Patent classifications
G01Q60/30
Method for SEM-guided AFM scan with dynamically varied scan speed
A method discloses topography information extracted from scanning electron microscope (SEM) images to determine the atomic force microscope (AFM) image scanning speed at each sampling point or in each region on a sample. The method includes the processing of SEM images to extract possible topography features and create a feature metric map (step 1), the conversion of the feature metric map into AFM scan speed map (step 2), and performing AFM scan according to the scan speed map (step 3). The method enables AFM scan with higher scan speeds in areas with less topography feature, and lower scan speeds in areas that are rich in topography features.
Method for SEM-guided AFM scan with dynamically varied scan speed
A method discloses topography information extracted from scanning electron microscope (SEM) images to determine the atomic force microscope (AFM) image scanning speed at each sampling point or in each region on a sample. The method includes the processing of SEM images to extract possible topography features and create a feature metric map (step 1), the conversion of the feature metric map into AFM scan speed map (step 2), and performing AFM scan according to the scan speed map (step 3). The method enables AFM scan with higher scan speeds in areas with less topography feature, and lower scan speeds in areas that are rich in topography features.
SYSTEM AND METHOD OF PERFORMING SCANNING PROBE MICROSCOPY ON A SUBSTRATE SURFACE
The invention is directed at a method of performing scanning probe microscopy on a substrate surface using a scanning probe microscopy system. A probe tip and substrate surface are moved relative to each other in one or more directions parallel to the scanning plane to position the probe tip to a scanning position on the substrate surface with the probe tip; a displacement is measured by an encoder of said probe tip in said one or more directions; and a fiducial pattern is provided fixed relative to the substrate surface, said fiducial pattern having a scannable structure that is scannable by said probe tip and said structure forming a grid of fiducial marks in said one or more dimensions; said grid dimensioned to allow for measuring placement deviations of the probe tip relative to the probe head by identifying one or more fiducial marks in the fiducial pattern.
SYSTEM AND METHOD OF PERFORMING SCANNING PROBE MICROSCOPY ON A SUBSTRATE SURFACE
The invention is directed at a method of performing scanning probe microscopy on a substrate surface using a scanning probe microscopy system. A probe tip and substrate surface are moved relative to each other in one or more directions parallel to the scanning plane to position the probe tip to a scanning position on the substrate surface with the probe tip; a displacement is measured by an encoder of said probe tip in said one or more directions; and a fiducial pattern is provided fixed relative to the substrate surface, said fiducial pattern having a scannable structure that is scannable by said probe tip and said structure forming a grid of fiducial marks in said one or more dimensions; said grid dimensioned to allow for measuring placement deviations of the probe tip relative to the probe head by identifying one or more fiducial marks in the fiducial pattern.
Systems and methods for manufacturing nano-electro-mechanical-system probes
Systems and methods for manufacturing multiple integrated tip probes for scanning probe microscopy. According to an embodiment is a microscope probe configured to analyze a sample, the microscope probe including: a movable probe tip including a terminal probe end; a first actuator configured to displace the movable probe tip along a first axis; and a detection component configured to detect motion of the movable probe tip in response to an applied signal; where the moveable probe tip comprises a metal layer affixed to a supporting layer, at least a portion of the metal layer at the terminal probe end extending past the supporting layer.
Systems and methods for manufacturing nano-electro-mechanical-system probes
Systems and methods for manufacturing multiple integrated tip probes for scanning probe microscopy. According to an embodiment is a microscope probe configured to analyze a sample, the microscope probe including: a movable probe tip including a terminal probe end; a first actuator configured to displace the movable probe tip along a first axis; and a detection component configured to detect motion of the movable probe tip in response to an applied signal; where the moveable probe tip comprises a metal layer affixed to a supporting layer, at least a portion of the metal layer at the terminal probe end extending past the supporting layer.
High range and resolution scanning probe and methods
A scanning probe used to measure and determine the features of an electrically conductive surface and which can be used to determine present corrosion state of a bare or coated metal and monitor corrosion progression under coatings that previously had to be removed to assess the present corrosion state and corrosion progression of the underlying metal surface.
High range and resolution scanning probe and methods
A scanning probe used to measure and determine the features of an electrically conductive surface and which can be used to determine present corrosion state of a bare or coated metal and monitor corrosion progression under coatings that previously had to be removed to assess the present corrosion state and corrosion progression of the underlying metal surface.
Battery Electrode Analysis Method
The present disclosure relates to a method for analyzing an electrode for a battery, which has the advantage of being capable of more easily distinguishing between the constituent materials of the electrode such as the electrode active material, the conductive material, and the pores, by using scanning spreading resistance microscopy.
Method and apparatus for detecting ferroelectric signal
A method of detecting a ferroelectric signal from a ferroelectric film and a piezoelectric force microscopy (PFM) apparatus are provided. The method includes following steps. An input waveform signal is generated, wherein the input waveform signal includes a plurality of read voltage steps with different voltage levels. The input waveform signal to the ferroelectric film is applied. An atomic force microscope probe scans over a surface of the ferroelectric film to measure a surface topography of the ferroelectric film. A deflection of the atomic force microscope probe is detected when the input waveform signal is applied to a pixel of the ferroelectric film to generate a deflection signal. Spectrum data of the pixel based on the deflection signal is generated. The spectrum data of the pixel is analyzed to determine whether the spectrum data of the pixel is a ferroelectric signal or a non-ferroelectric signal.