A computer-assisted method for determining an element fraction of a determination element, in particular with a small atomic number, especially lithium, of an examination region of a sample bombarded with primary electrons, wherein a backscattered electron signal, preferably a backscattered electron image, captured using a backscattered electron detector and a spectroscopy element composition of the examination region determined using an X-ray spectroscopy detector, such as an EDX detector, are obtained. A practicable quantitative determination can be achieved if a measured gray value SM determined from the backscattered electron signal is combined with element fractions of the spectroscopy element composition in order to determine a fraction of the determination element. A device for processing data and to a computer product for carrying out the method is also disclosed.

The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.

The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.

An analyzer includes a wavelength-dispersive X-ray spectrometer and a control unit that controls the wavelength-dispersive X-ray spectrometer, the control unit performing: processing of acquiring an analysis result of preparatory analysis performed on a specimen to be analyzed; processing of setting spectroscopic conditions for WDS analysis using the wavelength-dispersive X-ray spectrometer based on the analysis result of the preparatory analysis; and processing of performing the WDS analysis on the specimen to be analyzed under the set spectroscopic conditions.

A system and method for stress testing a sample, the system comprising a high-intensity laser unit and a target for laser-matter interaction, wherein the high-intensity laser unit delivers an intensity of at least 10.sup.13 W/cm.sup.2 on the target, and resulting laser-accelerated particles generated by the target irradiate the sample.

The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample, and scanning said charged particle beam over at least part of said sample. A first detector is used for obtaining measured detector signals corresponding to emissions of a first type from the sample at a plurality of sample positions. According to the method, a set of data class elements is provided, wherein each data class element relates an expected detector signal to a corresponding sample information value. The measured detector signals are processed, and processing comprises comparing said measured detector signals to said set of data class elements; determining at least one probability that said measured detector signals belong to a certain one of said set of data class elements; and assigning at least one sample information value and said at least one probability to each of the plurality of sample positions. Finally, sample information values and corresponding probability can be represented in data.

A magnetic material observation method in accordance with the present invention includes: an irradiating step including irradiating a region of a sample with an excitation beam and thereby allowing a magnetic element contained in the sample to radiate a characteristic X-ray; a detecting step including detecting intensities of a right-handed circularly polarized component and a left-handed circularly polarized component contained in the characteristic X-ray; and a calculating step including calculating the difference between the intensity of the right-handed circularly polarized component and the intensity of the left-handed circularly polarized component. Reference to such a difference enables precise measurement of the direction or magnitude of magnetization without strict limitations as to the sample.

Apparatus include a reflector positioned adjacent to a sample location that is situated to receive a charged particle beam (CPB) along a CPB axis from a CPB focusing assembly so that the reflector is situated to receive light emitted from a sample at the sample location based on a CPB-sample interaction or a photon-sample interaction and to direct the light to a photodetector, and a steering electrode situated adjacent to the reflector so as to direct secondary charged particles emitted from the sample based on the CPB-sample interaction away from the reflector and CPB axis. Methods and systems are also disclosed.

A system and method for imaging a sample having a complex structure (such as an integrated circuit) implements two modes of operation utilizing a common electron beam generator that produces an electron beam within a chamber. In the first mode, the electron beam interacts directly with the sample, and backscattered electrons, secondary electrons, and backward propagating fluorescent X-rays are measured. In the second mode, the electron beam interrogates the sample via X-rays generated by the electron beam within a target that is positioned between the electron beam generator and the sample. Transmitted X-rays are measured by a detector within the vacuum chamber. The sample is placed on a movable platform to precisely position the sample with respect to the electron beam. Interferometric and/or capacitive sensors are used to measure the position of the sample and movable platform to provide high accuracy metadata for performing high resolution three-dimensional sample reconstruction.

A system and method for imaging a sample having a complex structure (such as an integrated circuit) implements two modes of operation utilizing a common electron beam generator that produces an electron beam within a chamber. In the first mode, the electron beam interacts directly with the sample, and backscattered electrons, secondary electrons, and backward propagating fluorescent X-rays are measured. In the second mode, the electron beam interrogates the sample via X-rays generated by the electron beam within a target that is positioned between the electron beam generator and the sample. Transmitted X-rays are measured by a detector within the vacuum chamber. The sample is placed on a movable platform to precisely position the sample with respect to the electron beam. Interferometric and/or capacitive sensors are used to measure the position of the sample and movable platform to provide high accuracy metadata for performing high resolution three-dimensional sample reconstruction.