An X-ray inspection apparatus includes an X-ray generator; an X-ray detector; and a determination unit determining a quality state of an inspection object, based on an X-ray detection signal. The apparatus has an X-ray image storing unit storing a first inspection image, corresponding to the X-ray detection signal outputted from the X-ray detector, whose observation direction is the direction in which the X-rays transmits the inspection object; a pseudo three-dimensional information generation model generating pseudo three-dimensional information regarding a type of object to be learned; and an inspection image generation unit creating a second inspection image regarding the type of object to be learned having an observation direction different from the first inspection image, based on the first inspection image regarding the type of object to be learned. The determination unit performs the determination based on at least the second inspection image created by the inspection image generation unit.

Methods and systems for characterizing dimensions and material properties of semiconductor devices by full beam x-ray scatterometry are described herein. A full beam x-ray scatterometry measurement involves illuminating a sample with an X-ray beam and detecting the intensities of the resulting zero diffraction order and higher diffraction orders simultaneously for one or more angles of incidence relative to the sample. The simultaneous measurement of the direct beam and the scattered orders enables high throughput measurements with improved accuracy. The full beam x-ray scatterometry system includes one or more photon counting detectors with high dynamic range and thick, highly absorptive crystal substrates that absorb the direct beam with minimal parasitic backscattering. In other aspects, model based measurements are performed based on the zero diffraction order beam, and measurement performance of the full beam x-ray scatterometry system is estimated and controlled based on properties of the measured zero order beam.

An object of the present disclosure is to obtain sufficient analysis accuracy and throughput when a sample is analyzed using two or more element analysis devices having different energy resolutions. An analysis system according to the present disclosure performs elemental analysis by using a second element analysis device having higher energy resolution than a first element analysis device, based on a result obtained by comparing a first energy spectrum of a target sample acquired by using the first element analysis device with a second energy spectrum of a reference sample acquired by using the first element analysis device (see FIG. 2).

A sensor system that can be used to analyze parts/components associated with agricultural equipment using one or more radio frequency (RF) or microwave frequency signals. For example, the sensor system can be used to analyze a part/component to detect metal fatigue, micro-cracks, thermal stress, defects, deformations, and other possible indicators of overstress and/or failure. The parts/components that can be analyzed are any parts/components associated with or used on agricultural equipment.

An X-ray imaging system is disclosed, comprising an X-ray source; a sample position; a detector arranged to detect X-ray radiation downstream of said sample position; wherein said X-ray source comprises an electron source arranged to provide an electron beam; a target arranged to produce X-ray radiation upon impact by said electron beam, the target comprising a substrate and a target layer at least partly covering said substrate, wherein said target layer is arranged to produce X-ray radiation upon impact by said electron beam; means for directing the electron beam to a first position on said target layer and a second position selected from a position on said target at which the electron beam impacts directly upon the substrate and a position on an electron beam dump arranged so that substantially no X-ray radiation created by interaction between the electron beam and the electron beam dump reaches the detector; a controller arranged to record, using said detector, a first image with the electron beam directed to said first position, and a second image with the electron beam directed to said second position, and generate a difference image between the first image and the second image. A method for X-ray imaging is also disclosed.

The present invention relates to a system (S) and a process for determining the water equivalent content of a snowpack (Snow Water EquivalentSWE).

A compositional visualization system comprises a sensor to collect contextual information, a particle generator to generate a first stream of one or more types of particles, and a detector to receive a second stream of one or more detectable products. The second stream is generated by interaction of the first stream with the environment. The system further comprises computer-executable instructions to cause the system to transform the received second stream into compositional data, and merge the compositional data with the contextual information to generate a merged digital representation. The merged digital representation can be displayed at one or more devices and can also be used directly to drive autonomous robotic systems.

A crystal structure analysis in which: each of a plurality of samples are irradiated while the angle of incidence is continuously changed by rotating the crystal, whereby diffraction spot intensity and reliability for a plurality of crystal lattice planes are determined and a data set (Data-1, Data-2, Data-3, . . . , Data-n) is acquired; whether or not to perform merging, which is a process of combining multiple sets of data into one, is determined for each individual set of data on the basis of a merging criterion (e.g., Rint, completeness); merging is performed on data for which merging is to be performed; and a crystal structure is determined according to merged data. A crystal structure analysis result is obtained in a crystal structure analysis method, a crystal structure analysis device, and a crystal structure analysis program in which a crystal structure is determined by data-processing and analyzing a plurality of diffraction profiles.

An evaluation method of a negative electrode active material for secondary battery includes measuring an X-ray diffraction of a battery cell stored in a charged state; calculating intensity integrals of extracted diffraction peaks, where the extracted diffraction peaks are extracted from X-ray diffraction peaks for a carbon interlayer compounds and a decomposed products contained respectively in a negative electrode active layer of a negative electrode from the measured X-ray diffraction; calculating a reaction rate constant k.sub.1 for the carbon interlayer compounds or a reaction rate constant k.sub.1 for the decomposed products of the carbon interlayer compounds from the calculated intensity integral; and evaluating a material suitability of the negative electrode active material contained in the negative electrode active layer based on the calculated reaction rate constant.