Patent classifications
G01Q60/32
Method and apparatus for correcting responsivity variation in photothermal imaging
The disclosure is directed to a method and apparatus for correcting responsivity variation in photothermal imaging. The method includes sending, during a first time period, light-driving signal to a light source so that the light source is configured to output a series of light pulses onto a sample, wherein the sample is under photothermal-induced expansion according to the series of light pulses. The method includes obtaining, during the first time period, first deflection signal from a cantilever. The method includes sending, during a second time period, actuator-driving signal to an electromechanical actuator so that the electromechanical actuator is configured to move according to the actuator-driving signal, wherein the electromechanical actuator is coupled with the sample. The method includes obtaining, during the second time period, second deflection signal from the cantilever and obtaining a photothermal image of the sample based on the first deflection signal and the second deflection signal.
Method and device of using a scanning probe microscope
A scanning probe microscope for high-speed imaging and/or nanomechanical mapping including a scanning probe comprising a cantilever with a tip at the distal end, and means for modulating a tip-sample distance separating the tip from an intended sample to be viewed with the microscope, the means for modulating being adapted to provide a direct cantilever actuation.
Method and device of using a scanning probe microscope
A scanning probe microscope for high-speed imaging and/or nanomechanical mapping including a scanning probe comprising a cantilever with a tip at the distal end, and means for modulating a tip-sample distance separating the tip from an intended sample to be viewed with the microscope, the means for modulating being adapted to provide a direct cantilever actuation.
Method of performing atomic force microscopy with an ultrasound transducer
A method of performing atomic force microscopy (AFM) measurements, uses an ultrasound transducer to transmit modulated ultrasound waves with a frequency above one GHz from the ultrasound transducer to a top surface of a sample through the sample from the bottom surface of the sample. Effects of ultrasound wave scattering are detected from vibrations of an AFM cantilever at the top surface of the sample. Before the start of the measurements, a drop of a liquid is placed on a top surface of the ultrasound transducer. The sample is placed on the top surface of the ultrasound transducer, whereby the sample presses the liquid in the drop into a layer of the liquid between the top surface of the ultrasound transducer and a bottom surface of the sample. The AFM measurements are started after a thickness of the layer of the liquid has stabilized.
Method of performing atomic force microscopy with an ultrasound transducer
A method of performing atomic force microscopy (AFM) measurements, uses an ultrasound transducer to transmit modulated ultrasound waves with a frequency above one GHz from the ultrasound transducer to a top surface of a sample through the sample from the bottom surface of the sample. Effects of ultrasound wave scattering are detected from vibrations of an AFM cantilever at the top surface of the sample. Before the start of the measurements, a drop of a liquid is placed on a top surface of the ultrasound transducer. The sample is placed on the top surface of the ultrasound transducer, whereby the sample presses the liquid in the drop into a layer of the liquid between the top surface of the ultrasound transducer and a bottom surface of the sample. The AFM measurements are started after a thickness of the layer of the liquid has stabilized.
METHODS AND SYSTEMS TO DETECT SUB-SURFACE DEFECTS IN ELECTRONICS MODULES USING SHEAR FORCE MICROSCOPY
A method of detecting sub-surface voids in a sample comprises positioning a probe adjacent to a first point on the sample, emitting an ultrasonic wave from the probe towards the sample, moving the probe towards the sample, measuring a shear force amplitude of a reflection of the ultrasonic wave at the probe as the probe moves towards the sample, creating an approach curve by plotting the measured shear force amplitude of the reflection of the ultrasonic wave as a function of a distance between the probe and the sample, and determining whether a sub-surface void exists at the first point on the sample based on a slope of the approach curve.
Atomic force microscopy system, method for mapping one or more subsurface structures located in a semiconductor device or for monitoring lithographic parameters in a semiconductor device and use of such an atomic force microscopy system
Atomic force microscopy system comprising an atomic force microscopy device and a substrate carrier having a carrier surface carrying a substrate. The substrate has a substrate main surface and a substrate scanning surface opposite the substrate main surface. The atomic force microscopy device comprises a scan head including a probe. The probe comprises a cantilever and a probe tip arranged on the cantilever. The atomic force device further comprises an actuator cooperating with at least one of the scan head or the substrate carrier for moving the probe tip and the substrate carrier relative to each other in one or more directions parallel to the carrier surface for scanning of the substrate scanning surface with the probe tip. A signal application actuator applies, during said scanning, an acoustic input signal to the substrate, said acoustic input signal generating a first displacement field in a first displacement direction only. A tip position detector monitors motion of the probe tip relative to the scan head during said scanning for obtaining an output signal. The tip position detector is arranged for monitoring motion of the probe tip only in a direction orthogonal to the displacement direction.
Torsion wing probe assembly
A torsional probe for a metrology instrument includes a cantilever coupled to a support structure via a torsion bar. The cantilever, support structure, and arms of torsion bar have substantially the same thickness.
Method and apparatus of operating a scanning probe microscope
An improved mode of AFM imaging (Peak Force Tapping (PFT) Mode) uses force as the feedback variable to reduce tip-sample interaction forces while maintaining scan speeds achievable by all existing AFM operating modes. Sample imaging and mechanical property mapping are achieved with improved resolution and high sample throughput, with the mode workable across varying environments, including gaseous, fluidic and vacuum.
Method and apparatus of operating a scanning probe microscope
An improved mode of AFM imaging (Peak Force Tapping (PFT) Mode) uses force as the feedback variable to reduce tip-sample interaction forces while maintaining scan speeds achievable by all existing AFM operating modes. Sample imaging and mechanical property mapping are achieved with improved resolution and high sample throughput, with the mode workable across varying environments, including gaseous, fluidic and vacuum.