A method and apparatus for performing an X-ray diffraction measurement with a diffractometer having an X-ray beam directed at a sample and a two-dimensional X-ray detector includes the performance of a physical scan during which the detector is moved through a scanning range in an angular direction about the sample position. To provide a uniform exposure time, the detector, when located at an extreme of the scanning range, is controlled to progressively change the portion of the detected X-ray energy that is used at a rate that maintains a uniform exposure time for each angular position in the scanning range. Alternatively, when located at an extreme of the range, the detector is kept stationary until a desired minimum exposure time is obtained for each angular position, after which the collected diffraction data is normalized relative to exposure time.

In summary, the present invention proposes embodying an X-ray detector (21) with a plurality of detector modules (1, 1a-1g), each comprising dead zones (6) without X-ray sensitivity and active zones (3, 3a-3c) with X-ray sensitivity that is spatially resolved in a measurement direction (MR), wherein the detector modules (1, 1a-1g) are embodied successively and in an overlapping fashion along the measurement direction (MR), such that in overlap regions (23a-23e) the dead zone (6) of one detector module (1, 1a-1g) is bridged by an active zone (3, 3a-3c) of another detector module (1, 1a-1g). The overlapping detector modules (1, 1a-1g) are arranged next to one another in the transverse direction (QR) in the overlap regions (23a-23e), wherein the transverse direction (QR) runs transversely with respect to the local measurement direction (MR) and transversely with respect to a local connection direction (VR) with respect to a sample position (91). The X-ray detector (21) makes it possible, in a simple manner, to obtain gapless, one-dimensional measurement information, in particular X-ray diffraction information, from a measurement sample (96) at the sample position (91).

Provided is a method of analyzing a diffraction pattern of a mixture, the method including: a first step of fitting, through use of a fitting pattern including a term obtained by multiplying a known target pattern indicating a target component by a first intensity ratio, and a term obtained by multiplying an unknown pattern indicating a residual group consisting of one or more residual components by a second intensity ratio, and having the first intensity ratio, the second intensity ratio, and the unknown pattern as fitting parameters, the fitting pattern to the observed pattern by changing the first and the second intensity ratio in a state where the unknown pattern is set to an initial pattern; and a second step of fitting the fitting pattern to the observed pattern by changing the unknown pattern while restricting the changes of the first and the second intensity ratio.

A method for displaying measurement results from X-ray diffraction measurement, in which a sample is irradiated with X-rays and the X-rays diffracted by the sample are detected by an X-ray detector, comprises: (1) forming a one-dimensional diffraction profile by displaying, on the basis of output data from an X-ray detector, a profile in which one orthogonal coordinate axis shows 2 angle values and another orthogonal coordinate axis shows X-ray intensity values; (2) forming a two-dimensional diffraction pattern by linearly displaying X-ray intensity data, for each 2 angle value and on the basis of output data from the X-ray detector; the X-ray intensity data being present in the circumferential direction of a plurality of Debye rings formed at each 2 angle by diffracted X-rays; and (3) displaying the two-dimensional diffraction pattern and the one-dimensional diffraction profile so as to be aligned such that the 2 angle values of both coincide with each other.

A crystalline phase contained in a sample is identified, from X-ray diffraction data of the sample which contain data of a plurality of ring-shaped diffraction patterns, using a database in which are registered data related to peak positions and peak intensity ratios of X-ray diffraction patterns for a plurality of crystalline phases. Peak positions and peak intensities for a plurality of the diffraction patterns are detected from the X-ray diffraction data (step 102), and the circumferential angle versus intensity data of the diffraction patterns is created (step 103). The diffraction patterns are grouped into a plurality of clusters on the basis of the circumferential angle versus intensity data (step 105). Crystalline phase candidates contained in the sample are searched from the database on the basis of sets of ratios of peak positions and peak intensities of the diffraction patterns grouped into the same cluster (step 106).

Provided are an operation guide system, an operation guide method, and an operation guide program, which are capable of allowing a user to easily understand measurement of an X-ray optical system to be selected. A crystalline quantitative phase analysis device includes qualitative phase analysis result acquisition means for acquiring information on a plurality of crystalline phases contained in a sample, and weight ratio calculation means for calculating a weight ratio of the plurality of crystalline phases based on a sum of diffracted intensities corrected with respect to a Lorentz-polarization factor, a chemical formula weight, and a sum of squares of numbers of electrons belonging to each of atoms contained in a chemical formula unit, in the plurality of crystalline phases.

A method of quantitative X-ray analysis includes capturing X-ray fluorescence data from a pressed powder sample including a binder. A quantity and/or distribution of binder is assumed and the concentration of various components of the sample is calculated from the measured data and the assumed quantity of binder. Then, the concentration of binder is adjusted and the calculation step repeated until the method converges. The method is allowed to take widely different values of quantity of binder, which may be the concentration of the binder in the sample or alternatively the thickness of an assumed thin layer at the surface of a model used for calculation.

A method and apparatus for performing an X-ray diffraction measurement with a diffractometer having an X-ray beam directed at a sample and a two-dimensional X-ray detector includes the performance of a physical scan during which the detector is moved through a scanning range in an angular direction about the sample position. To provide a uniform exposure time, the detector, when located at an extreme of the scanning range, is controlled to progressively change the portion of the detected X-ray energy that is used at a rate that maintains a uniform exposure time for each angular position in the scanning range. Alternatively, when located at an extreme of the range, the detector is kept stationary until a desired minimum exposure time is obtained for each angular position, after which the collected diffraction data is normalized relative to exposure time.

An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.

A method of manufacturing a component includes providing a powder layer; scanning the powder layer using an electron beam; detecting back scattered electrons produced by the interaction of the electron beam with the powder layer; identifying, from the detected back scattered electrons, any defects in the powder layer; selectively melting at least a part of the powder layer so as to generate a solid layer; and repeating these steps at least once so as to build up a shape corresponding to the component. The method may also includes steps of making a decision about whether to remove any identified defects in the powder layer, and adjusting one or more parameters of the step of providing a powder and/or adjusting one or more parameters of the selective melting step so as to avoid future recurring defects at that position based on stored data relating to the scanned powder layer.