G02B1/12

Method for Producing a Diffractive Optical Element and Diffractive Optical Element
20220397707 · 2022-12-15 ·

A method for producing a diffractive optical element and a diffractive optical element are disclosed. In an embodiment a method for producing a diffractive optical element includes generating a surface structure by implanting ions into a material of a substrate, a layer or a layer system, wherein the surface structure includes a structure height of less than 10 nm.

Method for Producing a Diffractive Optical Element and Diffractive Optical Element
20220397707 · 2022-12-15 ·

A method for producing a diffractive optical element and a diffractive optical element are disclosed. In an embodiment a method for producing a diffractive optical element includes generating a surface structure by implanting ions into a material of a substrate, a layer or a layer system, wherein the surface structure includes a structure height of less than 10 nm.

OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR
20220397704 · 2022-12-15 ·

The present invention provides: a lightweight optical member which can be produced at relatively low cost and which provides low reflectance, stability upon exposure to light, and abrasion resistance; and an efficient method for producing such an optical member. An optical member according to the present invention is characterized by comprising: a metallic base material; a low-reflective treatment layer formed on the surface of the metallic base material; and a silica layer formed on the surface of the low-reflective treatment layer. It is preferable for the silica layer to have a layer thickness of 0.1-10 μM.

System and method for ablation assisted nanostructure formation for graded index surfaces for optics

A system and method is disclosed for forming a graded index (GRIN) on a substrate. In one implementation the method may involve applying a metal layer to the substrate. A fluence profile of optical energy applied to the metal layer may be controlled to substantially ablate the metal layer to create a vaporized metal layer. The fluence profile may be further controlled to control a size of metal nanoparticles created from the vaporized metal layer as the vaporized metal layer condenses and forms metal nanoparticles, the metal nanoparticles being deposited back on the substrate to form a GRIN surface on the substrate.

System and method for ablation assisted nanostructure formation for graded index surfaces for optics

A system and method is disclosed for forming a graded index (GRIN) on a substrate. In one implementation the method may involve applying a metal layer to the substrate. A fluence profile of optical energy applied to the metal layer may be controlled to substantially ablate the metal layer to create a vaporized metal layer. The fluence profile may be further controlled to control a size of metal nanoparticles created from the vaporized metal layer as the vaporized metal layer condenses and forms metal nanoparticles, the metal nanoparticles being deposited back on the substrate to form a GRIN surface on the substrate.

Gas-soluble nanovoided polymers

An actuator includes a primary electrode, a secondary electrode overlapping at least a portion of the primary electrode, a nanovoided polymer layer disposed between and abutting the primary electrode and the secondary electrode, the nanovoided polymer layer having a plurality of nanovoids dispersed throughout a polymer matrix, and a sealing layer at least partially encapsulating the nanovoided polymer layer, where the nanovoids include a fill gas.

Gas-soluble nanovoided polymers

An actuator includes a primary electrode, a secondary electrode overlapping at least a portion of the primary electrode, a nanovoided polymer layer disposed between and abutting the primary electrode and the secondary electrode, the nanovoided polymer layer having a plurality of nanovoids dispersed throughout a polymer matrix, and a sealing layer at least partially encapsulating the nanovoided polymer layer, where the nanovoids include a fill gas.

Optical adhesive layer, stretchable display device and preparing method for optical adhesive layer

The present disclosure provides an optical adhesive layer, a stretchable display device and a preparing method for the optical adhesive layer. The optical adhesive layer includes: an edge region enclosing a hollow portion; a plurality of block regions distributed in the hollow portion along a first direction and a second direction; and connection ribs connecting the block regions to the edge region, wherein the connection ribs are distributed in the hollow portion in a net form.

Optical adhesive layer, stretchable display device and preparing method for optical adhesive layer

The present disclosure provides an optical adhesive layer, a stretchable display device and a preparing method for the optical adhesive layer. The optical adhesive layer includes: an edge region enclosing a hollow portion; a plurality of block regions distributed in the hollow portion along a first direction and a second direction; and connection ribs connecting the block regions to the edge region, wherein the connection ribs are distributed in the hollow portion in a net form.

OPTICAL LENS ASSEMBLY AND OPTICAL MODULE

An optical lens assembly includes a glass lens element. The glass lens element has a refractive power, an optical surface of the glass lens element is non-planar, an anti-reflective membrane layer is formed on the optical surface, and the anti-reflective membrane layer includes a nanostructure layer and a structure connection film. The nanostructure layer has a plurality of ridge-like protrusions extending non-directionally from the optical surface, and a material of the nanostructure layer includes aluminum oxide. The structure connection film is disposed between the optical surface and the nanostructure layer, the structure connection film includes at least one silicon dioxide layer, the at least one silicon dioxide layer contacts a bottom of the nanostructure layer physically, and a thickness of the at least one silicon dioxide layer is greater than or equal to 20 nm and less than or equal to 150 nm.