G01Q70/10

SYSTEMS AND METHODS FOR MANUFACTURING NANO-ELECTRO-MECHANICAL-SYSTEM PROBES
20230143037 · 2023-05-11 · ·

A method for implementing a transistor using multiple integrated probe tips is provided. The method comprises the steps of (1) providing a sample; (2) providing a microscope probe comprising a plurality of probe tips; (3) contacting a first outer probe tip of the plurality of probe tips to the sample, wherein he first outer probe tip is configured to act as a source terminal for a transistor; (4) contacting a second outer probe tip of the plurality of probe tips to the sample, wherein the second outer probe tip is configured to act as a drain terminal for the transistor; (5) using an inner probe tip of the plurality of probe tips as a gate terminal for the transistor; and (6) characterizing the sample with the plurality of probe tips.

SYSTEMS AND METHODS FOR MANUFACTURING NANO-ELECTRO-MECHANICAL-SYSTEM PROBES
20230143037 · 2023-05-11 · ·

A method for implementing a transistor using multiple integrated probe tips is provided. The method comprises the steps of (1) providing a sample; (2) providing a microscope probe comprising a plurality of probe tips; (3) contacting a first outer probe tip of the plurality of probe tips to the sample, wherein he first outer probe tip is configured to act as a source terminal for a transistor; (4) contacting a second outer probe tip of the plurality of probe tips to the sample, wherein the second outer probe tip is configured to act as a drain terminal for the transistor; (5) using an inner probe tip of the plurality of probe tips as a gate terminal for the transistor; and (6) characterizing the sample with the plurality of probe tips.

METHOD OF INSPECTING TIP OF ATOMIC FORCE MICROSCOPE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

A method of operating an atomic force microscope (AFM) is provided. The method includes inspecting a sample by using the AFM and inspecting a tip of a probe of the AFM by using a characterization sample. The characterization sample includes a first characterization pattern that includes a line and space pattern of a first height, a second characterization pattern that includes a line and space pattern of a second height that is lower than the first height, and a third characterization pattern that includes a line and space pattern of a third height that is lower than the second height, and includes a rough surface.

METHOD OF INSPECTING TIP OF ATOMIC FORCE MICROSCOPE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

A method of operating an atomic force microscope (AFM) is provided. The method includes inspecting a sample by using the AFM and inspecting a tip of a probe of the AFM by using a characterization sample. The characterization sample includes a first characterization pattern that includes a line and space pattern of a first height, a second characterization pattern that includes a line and space pattern of a second height that is lower than the first height, and a third characterization pattern that includes a line and space pattern of a third height that is lower than the second height, and includes a rough surface.

PROBE PRODUCTION METHOD AND SURFACE OBSERVATION METHOD

This probe production method is a method of producing a probe (101) having a coating layer (104) on a surface thereof, in which the coating layer (104) is formed on a surface of a base material (103) having a sharp tip end portion (103a) using a gas phase method.

PROBE PRODUCTION METHOD AND SURFACE OBSERVATION METHOD

This probe production method is a method of producing a probe (101) having a coating layer (104) on a surface thereof, in which the coating layer (104) is formed on a surface of a base material (103) having a sharp tip end portion (103a) using a gas phase method.

In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate
09778572 · 2017-10-03 ·

Cantilevers, SPM tips and nanomachining tools are created in the plane of wafers to obtain new and high performance parts. The method produces more parts for any given wafer, then conventional methods and allows every part on any given wafer to be different from any other, permitting great freedom in new SPM and nanomachining techniques and product development.

Scanning probe and electron microscope probes and their manufacture

Methods are described for the economical manufacture of Scanning Probe and Electron Microscope (SPEM) probe tips. In this method, multiple wires are mounted on a stage and ion milled simultaneously while the stage and mounted probes are tilted at a selected angle relative to the ion source and rotated. The resulting probes are also described. The method provides sets of highly uniform probe tips having controllable properties for stable and accurate scanning probe and electron microscope (EM) measurements.

Scanning probe and electron microscope probes and their manufacture

Methods are described for the economical manufacture of Scanning Probe and Electron Microscope (SPEM) probe tips. In this method, multiple wires are mounted on a stage and ion milled simultaneously while the stage and mounted probes are tilted at a selected angle relative to the ion source and rotated. The resulting probes are also described. The method provides sets of highly uniform probe tips having controllable properties for stable and accurate scanning probe and electron microscope (EM) measurements.

SITU TRIBOMETER AND METHODS OF USE

Techniques for determining a characteristic of a sample using an atomic force microscope including a cantilever having a probe attached thereto, including positioning the sample within a cell and sliding the probe over a sliding zone of the sample within the cell. Lateral and vertical deformations of the cantilever are detected using the atomic force microscope as the probe is slid over the sliding zone. One or more characteristics are determined based on the detected lateral deformations of the cantilever.