G01N2223/052

WOLTER MIRROR ASSEMBLY
20260056397 · 2026-02-26 ·

A mirror assembly is disclosed. The mirror assembly includes an ellipsoid optical surface. The mirror assembly includes a hyperboloid optical surface, wherein the ellipsoid optical surface and the hyperboloid optical surface are arranged in a Wolter mirror configuration. The mirror assembly includes a substrate. The substrate includes a first portion, wherein the ellipsoid optical surface is located on the first portion of the substrate. The substrate includes a second portion, wherein the hyperboloid optical surface is located on the second portion of the substrate, wherein the first portion and the second portion form a monolithic body.

Information processing apparatus, information processing method, nontransitory computer readable media storing program, and X-ray analysis apparatus
12584871 · 2026-03-24 · ·

According to an aspect of the present invention, provided is an information processing apparatus comprising a memory configured to store a program; and a processor configured to execute a program so as to output a parameter result in relation to a thin film by inputting a profile result in relation to an intensity of X-ray from the thin film to a neural network, wherein the neural network is a neural network that is allowed to machine-learn teacher data using profile data in relation to an intensity of X-ray from a thin film as input data and using parameter data in relation to the thin film as output data.

Soft X-Ray Tools for Semiconductor Metrology Applications
20260092883 · 2026-04-02 · ·

An optical system for conditioning a source beam in the soft X-ray range. The optical system is positioned and configured with a geometry to redirect a selected portion of the source beam for illuminating a semiconductor substrate at a specific angle of incidence. The optical system includes at least two optical elements. A first optical element reflects the selected portion of the source beam having a specified wavelength. The second optical element then reflects and focuses the selected portion as a target beam onto the semiconductor substrate.

APPARATUS AND METHOD FOR DETECTING REFLECTIVE ELECTRON
20260104369 · 2026-04-16 · ·

Provided is a reflective electron detection apparatus and a reflective electron detection method for acquiring an energy loss spectrum with higher precision. A reflective electron detection apparatus includes an irradiator configured to irradiate a target surface of a sample with an electron, a detector configured to detect at least a portion of the electron which is reflected from the target surface, a voltage application circuitry configured to apply a voltage to the sample, and a correction circuitry configured to correct a first electric field between the target surface of the sample to which is the voltage is applied and the irradiator and a second electric field between the target surface of the sample to which is the voltage is applied and the detector.