Patent classifications
G02B1/007
HIGH REFRACTIVE INDEX, HIGH ABBE COMPOSITIONS
Disclosed are hydrophobic, acrylic materials having both high refractive index and a high Abbe number. The materials may have an internal wetting agent, are well suited for use as implantable ophthalmic devices, and have a refractive index which may be edited through application of energy. When used for an intraocular lens, the high refractive index allows for a thin lens which compresses to allow a small incision size.
OPTICAL IMAGING SYSTEM
An optical imaging system includes a first lens having negative refractive power, a second lens having negative refractive power, a third lens, a fourth lens, a fifth lens, a sixth lens, and a seventh lens. The first to seventh lenses are sequentially disposed from an object side toward an image side. The third lens and the seventh lens are formed of plastic, and the first lens, the second lens, the fourth lens, the fifth lens, and the sixth lens are formed of glass.
Optical imaging system
An optical imaging system includes a first lens having negative refractive power, a second lens having negative refractive power, a third lens, a fourth lens, a fifth lens, a sixth lens, and a seventh lens. The first to seventh lenses are sequentially disposed from an object side toward an image side. The third lens and the seventh lens are formed of plastic, and the first lens, the second lens, the fourth lens, the fifth lens, and the sixth lens are formed of glass.
Optical film structures and articles for hidden displays and display devices
An article is described herein that includes: a translucent substrate comprising opposing major surfaces; and an optical film structure disposed on a first major surface of the substrate, the optical film structure comprising an outer surface and a plurality of periods such that each period comprises an alternating low refractive index layer and high refractive index layer. The article exhibits a hardness of 10 GPa or greater measured at an indentation depth of about 100 nm by a Berkovich Indenter Hardness Test. Further, the article exhibits a single side average photopic light reflectance of at least 50% of non-polarized light as measured at the outer surface from near-normal incidence to an incident angle of 60 degrees over a portion of at least 10 nm within the visible spectrum. In addition, each low refractive index layer comprises SiO.sub.2 or doped-SiO.sub.2 and each high refractive index layer comprises AlO.sub.xN.sub.y, SiO.sub.xN.sub.y, Si.sub.uAl.sub.vO.sub.xN.sub.y, SiN.sub.x or ZrO.sub.2.
Reflective metasurfaces for broadband terahertz linear-to-circular polarization conversion and circular dichroism spectroscopy
Metasurface polarization convertors permit conversion of an input linear polarization to right- or left-handed circular polarization based on the orientation of the input linear polarization, over a broad bandwidth and with high efficiency. The reflected circular polarizations can be used to evaluate samples for circular dichroism. A THz time-domain detection provides a time domain terahertz signal that is Fourier transformed to produce a THz circular dichroism spectrum.
Processing method for multi-row, multi-column flat lens with equivalent negative refractive index
Provided is a processing method for a multi-row, multi-column flat lens with an equivalent negative refractive index, which includes: performing photoresist coating, masking and exposure on the photolithography surface; removing photoresist in an unexposed block, and forming a rectangular groove; coating a surface of an exposed block and all surfaces of the rectangular groove with a protective layer, and then coating a side surface of the rectangular groove with a reflective film; removing the protective layer on the surface of the exposed block and the bottom surface of the rectangular groove, then filling up the groove with a filling material, and further processing the front and rear surfaces of the parallel plate in such a manner that a parallel misalignment between the front and rear surfaces thereof is smaller than 1′; and adding a protective window sheet on each of the front and rear surfaces of the new parallel plate.
NEGATIVE REFRACTION IMAGING LITHOGRAPHIC METHOD AND EQUIPMENT
The embodiments of the present disclosure propose a negative refraction imaging lithographic method and equipment. The lithographic method includes: coating photoresist on a device substrate; fabricating a negative refraction imaging structure, wherein the negative refraction imaging structure exhibits optical negative refraction in response to beam emitted by exposure source; pressing a mask to be close to the negative refraction imaging structure; disposing the mask and the negative refraction imaging structure above the device substrate at a projection distance; and light emitted by the exposure source passes through the mask, the negative refraction imaging structure, the projection gap and is sequentially projected onto the photoresist for exposure.
ANTI-BLUE LIGHT ANTI-INFRARED RESIN LENS WITH REFRACTIVITY OF 1.50 AND PREPARATION METHOD THEREOF
The present invention discloses an anti-blue light anti-infrared resin lens having a refractivity of 1.50, and a preparation method thereof. The lens comprises 100 parts by weight of CR39 resin monomer, 0.5-5 parts by weight of an initiator, and 1.0216-30.6 parts by weight of an additive, where the additive includes an anti-infrared absorber, a blue light absorber, and a hardness modifier at a weight ratio of 0.0005-0.5:0.001-10:1-10, the initiator is benzoyl peroxide, dicumyl peroxide, or 1,1-di-tert-butylperoxy-3,3,5-trimethylcyclohexane. The resin lens prepared in the present invention has both blue light absorption effect and near-infrared absorption effect and is capable of being dyed as needed to have the effect of sunglasses, while the quality of the lens is guaranteed. The resin lens is a new type of multifunctional resin lens.
PLASMA DISPERSION EFFECT FOR METASURFACE TUNING
An active metasurface that provides low-loss and high-bandwidth modulation control of light includes a number of cells arranged on a substrate. A controller dynamically alters a voltage differential supplied to the electrodes of each of the cells is adapted to alter refractive index of each of the high-index dielectric blocks in order to controllably steer light exiting the cell.
CUTOFF MODES FOR METASURFACE TUNING
An active metasurface includes a number of periodically-repeated unit cells arranged on a substrate that each include a plasmonic waveguide shaped and sized to provide a cutoff mode that captures light of a target wavelength. The active metasurface includes an index modulation controller that controllably varies a voltage differential across each one of the periodically-repeated cells to change a phase of light incident on the metasurface.