Method, apparatus, system, and computer program product for inspecting a joining feature on an object. A portable housing with an x-ray system is moved along the joining feature on the object. The x-ray system is controlled to direct an x-ray beam through an opening in the portable housing to scan an area of the object containing the joining feature as the portable housing moves along the joining feature on the object. Sensor data generated from a backscatter detected by a sensor system is received. The backscatter is generated in response to the x-ray beam encountering the area of the object including the joining feature. A determination is made as to whether an inconsistency is present in the area of the object including the joining feature using the sensor data.

An X-ray fluorescence analyzer is provided inside an analysis chamber covered with a housing with: an X-ray tube; an analyzing crystal for spectrally dispersing X-ray fluorescence emitted from a sample; an X-ray detector for detecting the X-ray fluorescence spectrally dispersed by the analyzing crystal; a warm air generator for generating warm air to maintain a temperature of the analyzing crystal at a target temperature; and a Peltier element for cooling the X-ray detector.

An X-ray fluorescence analyzer is provided inside an analysis chamber covered with a housing with: an X-ray tube; an analyzing crystal for spectrally dispersing X-ray fluorescence emitted from a sample; an X-ray detector for detecting the X-ray fluorescence spectrally dispersed by the analyzing crystal; a warm air generator for generating warm air to maintain a temperature of the analyzing crystal at a target temperature; and a Peltier element for cooling the X-ray detector.

Disclosed herein is an x-ray backscatter apparatus for non-destructive inspection of a part. The x-ray backscatter apparatus comprises an x-ray source and an x-ray filter. The x-ray filter comprises a plurality of emission apertures and a detection aperture. The x-ray backscatter apparatus further comprises an x-ray intensity sensor that is fixed to the x-ray filter over the detection aperture such that any portion of an unfiltered x-ray emission filtered into the detection aperture is detected by the x-ray intensity sensor. The x-ray backscatter apparatus additionally comprises an emission alignment adjuster that is operable to adjust a position of the unfiltered x-ray emission relative to the plurality of emission apertures and the detection aperture in response to a position, relative to the detection aperture, of a peak intensity of the unfiltered x-ray emission passing into the detection aperture, detected by the x-ray intensity sensor.

Disclosed herein is an x-ray backscatter apparatus for non-destructive inspection of a part. The x-ray backscatter apparatus comprises an x-ray source and an x-ray filter. The x-ray filter comprises a plurality of emission apertures and a detection aperture. The x-ray backscatter apparatus further comprises an x-ray intensity sensor that is fixed to the x-ray filter over the detection aperture such that any portion of an unfiltered x-ray emission filtered into the detection aperture is detected by the x-ray intensity sensor. The x-ray backscatter apparatus additionally comprises an emission alignment adjuster that is operable to adjust a position of the unfiltered x-ray emission relative to the plurality of emission apertures and the detection aperture in response to a position, relative to the detection aperture, of a peak intensity of the unfiltered x-ray emission passing into the detection aperture, detected by the x-ray intensity sensor.

A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.

A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.

A method and a device for determining the material properties of a polycrystalline, in particular metallic, product during production or quality control of the polycrystalline, in particular metallic, product by means of X-ray diffraction using at least one X-ray source and at least one X-ray detector. In this case, an X-ray generated by the X-ray source is directed onto a surface of the polycrystalline product and the resulting diffraction image of the X-ray is recorded by the X-ray detector. After exiting the X-ray source, the X-ray is passed through an X-ray mirror, wherein the X-ray is both monochromatized and focused, by the X-ray mirror, in the direction of the polycrystalline product and/or the X-ray detector, and then reaches a surface of the metallic product.

A method and a device for determining the material properties of a polycrystalline, in particular metallic, product during production or quality control of the polycrystalline, in particular metallic, product by means of X-ray diffraction using at least one X-ray source and at least one X-ray detector. In this case, an X-ray generated by the X-ray source is directed onto a surface of the polycrystalline product and the resulting diffraction image of the X-ray is recorded by the X-ray detector. After exiting the X-ray source, the X-ray is passed through an X-ray mirror, wherein the X-ray is both monochromatized and focused, by the X-ray mirror, in the direction of the polycrystalline product and/or the X-ray detector, and then reaches a surface of the metallic product.

An X-ray fluorescence analyzer according to an embodiment includes a sample box configured to accommodate a liquid sample, an X-ray generation unit configured to irradiate an X-ray to one side surface of the inside of the sample box, and a detector disposed along one side surface of the sample box at which a distance of a fluorescent X-ray emitted from the inside of the sample box to the outside of the sample box is shortest in order to minimize absorption of the fluorescent X-ray emitted out of the sample box in the air, when the X-ray irradiated by the X-ray generation unit reacts with the liquid sample inside the sample box to emit the fluorescent X-ray out of the sample box, the detector being configured to detect the fluorescent X-ray.