An atomic force microscope (AFM) and method of operating the same includes a separate Z height sensor to measure, simultaneously with AFM system control, probe sample distance, pixel-by-pixel during AFM data acquisition. By mapping the AFM data to low resolution data of the Z height data, a high resolution final data image corrected for creep is generated in real time.

An atomic force microscope (AFM) and method of operating the same includes a separate Z height sensor to measure, simultaneously with AFM system control, probe sample distance, pixel-by-pixel during AFM data acquisition. By mapping the AFM data to low resolution data of the Z height data, a high resolution final data image corrected for creep is generated in real time.

An atomic-force-microscope-based apparatus and method including hardware and software, configured to collect, in a dynamic fashion, and analyze data representing mechanical properties of soft materials on a nanoscale, to map viscoelastic properties of a soft-material sample. The use of the apparatus as an addition to the existing atomic-force microscope device.

A scanning probe microscope 1 is provided with a control unit 15. The control unit 15 includes a signal acquisition processing unit 151, an image acquisition processing unit 152, a scanning condition change processing unit 154, a scanning processing unit 155, and a noise determination processing unit 156. In the scanning probe microscope 1, when removing noise included in a surface image of a sample, the scanning condition change processing unit 154 changes a scanning condition. And, the signal acquisition processing unit 151 acquires an output signal from a detection unit 12. The image acquisition processing unit 152 acquires a surface image of a sample S based on the output signal. The noise determination processing unit 156 determines whether or not noise is inclined in the output signal contains noise based on the change in the output signal or the change in the surface image of the sample S when the scanning condition is changed by the scanning condition change processing unit 154. Therefore, if noise is included in the output signal, it is possible to correctly determinate the fact.

A scanning probe microscope 1 is provided with a control unit 15. The control unit 15 includes a signal acquisition processing unit 151, an image acquisition processing unit 152, a scanning condition change processing unit 154, a scanning processing unit 155, and a noise determination processing unit 156. In the scanning probe microscope 1, when removing noise included in a surface image of a sample, the scanning condition change processing unit 154 changes a scanning condition. And, the signal acquisition processing unit 151 acquires an output signal from a detection unit 12. The image acquisition processing unit 152 acquires a surface image of a sample S based on the output signal. The noise determination processing unit 156 determines whether or not noise is inclined in the output signal contains noise based on the change in the output signal or the change in the surface image of the sample S when the scanning condition is changed by the scanning condition change processing unit 154. Therefore, if noise is included in the output signal, it is possible to correctly determinate the fact.

In one embodiment, a method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, and identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information. The method also includes determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, analyzing the feature edge positions to determine errors in the manufacture of the pattern structure, and controlling a lithography tool based on the analysis of the feature edge positions.

In one embodiment, a method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, and identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information. The method also includes determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, analyzing the feature edge positions to determine errors in the manufacture of the pattern structure, and controlling a lithography tool based on the analysis of the feature edge positions.

This invention is directed to a pattern height information correction system which includes a contour line information of a pattern extracted from an acquired image including at least an AFM (atomic force microscope) module, a design information database that stores design information including at least layer information, and a computer system that divides the extracted pattern into regions based on the design information stored in the design information database relating to the extracted pattern and associates the divided regions with layer information, in which the computer system specifies a horizontal region designated as horizontal in advance from the divided regions, creates an approximated curved surface based on the specified horizontal region corresponding to the same layer information, and corrects height information of the extracted pattern using the approximated curved surface.

This invention is directed to a pattern height information correction system which includes a contour line information of a pattern extracted from an acquired image including at least an AFM (atomic force microscope) module, a design information database that stores design information including at least layer information, and a computer system that divides the extracted pattern into regions based on the design information stored in the design information database relating to the extracted pattern and associates the divided regions with layer information, in which the computer system specifies a horizontal region designated as horizontal in advance from the divided regions, creates an approximated curved surface based on the specified horizontal region corresponding to the same layer information, and corrects height information of the extracted pattern using the approximated curved surface.

A method for assessing the quality of a tip of a scanning probe microscope (SPM) includes recording an SPM image, extracting a plurality of images of dangling bonds from the SPM image, feeding the extracted images of dangling bonds into a convolution neural network one image at a time, analyzing each of the plurality of images of dangling bonds using the convolution neural network, assigning each of the plurality of images of dangling bonds one of a sharp tip status or a double tip status, and determining whether the number of the plurality of images of dangling bonds of the SPM image assigned the double tip status exceeds a predetermined threshold. A method of automatically conditioning a tip of a scanning probe microscope (SPM) during imaging of a sample and a method of mass-producing atomistic quantum dots, qubits, or particular atom orbital occupation are also provided.