G02B1/005

COLOR FILTER SUBSTRATE, METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE

The present disclosure discloses a color filter substrate, a manufacture method thereof and a display device. The color filter substrate includes a substrate; and a light channel layer on a side of the substrate. The light channel layer includes a first photonic crystal layer and a second photonic crystal layer stacked with each other up and down. The light channel layer includes a plurality of light channel units formed by a periodic arrangement of three different primary-color light channel units. Each of the light channel units includes a photonic crystal block of the first photonic crystal layer and a photonic crystal block of the second photonic crystal layer with an orthographic projection of the photonic crystal block of the first photonic crystal layer on the substrate overlapping an orthographic projection of the photonic crystal block of the second photonic crystal layer on the substrate.

Front Light Source and Display Apparatus

Provided are a front light source and a display apparatus. The front light source is disposed on a light emitting side of a display panel. The front light source includes: a light guide member and a light emitting member disposed on a light incident side of the light guide member, the light guide member being configured to guide light emitted by the light emitting member onto the display panel; the light emitting member includes: a light source element and a quantum dot element which are disposed on a same layer, the light source element being configured to emit light of a first color, and the quantum dot element being configured to emit light of three colors including three-primary colors under excitation of the light emitted by the light source element, the first color is one of the three-primary colors.

COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE
20210246330 · 2021-08-12 ·

A colloidal structure includes a plurality of types of colloidal particles, and a matrix that fixes the colloidal particles. The plurality of types of the colloidal particles include at least first colloidal particles and second colloidal particles, which are different in average particle size from each other. Then, the plurality of types of the colloidal particles form a regular array in a matrix. A multi-colloidal structure includes a plurality of the colloidal structures. A method for producing a colloidal structure includes: a dispersion liquid preparation step of preparing a colloidal dispersion liquid by dispersing a plurality of types of colloidal particles together with a monomer; a coating film generation step of coating the colloidal dispersion liquid on a substrate, and generating a coating film; and a polymerization step of polymerizing the monomer in the coating film.

Pillar photonic crystal

Techniques (e.g., implemented in devices, methods and/or in non-transitory storage units) are used for confining wavelengths, e.g., using a pillar photonic crystal. A semiconductor device includes a pillar photonic crystal including a structure and a plurality of pillars extending from the structure in a height direction, wherein the plurality of pillars form at least one waveguide for electromagnetic radiation at a specific wavelength, the at least one waveguide extending in at least one planar direction, wherein the structure includes a confining layer in doped semiconductor material to support propagation of surface plasmon polaritons.

Photonic Crystal Optical Element

The amount of outward shift of a lattice element (131a) and a lattice element (131b), the outward shift being symmetrical with respect to a resonator center on a straight line, is 0.42 to 0.5 times a lattice constant of a photonic crystal. The amount of outward shift of a lattice element (132a) and a lattice element (132b), the outward shift being symmetrical with respect to the resonator center on the straight line, is 0.26 to 0.38 times the lattice constant of the photonic crystal. The amount of outward shift of a lattice element (133a) and a lattice element (133b), the outward shift being symmetrical with respect to the resonator center on the straight line, is 0.13 to 0.19 times the lattice constant of the photonic crystal. The amount of outward shift of a lattice element (134a) and a lattice element (134b), the outward shift being symmetrical with respect to the resonator center on the straight line, is −0.1 to 0 times the lattice constant of the photonic crystal.

REFRACTIVE-INDEX SENSOR AND METHOD
20210223170 · 2021-07-22 ·

A method for measuring a refractive index of a medium includes exciting a first antisymmetric resonance of a first metasurface, including a first periodic array of resonators formed on a substrate surface, with illumination incident on the first metasurface at a non-normal incidence angle with respect to the substrate surface, the first metasurface including the medium encapsulating the first periodic array of resonators. The method also includes determining a refractive index of the medium from a first amplitude of a first transmitted signal that includes a portion of the illumination transmitted through the first metasurface.

Device and method for observing a fluorescent sample

A method for observing a fluorescent sample, the sample comprising a fluorescent agent that emits fluorescence light, in a fluorescence spectral band, when it is illuminated by excitation light, in an excitation spectral band, the method comprising the following steps: a) placing the sample on a holder; b) illuminating the sample, with an excitation light source, in the excitation spectral band, the light emitted by the light source propagating along a propagation axis; c) detecting fluorescence light, in the fluorescence spectral band, with an image sensor;
the method being such that the holder comprises a thin layer formed from a first material, of a first refractive index, the thin layer lying in a holder plane perpendicular to the propagation axis, the thin layer comprising a first photonic crystal and second photonic crystals configured to confine the excitation light and the fluorescence light in the thin layer.

MULTI-COAT POLYMER PHOTONIC CRYSTAL FILMS

Polymer composite photonic crystal materials are disclosed as coatings and topcoats which have high reflection (>30%) in a specific range of the electromagnetic spectrum, such as ultraviolet (<400 nm), visible (Vis, 400 nm-700 nm), or near-infrared radiation range (NIR, 700-2000 nm), and relatively low reflection (<20% reflection) in a second, different range of the electromagnetic spectrum. Surprisingly, it was found that through a formulation and additives approach, the optical properties of polymer composite photonic crystal films can be selectively modified from a variety of different coating methods, including spray deposition.

ROBUST CONJUGATED-SYMMETRIC OPTICAL APPARATUS AND DESIGN METHOD THEREOF
20210223472 · 2021-07-22 ·

A robust conjugate symmetric optical apparatus is disclosed. The robust conjugate symmetric optical apparatus comprises a first optical cell set and a second optical cell set. The first optical cell set includes a first plurality of cells, each of which includes a first left half cell and a first right half cell, and the respective first right half cell and the corresponding first left half cells form a first symmetric structure therebetween. The second optical cell set includes a second plurality of cells, each of which includes a second left half cell and a second right half cell, and the respective second right half cell and the corresponding second left half cells form a second symmetric structure therebetween, wherein each of the first left half cells of the first optical cell set and each of the second right half cells of the second optical cell set have the same structure; and each of the first right half cells of the first optical cell set and each of the second left half cells of the second optical cell set have the same structure.

MICROSTRUCTURE ENHANCED ABSORPTION PHOTOSENSITIVE DEVICES
20210242354 · 2021-08-05 ·

Lateral and vertical microstructure enhanced photodetectors and avalanche photodetectors are monolithically integrated with CMOS/BiCMOS ASICs and can also be integrated with laser devices using fluidic assembly techniques. Photodetectors can be configured in a vertical PIN arrangement or lateral metal-semiconductor-metal arrangement where electrodes are in an inter-digitated pattern. Microstructures, such as holes and protrusions, can improve quantum efficiency in silicon, germanium and III-V materials and can also reduce avalanche voltages for avalanche photodiodes. Applications include optical communications within and between datacenters, telecommunications, LIDAR, and free space data communication.