A method and system of remotely monitoring an operational status of electronic discharge devices in an air purification system senses emitted radiation at a location proximate the air purification system, alone or in combination with a determination of an amount of time remaining in an operational lifetime of the electronic discharge device, or an amount of power delivered to at least one of the electronic discharge devices. A determination of the operational status of at least one of the electronic discharge devices is made based on at least emitted radiation, and the status information is transmitted to a remote monitoring unit that receives the status information and displays an indicator of operational status. In one embodiment, the operational status of a UV-C germicidal lamp may be monitored using optically sensitive devices located within a purification system.

A method and system of remotely monitoring an operational status of electronic discharge devices in an air purification system senses emitted radiation at a location proximate the air purification system, alone or in combination with a determination of an amount of time remaining in an operational lifetime of the electronic discharge device, or an amount of power delivered to at least one of the electronic discharge devices. A determination of the operational status of at least one of the electronic discharge devices is made based on at least emitted radiation, and the status information is transmitted to a remote monitoring unit that receives the status information and displays an indicator of operational status. In one embodiment, the operational status of a UV-C germicidal lamp may be monitored using optically sensitive devices located within a purification system.

A method and apparatus for detecting substrate arcing and breakage within a processing chamber is provided. A controller monitors chamber data, e.g., parameters such as RF signals, voltages, and other electrical parameters, during operation of the processing chamber, and analyzes the chamber data for abnormal spikes and trends. Using such data mining and analysis, the controller can detect broken substrates without relying on glass presence sensors on robots, but rather based on the chamber data.

A fluorescent lamp testing device 10 has a microcontroller 100 that controls tests for ballast discrimination as well as gas integrity, ballast operation, filament continuity and line voltage. The ballast discrimination test is performed by the microcontroller 100 in combination with a photodiode 30 and high/low pass filter 32. Gas integrity is tested with pulse width modulation and a high-voltage, step-up transformer (PWM/T) circuit 42 and an antenna 40. A built in continuity tester has input pins 52, 54 to test the continuity of the filaments in the fluorescent lamp 12. The antenna 40 and a voltage-divider/voltage-sensor connected to the secondary coil in the transformer test for ballast operation. A PCB conductive loop 18, rectifier 20 and op amp 22 test for line voltage.

A method and system of remotely monitoring an operational status of electronic discharge devices in an air purification system senses emitted radiation at a location proximate the air purification system, alone or in combination with a determination of an amount of time remaining in an operational lifetime of the electronic discharge device, or an amount of power delivered to at least one of the electronic discharge devices. A determination of the operational status of at least one of the electronic discharge devices is made based on at least emitted radiation, and the status information is transmitted to a remote monitoring unit that receives the status information and displays an indicator of operational status. In one embodiment, the operational status of a UV-C germicidal lamp may be monitored using optically sensitive devices located within a purification system.

Systems and methods for operating a match network are disclosed. One match network comprises at least one first sensor to measure one or more first parameters and at least one second sensor to measure one or more second parameters. The match network also comprises means for assessing whether the match is operating as expected or operating outside of specifications using the one or more first-parameter measurements; the one or more second-parameter measurements; a setting of the match; or one or more expected parameter values.