Patent classifications
G01N2223/071
METHODS AND SYSTEMS FOR INCLUSION ANALYSIS
Various methods and systems are provided for analyzing sample inclusions. As one example, a correction factor may be generated based on inclusion properties of a first sample determined using both an optical emission spectrometry (OES) system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system. The OES system may be calibrated with the correction factor. The inclusion properties of a second, different, sample may be determined using the calibrated OES system.
SYSTEM AND METHOD FOR CALIBRATING A PET SCANNER
A method and system for calibrating a PET scanner are described. The PET scanner may have a field of view (FOV) and multiple detector rings. A detector ring may have multiple detector units. A line of response (LOR) connecting a first detector unit and a second detector unit of the PET scanner may be determined. The LOR may correlate to coincidence events resulting from annihilation of positrons emitted by a radiation source. A first time of flight (TOF) of the LOR may be calculated based on the coincidence events. The position of the radiation source may be determined. A second TOF of the LOR may be calculated based on the position of the radiation source. A time offset may be calculated based on the first TOF and the second TOF. The first detector unit and the second detector unit may be calibrated based on the time offset.
ANALYZING APPARATUS, ANALYZING METHOD, AND PROGRAM
An analyzing apparatus includes an X-ray measurement device, an optical characteristic measurement device, and a calculation unit. The X-ray measurement device may be configured to measure fluorescent X-rays generated from the measurement object. The optical characteristic measurement device may be configured to obtain optical characteristics other than the fluorescent X-rays of one or more carbon compounds contained in the measurement object. The calculation unit may be configured to calculate information about a quantity of the one or more carbon compounds contained in the measurement object on the basis of the optical characteristics of the carbon compound(s), and correct the information about fluorescent X-rays measured by the X-ray measurement device on the basis of the information about the quantity of the carbon compound(s).
System and method for calibrating a PET scanner
A method and system for calibrating a PET scanner are described. The PET scanner may have a field of view (FOV) and multiple detector rings. A detector ring may have multiple detector units. A line of response (LOR) connecting a first detector unit and a second detector unit of the PET scanner may be determined. The LOR may correlate to coincidence events resulting from annihilation of positrons emitted by a radiation source. A first time of flight (TOF) of the LOR may be calculated based on the coincidence events. The position of the radiation source may be determined. A second TOF of the LOR may be calculated based on the position of the radiation source. A time offset may be calculated based on the first TOF and the second TOF. The first detector unit and the second detector unit may be calibrated based on the time offset.
X-RAY DIFFRACTION AND X-RAY SPECTROSCOPY METHOD AND RELATED APPARATUS
A method and apparatus for rapid measurement and analysis of structure and composition of poly-crystal materials by X-ray diffraction and X-ray spectroscopy, which uses a two-dimensional energy dispersive area detector having an array of pixels, and a white spectrum X-ray beam source. A related data processing method includes separating X-ray diffraction and spectroscopy signals in the energy dispersive X-ray spectrum detected by each pixel of the two-dimensional energy dispersive detector; correcting the detected X-ray diffraction signals by a correction function; summing the corrected X-ray diffraction signals and X-ray spectroscopy signals, respectively, over all pixels to obtain an enhanced diffraction spectrum and an enhanced spectroscopy spectrum; using the enhanced diffraction and spectroscopy spectrum respectively to determine the structure and composition of the sample. The summing step includes using Bragg's equation to convert the intensity-energy diffraction spectrum for each pixel into an intensity-lattice spacing spectrum before summing them.
Method for improving an EBSD/TKD map
A method for improving the quality/integrity of an EBSD/TKD map, wherein each data point is assigned to a corresponding grid point of a sample grid and represents crystal information based on a Kikuchi pattern detected for the grid point; comprising determining a defective data point of the EBSD/TKD map and a plurality of non-defective neighboring data points, comparing the position of Kikuchi bands of a Kikuchi pattern detected for a grid point corresponding to the defective data point with the positions of bands in at least one simulated Kikuchi pattern corresponding to crystal information of the neighboring data points and assigning the defective data point the crystal information of one of the plurality of neighboring data point based on the comparison.
Inspection apparatus and inspection method
An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.
Inspection apparatus and inspection method
An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector has an energy resolution not less than 1 keV or the X-ray detector has no energy analysis function.
Inspection apparatus and inspection method
An inspection apparatus for inspecting an inspection target object, includes an X-ray generation tube having a target including an X ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to an inspection target surface of the inspection target object, an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X ray generation portion and totally reflected by the inspection target surface, and an adjustment mechanism configured to adjust a relative position between the inspection target surface and the X-ray detector.
IN SITU MICROSCOPY OF ROTATIONALLY DEFORMED SAMPLE
A method of observing a solid sample (100) with a microscope (300), comprising engaging a rotating portion (110) with a first part (104) of the sample (100), holding a second part (106) of the sample (100), and rotating the rotating portion (110) so as to rotate the first part (104) of the sample (100) relative to the second part (106) of the sample (100).