The invention relates to an integrated circuit with an active transistor area and a plurality of wiring layers arranged above the active transistor area. At least one optical device is integrated in the active transistor area. The optical device is electrically connected with at least one of the wiring layers. At least one optical tunnel extends from the at least one optical device through the plurality of wiring layers to a surface of an uppermost wiring layer of the plurality of wiring layers facing away from the active transistor area.

The invention relates to an integrated circuit with an active transistor area and a plurality of wiring layers arranged above the active transistor area. At least one optical device is integrated in the active transistor area. The optical device is electrically connected with at least one of the wiring layers. At least one optical tunnel extends from the at least one optical device through the plurality of wiring layers to a surface of an uppermost wiring layer of the plurality of wiring layers facing away from the active transistor area.

Various examples are provided related to scanning tunneling thermometers and scanning tunneling microscopy (STM) techniques. In one example, a method includes simultaneously measuring conductance and thermopower of a nanostructure by toggling between: applying a time modulated voltage to a nanostructure disposed on an interconnect structure, the time modulated voltage applied at a probe tip positioned over the nanostructure, while measuring a resulting current at a contact of the interconnect structure; and applying a time modulated temperature signal to the nanostructure at the probe tip, while measuring current through a calibrated thermoresistor in series with the probe tip. In another example, a device includes an interconnect structure with connections to a first reservoir and a second reservoir; and a scanning tunneling probe in contact with a probe reservoir. Electrical measurements are simultaneously obtained for temperature and voltage applied to a nanostructure between the reservoirs.

Various examples are provided related to scanning tunneling thermometers and scanning tunneling microscopy (STM) techniques. In one example, a method includes simultaneously measuring conductance and thermopower of a nanostructure by toggling between: applying a time modulated voltage to a nanostructure disposed on an interconnect structure, the time modulated voltage applied at a probe tip positioned over the nanostructure, while measuring a resulting current at a contact of the interconnect structure; and applying a time modulated temperature signal to the nanostructure at the probe tip, while measuring current through a calibrated thermoresistor in series with the probe tip. In another example, a device includes an interconnect structure with connections to a first reservoir and a second reservoir; and a scanning tunneling probe in contact with a probe reservoir. Electrical measurements are simultaneously obtained for temperature and voltage applied to a nanostructure between the reservoirs.

A Surface Plasmon Scanning-Tunneling Chemical Mapping (SPSTM) system is disclosed that determines identification characteristics of a target material. An optical beam source launches an optical beam that propagates through a transparent optical element to a material layer to excite surface plasmons of the material layer. An optical probe with a nanometer-sized tip is positioned over a nanometer-sized region of the target material, which is positioned on the material layer, to measure a probe signal associated only with the surface plasmons that tunnel from the material layer through the nanometer-sized region of the target material and collected by the optical probe. An optical property analyzer is configured to determine at least one optical property associated with the nanometer-sized region based on the probe signal associated with the surface plasmons collected by the optical probe. The optical properties identify identification characteristics associated with the nanometer-sized region of the target material.

Various examples are provided related to scanning tunneling thermometers and scanning tunneling microscopy (STM) techniques. In one example, a method includes simultaneously measuring conductance and thermopower of a nanostructure by toggling between: applying a time modulated voltage to a nanostructure disposed on an interconnect structure, the time modulated voltage applied at a probe tip positioned over the nanostructure, while measuring a resulting current at a contact of the interconnect structure; and applying a time modulated temperature signal to the nanostructure at the probe tip, while measuring current through a calibrated thermoresistor in series with the probe tip. In another example, a device includes an interconnect structure with connections to a first reservoir and a second reservoir; and a scanning tunneling probe in contact with a probe reservoir. Electrical measurements are simultaneously obtained for temperature and voltage applied to a nanostructure between the reservoirs.

In order to meet the needs of the semi-conductor industry as it requires finer lithography nodes, a method of feedback control for scanning probe microscopy generates a microwave frequency comb of harmonics in a tunneling junction by irradiating the junction with mode-locked pulses of electromagnetic radiation. Utilizing power measurements within one or more harmonics, the tip-sample distance in the tunneling junction may be regulated for maximum efficiency and avoid tip crash when used with resistive samples. Optionally, no DC bias is required to use the method. Utilization of this method contributes to true sub-nanometer resolution of images of carrier distribution in resistive samples such as semi-conductors.

In order to meet the needs of the semi-conductor industry as it requires finer lithography nodes, a method of feedback control for scanning probe microscopy generates a microwave frequency comb of harmonics in a tunneling junction by irradiating the junction with mode-locked pulses of electromagnetic radiation. Utilizing power measurements within one or more harmonics, the tip-sample distance in the tunneling junction may be regulated for maximum efficiency and avoid tip crash when used with resistive samples. Optionally, no DC bias is required to use the method. Utilization of this method contributes to true sub-nanometer resolution of images of carrier distribution in resistive samples such as semi-conductors.

The superimposition of a periodic potential wave to the tip movement control or the bias supply of an STM, in which a microwave frequency comb is generated in its tunneling junction, may be used to reduce or eliminate artifacts or other noise generated from outside the tunneling junction.

In order to meet the needs of the semi-conductor industry as it requires finer lithography nodes, a method of feedback control for scanning probe microscopy generates a microwave frequency comb of harmonics in a tunneling junction by irradiating the junction with mode-locked pulses of electromagnetic radiation. Utilizing power measurements within one or more harmonics, the tip-sample distance in the tunneling junction may be regulated for maximum efficiency and avoid tip crash when used with resistive samples. Optionally, no DC bias is required to use the method. Utilization of this method contributes to true sub-nanometer resolution of images of carrier distribution in resistive samples such as semi-conductors.