Patent classifications
G01Q60/30
Atomic force microscopy device, method and lithographic system
An atomic force microscopy device arranged for determining sub-surface structures in a sample comprises a scan head with a probe including a flexible carrier and a probe tip arranged on the flexible carrier. Therein an actuator applies an acoustic input signal to the probe and a tip position detector measures a motion of the probe tip relative to the scan head during scanning, and provides an output signal indicative of said motion, to be received and analyzed by a controller. At least an end portion of the probe tip tapers in a direction away from said flexible carrier towards an end of the probe tip. The end portion has a largest cross-sectional area Amax at a distance Dend from said end, the square root of the largest cross-sectional area Amax is at least 100 nm and the distance Dend is in the range of 0.2 to 2 the value of said square root.
A METHOD FOR SEM-GUIDED AFM SCAN WITH DYNAMICALLY VARIED SCAN SPEED
A method discloses topography information extracted from scanning electron microscope (SEM) images to determine the atomic force microscope (AFM) image scanning speed at each sampling point or in each region on a sample. The method includes the processing of SEM images to extract possible topography features and create a feature metric map (step 1), the conversion of the feature metric map into AFM scan speed map (step 2), and performing AFM scan according to the scan speed map (step 3). The method enables AFM scan with higher scan speeds in areas with less topography feature, and lower scan speeds in areas that are rich in topography features.
A METHOD FOR SEM-GUIDED AFM SCAN WITH DYNAMICALLY VARIED SCAN SPEED
A method discloses topography information extracted from scanning electron microscope (SEM) images to determine the atomic force microscope (AFM) image scanning speed at each sampling point or in each region on a sample. The method includes the processing of SEM images to extract possible topography features and create a feature metric map (step 1), the conversion of the feature metric map into AFM scan speed map (step 2), and performing AFM scan according to the scan speed map (step 3). The method enables AFM scan with higher scan speeds in areas with less topography feature, and lower scan speeds in areas that are rich in topography features.
METHOD AND TIP SUBSTRATE FOR SCANNING PROBE MICROSCOPY
The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.
High speed atomic force profilometry of large areas
An apparatus and method of operating an atomic force profiler (AFP), such as an AFM, using a feedforward control signal in subsequent scan lines of a large area sample to achieve large throughput advantages in, for example, automated applications.
High speed atomic force profilometry of large areas
An apparatus and method of operating an atomic force profiler (AFP), such as an AFM, using a feedforward control signal in subsequent scan lines of a large area sample to achieve large throughput advantages in, for example, automated applications.
Atomic force microscopy tips for interconnection
Embodiments relate to the design of an electronic device capable of preventing a lateral motion between a first body and a second body. The device comprises a first body comprising one or more atomic force microscopy (AFM) tips protruding from a first surface of the first body. The device further comprises a second body comprising one or more electrical contacts on a second surface of the second body. The second surface faces the first surface. The one or more electrical contacts pierced by the AFM tips of the first surface to prevent a lateral motion between the first body and the second body.
Atomic force microscopy tips for interconnection
Embodiments relate to the design of an electronic device capable of preventing a lateral motion between a first body and a second body. The device comprises a first body comprising one or more atomic force microscopy (AFM) tips protruding from a first surface of the first body. The device further comprises a second body comprising one or more electrical contacts on a second surface of the second body. The second surface faces the first surface. The one or more electrical contacts pierced by the AFM tips of the first surface to prevent a lateral motion between the first body and the second body.
ATOMIC FORCE MICROSCOPY TIPS FOR INTERCONNECTION
Embodiments relate to the design of an electronic device capable of preventing a lateral motion between a first body and a second body. The device comprises a first body comprising one or more atomic force microscopy (AFM) tips protruding from a first surface of the first body. The device further comprises a second body comprising one or more electrical contacts on a second surface of the second body. The second surface faces the first surface. The one or more electrical contacts pierced by the AFM tips of the first surface to prevent a lateral motion between the first body and the second body.
Method of controlling a probe using constant command signals
A method for commanding a tip of a probe is disclosed, wherein a command signal, representative of the force applied by said tip on the surface of a sample to be analyzed, includes at least one cycle successively defined by: a first step where the value of said command signal decreases from a maximum value (Smax) to a minimum value (Smin) so as to move said tip away from said surface at a predetermined distance called detachment height; a second step where the value of the command signal is maintained constant at said minimum value so as to maintain the tip at said detachment height; a third step where the value of the command signal increases from the minimum value up to said maximum value so as to bring the tip closer towards the surface to be analyzed until the tip comes into contact with the surface; and a fourth step where the value of the command signal is maintained constant at said maximum value to maintain the tip in contact with the surface to be analyzed under a constant force between the tip and the surface to be analyzed; the command signal being controlled between two successive steps to avoid any oscillation of the tip.