Disclosed is a method of processing an S-parameter to analyze transient phenomena in a passive network, the method including: generating an extrapolation function related to a real part of a measured S-parameter signal; generating an expanded S-parameter signal by the extrapolation function; and setting an optimum degree and an optimum expansion frequency of the expanded S-parameter signal. Thus, the extrapolation function where continuity from the real part of the measured S-parameter signal is ensured is used such that causality in an impulse response of the expanded S-parameter signal can be maintained without problems.

A method for manufacturing a device including a diamond crystal, the method including making available a substrate, growing a crystalline diamond layer on the substrate, the layer having a crystal lattice, the layer including at least a first set of XV centers in the crystal lattice, each XV center having a quantification axis, a main direction being defined for the first set, the quantification axes of the XV centers of the first set being parallel to the main direction, the normal direction being distinct from the main direction of the first set, removing a first part of the diamond layer in order to reveal a first face perpendicular to the main direction of the first set, and removing of a second part of the diamond layer in order to reveal a second face perpendicular to the first face.

The present invention relates to a measuring apparatus, comprising: an arbitrary waveform generator to generate, and inject to a coupling network, a combination of N test signals; the coupling network to couple the N test signals to an EUT, and the responses thereof and those signals generated by the EUT itself, to a measuring unit; the measuring unit to measure the electrical signals provided by the coupling network; anda processing unit to process the N test signals and the measured electrical signals, to obtain: the electromagnetic signals, noise or EMI generated by the EUT; andthe Z, Y or S parameters of the EUT or any other meaningful set of parameters that can be computed from the aforementioned ones or from voltages and currents. The invention also relates to a measuring method adapted to perform method steps with the apparatus of the invention.

The present invention relates to a measuring apparatus, comprising: an arbitrary waveform generator to generate, and inject to a coupling network, a combination of N test signals; the coupling network to couple the N test signals to an EUT, and the responses thereof and those signals generated by the EUT itself, to a measuring unit; the measuring unit to measure the electrical signals provided by the coupling network; anda processing unit to process the N test signals and the measured electrical signals, to obtain: the electromagnetic signals, noise or EMI generated by the EUT; andthe Z, Y or S parameters of the EUT or any other meaningful set of parameters that can be computed from the aforementioned ones or from voltages and currents. The invention also relates to a measuring method adapted to perform method steps with the apparatus of the invention.

Systems and methods are provided for a replaceable internal open-short-load (OSL) calibrator and power monitor. A calibration system can include a test port; and a replaceable module including a first lookup table corresponding to an open-short-load (OSL) component and a second lookup table corresponding to a power measuring component.

Systems and methods are provided for a replaceable internal open-short-load (OSL) calibrator and power monitor. A calibration system can include a test port; and a replaceable module including a first lookup table corresponding to an open-short-load (OSL) component and a second lookup table corresponding to a power measuring component.

A radio frequency (RF) measurement system acting as a spectrum analyzer and a method of operating the same eliminates image signals from a detected input RF spectrum. The method includes determining at least three local oscillator (LO) frequencies; determining LO offsets between the LO frequencies; and mixing the LO frequencies with the input RF spectrum to provide corresponding intermediate frequency (IF) signals having an IF bandwidth, where at least one of the IF signals has the input RF spectrum mixed to a different portion of the IF bandwidth than at least one other of the IF signals, providing overlapping coverage. The method further includes acquiring ADC time records for the IF signals; performing Fourier transforms (FTs) on the ADC time records to provide IF spectrums; and detecting RF responses from the IF spectrums to determine an RF response trace corresponding to the input RF spectrum.

A measurement apparatus (1) comprising a high frequency measurement unit (2) adapted to measure high frequency parameters (HFP) of a device under test (DUT) connected to ports of said measurement apparatus (1) and a multimeter unit (3) adapted to measure DC characteristics parameters (DCP) of said device under test (DUT) connected via control signal lines (CL) to a control bus interface (6) of said measurement apparatus (1).

A measurement apparatus (1) comprising a high frequency measurement unit (2) adapted to measure high frequency parameters (HFP) of a device under test (DUT) connected to ports of said measurement apparatus (1) and a multimeter unit (3) adapted to measure DC characteristics parameters (DCP) of said device under test (DUT) connected via control signal lines (CL) to a control bus interface (6) of said measurement apparatus (1).

Embodiments of this invention include a test and measurement instrument and associated methods for acquiring and stitching wide overlapped non-uniform frequency bands so that a user specified band can be efficiently displayed and analyzed. The test and measurement instrument includes a user interface to receive the user specified frequency span. Acquisition circuitry acquires one or more predefined frequency bands having non-uniform overlapping frequency ranges. A frequency band processing section can decimate the acquired frequency bands, mask the acquired frequency bands, and stitch the masked frequency bands together. A display section displays the user specified frequency span using the stitched frequency bands. Due to the overlap configuration of the wide non-uniform bands, any user specified span between 50 kHz and 6 GHz, or thereabout, can be covered by two bands.