave; a second measurement unit, disposed at a second opposing position facing another portion of the measurement target in a state in which the first measurement unit is facing the first portion, that pinches and restrains the other portion in a thickness direction and measures a second physical property other than the first physical property of the measurement target; and a disposed unit disposed between the first measurement unit and the second measurement unit in an intersecting direction with respect to the thickness direction of the measurement target.

A deployable measurement system for analyzing a rail of a railroad track includes a housing, a reflecting assembly coupled to the housing, a movement assembly coupled to the housing, and an optical measurement system disposed within the housing. Both the housing and the reflecting assembly are moveable between a stored position and a deployed position. The movement assembly includes a deployment assembly that moves the reflecting assembly from the stored position to the deployed position, and a retraction assembly that moves the reflecting assembly from the deployed position to the stored position. The optical measurement system emits and receives light. The reflecting assembly reflects the emitted light toward the rail. The reflecting assembly reflects light reflected off of the rail toward the optical measurement system. The light received by the optical measurement system is used to measure parameters related to the rail.

A deployable measurement system for analyzing a rail of a railroad track includes a housing, a reflecting assembly coupled to the housing, a movement assembly coupled to the housing, and an optical measurement system disposed within the housing. Both the housing and the reflecting assembly are moveable between a stored position and a deployed position. The movement assembly includes a deployment assembly that moves the reflecting assembly from the stored position to the deployed position, and a retraction assembly that moves the reflecting assembly from the deployed position to the stored position. The optical measurement system emits and receives light. The reflecting assembly reflects the emitted light toward the rail. The reflecting assembly reflects light reflected off of the rail toward the optical measurement system. The light received by the optical measurement system is used to measure parameters related to the rail.

The invention relates to a device and method for determining a property of a sample that is to be used in a charged particle microscope. The sample comprises a specimen embedded within a matrix layer. The device comprises a light source arranged for directing a beam of light towards said sample, and a detector arranged for detecting light emitted from said sample in response to said beam of light being incident on said sample. Finally, the device comprises a controller that is connected to said detector and arranged for determining a property of said matrix layer based on signals received by said detector.

The invention relates to a device and method for determining a property of a sample that is to be used in a charged particle microscope. The sample comprises a specimen embedded within a matrix layer. The device comprises a light source arranged for directing a beam of light towards said sample, and a detector arranged for detecting light emitted from said sample in response to said beam of light being incident on said sample. Finally, the device comprises a controller that is connected to said detector and arranged for determining a property of said matrix layer based on signals received by said detector.

Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.

Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.

A system for characterising surfaces in a real-world scene, the system comprising an object identification unit operable to identify one or more objects within one or more captured images of the real-world scene, a characteristic identification unit operable to identify one or more characteristics of one or more surfaces of the identified objects, and an information generation unit operable to generate information linking an object and one or more surface characteristics associated with that object.

A system for characterising surfaces in a real-world scene, the system comprising an object identification unit operable to identify one or more objects within one or more captured images of the real-world scene, a characteristic identification unit operable to identify one or more characteristics of one or more surfaces of the identified objects, and an information generation unit operable to generate information linking an object and one or more surface characteristics associated with that object.