The present invention relates to a device for phase stepping in phase contrast image acquisition, the device (1) comprising: a mobile grating (10); a guiding element (11); a restoring element (12); and a locking element (13); wherein the guiding element (11) is configured to guide the mobile grating (10) between a first position (2) and a second position (3); wherein the restoring element (12) is configured to apply a force to the mobile grating (10); wherein the force is directed from the first position (2) to the second position (3); and wherein the locking element (13) is configured to releasably lock the mobile grating (10) in the first position (2). In an example, during the motion of the mobile grating (10) back to equilibrium, a decoder (11a) for the position of the mobile grating (10) along the guiding element (11) may trigger at least four measurement frames over a period of at least 2*Pi. The invention provides a device (1) for phase stepping in phase contrast image acquisition which provides a fast image acquisition without a significant delay and which reduces positional inaccuracies and which avoids back-lash.

An X-ray inspection apparatus includes an X-ray source that radiates X-rays to a product, an X-ray detection unit that detects X-rays penetrating the product, and an uninterruptible power supply that supplies electric power during an electric power failure. The uninterruptible power supply is not electrically connected to the X-ray source.

A foreign object inspection device is provided. The device reduces the risk of a failure to detect a foreign object. A direction normal to a principal surface is inclined with respect to a direction in which an intensity of electromagnetic waves emitted from an electromagnetic wave generating source is greatest.

The X-ray phase imaging apparatus includes an imaging system, a position switching mechanism for switching between a retracted position and an imaging position, a control unit for controlling switching between the retracted position and the imaging position, and an image processing unit for generating an X-ray phase contrast image based on the first image and the second image. The control unit is configured to control sequentially imaging at the retracted position and imaging at the imaging position.

There is provided an acquiring method of a projection image of a sample whose shape is uneven with respect to a rotation center, the method comprising the steps of setting the sample S0 at a position of the rotation center C0 provided between an X-ray source 116a and a detector 117, and acquiring the projection image of the sample S0 at each different rotation angle for each different magnification ratio over a rotation angle of 180 or more by rotating the sample S0 around the rotation center C0, and by relatively changing a separation distance between the X-ray source and the rotation center, or a separation distance between the rotation center and the detector in an optical axis direction according to the shape of the sample S0 and the rotation angle of the sample S0.

An X-ray phase contrast imaging system includes an X-ray source, a detector, a plurality of gratings including a first grating and a second grating, and a grating positional displacement acquisition section configured to obtain a positional displacement of the grating based on a Fourier transform image obtained by Fourier transforming an interference fringe image detected by the detector.

An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit (210) between an X-ray source (4) and a sample (6); and optionally a further slit (220, 220a). A controller (17) is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit (210) limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit (220) does not limit the divergence of the incident beam. At the third width: the adjustable slit (210) does not limit the divergence of the incident beam, and the further slit (220) limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit (210) continues to limit the area irradiated.

An electron diffraction imaging system for imaging the three-dimensional structure of a single target molecule of a sample uses an electron source that emits a beam of electrons toward the sample, and a two-dimensional detector that detects electrons diffracted by the sample and generates an output indicative of their spatial distribution. A sample support is transparent to electrons in a region in which the sample is located, and is rotatable and translatable in at least two perpendicular directions. The electron beam has an operating energy between 5 keV and 30 keV, and beam optics block highly divergent electrons to limit the beam diameter to no more than three times the size of the sample molecule and provide a lateral coherence length of at least 15 nm. An adjustment system adjusts the sample support position in response to the detector output to center the target molecule in the beam.

An X-ray system includes a multiple degree of freedom robotic arm mounted to a surface of a radiology suite, the robotic arm having one or more telescoping arm members, an X-ray source mounted on an end effector of the multiple degree of freedom robotic arm, at least one X-ray detector, and a work station coupled to the robotic arm, X-ray source, and X-ray detector, wherein the work station is configured to compute robotic arm trajectories for at least one scanning procedure and to control the robotic arm, X-ray source, and X-ray detector to effect the at least one scanning procedure.

The present disclosure discloses a radiation inspection system and a radiation inspection method. The radiation inspection system comprises a radiation source and a beam modulating device. The beam modulating device comprises a first collimating structure disposed at a beam exit side of the radiation source and a second collimating structure disposed at a beam exit side of the first collimating structure. The second collimating structure is movable relative to the first collimating structure to change a relative position of the first collimating port of the first collimating structure with the second collimating port of the second collimating structure, and the beam modulating device is shifted between a first operational state in which the beam modulating device modulates an initial beam into a fan beam, and a second operational state in which the beam modulating device modulates the initial beam into a pencil beam variable in position.