A method for X-Ray Scattering material analysis, in particular Small Angle X-ray Scattering material analysis for generating and directing an incident X-ray beam along a propagation direction to a sample held in a sample environment executing a sample measurement process. An apparatus adapted to carry out such a method is also disclosed.

An X-ray scattering apparatus having a sample holder for aligning and/or orienting a sample to be analyzed by X-ray scattering, a first X-ray beam delivery system having a first X-ray source, and a first monochromator being arranged upstream of the sample holder for generating and directing a first X-ray beam along a beam path in a propagation direction towards the sample holder is disclosed. A distal X-ray detector arranged downstream of the sample holder and being movable, in particular in a motorized way, along the propagation direction as to detect the first X-ray beam and X-rays scattered at different scattering angles from the sample as the first X-ray beam delivery system is configured to focus the first X-ray beam onto a focal spot on or near the distal X-ray detector when placed at its largest distance from the sample holder is also disclosed.

Methods and systems for realizing a high radiance x-ray source based on a high density electron emitter array are presented herein. The high radiance x-ray source is suitable for high throughput x-ray metrology and inspection in a semiconductor fabrication environment. The high radiance X-ray source includes an array of electron emitters that generate a large electron current focused over a small anode area to generate high radiance X-ray illumination light. In some embodiments, electron current density across the surface of the electron emitter array is at least 0.01 Amperes/mm.sup.2, the electron current is focused onto an anode area with a dimension of maximum extent less than 100 micrometers, and the spacing between emitters is less than 5 micrometers. In another aspect, emitted electrons are accelerated from the array to the anode with a landing energy less than four times the energy of a desired X-ray emission line.

Provided is a scattering measurement analysis method including obtaining a theoretical scattering intensity from a structural model that contains a lot of scatterers, wherein the obtaining of a theoretical scattering intensity includes obtaining a contribution to the theoretical scattering intensity of a pair of a scatterer “m” and a scatterer “n” existing at a distance “r” from the scatterer “m” among a plurality of scatterers by at least one of calculations in accordance with the distance “r”, the calculations including a first calculation of calculating contributions of the scatterer “m” and the scatterer “n” from respective scattering factors f.sub.m(q) and f.sub.n*(q) and a center-to-center distance r.sub.mn between the scatterer “m” and the scatterer “n”, and a second calculation of substituting the scattering factor f.sub.n*(q) of the scatterer “n” by a first representative value and substituting a probability density function of the number of scatterers existing at the distance “r” by a constant value.

A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.

Non-destructive inspection methods, systems, and apparatuses are disclosed for non-destructively inspecting a bond line, including a bond line present in a composite substrate and in a adhesive material layers in a composite substrate, with the methods, systems, and apparatuses incorporating a small angle X-ray scattering array.

Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a liquid sheet jet target are presented herein. A highly focused, short duration laser pulse is directed to a liquid sheet jet target. The interaction of the focused laser pulse with the sheet jet target ignites a plasma. In some embodiments, the liquid sheet jet is generated by a convergent capillary nozzle or a convergent, planar cavity nozzle. In some embodiments, the target material includes one or more elements having a relatively low atomic number. In some embodiments, the liquid sheet jet LPP light source generates multiple line or broadband X-ray illumination in a soft X-ray (SXR) spectral range used to measure structural and material characteristics of semiconductor structures. In some embodiments, Reflective, Small-Angle X-ray Scatterometry measurements are performed with a liquid sheet jet LPP illumination source as described herein.

The present application provides an in vitro method for detecting presence of cancer by analyzing small angle X-ray scattering (SAXS) of a single hair by automated data analysis using end user or in-house X-ray source. Specifically, the present methodology provides a method which also provides steps to allow correction for hair thickness and provide a quantitative view on the cancer status of the subject.

A detection scheme for x-ray small angle scattering is described. An x-ray small angle scattering apparatus may include a first grating and a complementary second grating. The first grating includes a plurality of first grating cells. The complementarity second grating includes a plurality of second grating cells. The second grating is positioned relative to the first grating. A configuration of the first grating, a configuration of the second grating and the relative positioning of the gratings are configured to pass one or more small angle scattered photons and to block one or more Compton scattered photons and one or more main x-ray photons.

Methods and systems for x-ray based semiconductor metrology utilizing a broadband, soft X-ray illumination source are described herein. A laser produced plasma (LPP) light source generates high brightness, broadband, soft x-ray illumination. The LPP light source directs a highly focused, short duration laser source to a non-metallic droplet target in a liquid or solid state. In one example, a droplet generator dispenses a sequence of nominally 50 micron droplets of feed material at a rate between 50 and 400 kilohertz. In one aspect, the duration of each pulse of excitation light is less than one nanosecond. In some embodiments, the duration of each pulse of excitation light is less than 0.5 nanoseconds. In some embodiments, the LPP light source includes a gas separation system that separates unspent feed material from other gases in the plasma chamber and provides the separated feed material back to the droplet generator.