G01N2223/418

INSPECTION DEVICE AND INSPECTION METHOD
20230100104 · 2023-03-30 ·

An inspection device includes control unit that acquires pre-charging irradiation amounts for inspection areas on an inspection target. The pre-charging irradiation amounts are based on pattern information for each of the inspection areas. An irradiation unit is provided to control a plurality of first beams to supply the pre-charging irradiation amounts to each of the inspection areas using a corresponding one of the plurality of first beams. After supplying the respective pre-charging irradiation amount to at least one of the inspection areas, irradiation unit controls one of a plurality of second beams to irradiate a pre-charged one of the inspection areas. A generation unit generates images of each of the plurality of inspection areas based on the respective irradiation of the inspection areas with the second beams.

CHARGED PARTICLE BEAM IMAGE PROCESSING DEVICE AND CHARGED PARTICLE BEAM APPARATUS INCLUDING THE SAME

To provide a charged particle beam image processing device in which a proper inspection region for an observation image that includes an edge of a line pattern can be set.

A charged particle beam image processing device performs image processing on an observation image generated by a charged particle beam apparatus, the charged particle beam image processing device includes: an extraction unit configured to extract an edge of a line pattern from an inspection region of the observation image; a division unit configured to divide the inspection region into sections each having a plurality of measurement points; a measurement unit configured to measure a line edge roughness in each of the sections and generate distribution data of the line edge roughness in each section; a calculation unit configured to calculate a line edge roughness in the entire inspection region and calculate a theoretical curve of the line edge roughness in each section; and a determination unit configured to determine whether the inspection region is proper based on a comparison between the distribution data and the theoretical curve.

CHARGED PARTICLE BEAM APPARATUS

A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.

UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMAGES FROM RAW IMAGES AUTOMATICALLY

A method for evaluating images of a printed pattern. The method includes obtaining a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying one or more features of the first averaged image. The method further includes evaluating the first averaged image, using an image quality classification model and based at least on the one or more features. The evaluating includes determining, by the image quality classification model, whether the first averaged image satisfies a metric.

ANALYSIS DEVICE AND ANALYSIS METHOD
20220349848 · 2022-11-03 · ·

An analysis and observation device includes an analysis unit, a primary storage device that reads a substance library in which types of substances are associated with a plurality of characteristics, and a processor that executes processing based on the substance library. The substance library is configured by storing hierarchical information of superclasses each of which represents a general term of a substance and subclasses each of which represents a type of the substance. A processor includes: a spectrum acquirer that acquires an intensity distribution spectrum; a characteristic extractor that extracts a characteristic of a substance based on the intensity distribution spectrum; a substance estimator that estimates the type of the substance from subclasses based on the extracted characteristic; and a user interface controller that causes a display to display the estimated subclass and the superclass to which the subclass belongs in a hierarchical manner.

Imaging system and method for specimen detection

An imaging system includes: a micro computed tomography (micro-CT) subsystem, a specimen processing subsystem, a scanning electron microscopy (SEM) and a processor. The micro-CT subsystem includes an X-ray source and an X-ray detector, and is configured to acquire a three-dimensional image of a specimen. The specimen processing subsystem includes a focused ion beam subsystem and a mechanical cutting device. The focused ion beam subsystem is configured to process the specimen in a first processing manner, and the mechanical cutting device is configured to process the specimen in a second processing manner to obtain a target section of a target area. The SEM is located above the specimen and is configured to acquire a two-dimensional image of the target section. The processor is configured to perform three-dimensional reconstruction on the two-dimensional images to obtain a three-dimensional imaging of the specimen.

METHOD FOR PROCESSING SAMPLED PROPPANT DURING HYDRAULIC FRACTURING
20230123954 · 2023-04-20 · ·

A method for processing proppant from a well. A plurality of proppant samples are collected during drilling of a well for imaging analysis. In addition to imaging analysis a further correction factor is determined for the samples using additional analysis on a portion of the samples. Determining and applying the correction factor to the imaging results provides a more accurate proppant log. The additional analysis can be by scanning electron microscopy, such as for differentiating the silicon proppant particles from other elemental particles resulting from the drilling.

Three-dimensional surface metrology of wafers

A computer-based method for three-dimensional surface metrology of samples based on scanning electron microscopy and atomic force microscopy. The method includes: (i) using a scanning electron microscope (SEM) to obtain SEM data of a set of sites on a surface of a sample; (ii) using an atomic force microscope (AFM) to measure vertical parameters of sites in a calibration subset of the set; (iii) calibrating an algorithm, configured to estimate a vertical parameter of a site when SEM data of the site are fed as inputs, by determining free parameters of the algorithm, such that residuals between the algorithm-estimated vertical parameters and the AFM-measured vertical parameters are about minimized; and (iv) using the calibrated algorithm to estimate vertical parameters of the sites in the complement to the calibration subset.

CHARGED PARTICLE BEAM DEVICE

The present invention provides a charged particle beam device with which optimal parameters for the device can be effectively derived in a short time period. This charged particle beam device comprises: an electron gun (1) that irradiates a sample (10) with an electron beam (2); an image processing unit (901) that acquires an image of the sample (10) from a signal (12) generated by the sample (10) due to the electron beam (2); a database (604) that holds correspondence between a first parameter that is an optical condition, a second parameter that is a value pertaining to device performance, and a third parameter that is information pertaining to the device configuration, and stores a plurality of analysis values and measurement values; and a learning machine (605) that searches the database (604) and derives a first parameter that satisfies a target value of the second parameter.

Radiation Analysis System, Charged Particle Beam System, and Radiation Analysis Method
20230161053 · 2023-05-25 ·

This radiation analysis system comprises a transition edge sensor that detects radiation, a current detection mechanism that detects a current flowing in the transition edge sensor, and a computer sub-system that processes a current detection signal from the current detection mechanism. The computer sub-system is characterized by executing: a process for calculating a baseline current of the current detection signal; a process for calculating a wave height value of a signal pulse produced in the detection signal when the transition edge sensor has detected radiation; a process for acquiring correlation data based on the baseline current and the wave height value; and a process for correcting the wave height value of the signal pulse, or an energy value calculated from the wave height value, on the basis of the correlation data and the baseline current from before production of the signal pulse when radiation having unknown energy is detected by the transition edge sensor.