Methods of making a multilayer optical film are described. In one embodiment, the method comprises providing a multilayer optical film and disposing onto the multilayer optical film a plurality of layers deposited by layer-by-layer self-assembly of nanoparticles, polymers, and combinations thereof. The multilayer optical film typically comprises a plurality of alternating polymeric layers of a low refractive index layer and a high refractive index layer that reflects at least one bandwidth of electromagnetic radiation ranging from ultraviolet to near infrared. Multilayer optical film articles are described comprising a plurality of layers disposed onto the multilayer optical film, wherein the plurality of layers comprises layer-by-layer self-assembled nanoparticles, polymers, and combinations thereof. The multilayer optical films are suitable for various uses including reflective polarizers for optical displays such as LCDs or LEDs, architectural film applications, window film applications, and solar power concentrating mirrors.

An EUV reflective structure includes a substrate and multiple pairs of a Si layer and a Mo layer. The Si layer includes a plurality of cavities.

A broadband partial reflector includes a multilayer polymeric optical film having a total number of optical repeating units that monotonically increases in thickness value from a first side to a second side of the multilayer polymeric optical film. A baseline optical repeating unit thickness profile is defined by a first plurality of optical repeating units and having a first average slope, and a first apodized thickness profile of the multilayer polymeric optical film is defined by a second plurality of optical repeating units having a second average slope being at least 5 times greater than the first average slope. The second plurality of optical repeating units define the first side of the multilayer polymeric optical film and join the first plurality of optical repeating units. The second plurality of optical repeating units are in a range from 3-15% of the total number of optical repeating units.

A facet mirror, such as for use as an optical component in a projection exposure apparatus for EUV microlithography, includes at least two mirror modules having individual mirrors and mirror module surfaces and at least on one side a non-reflective edge region and a module edge. Adjacent individual mirrors in the mirror modules are a distance from each other that is less than half the width of the non-reflective edge region. The at least two adjacent module edges of adjacent mirror modules are offset with respect to each other by a height h along the surface normal of one of the two mirror module surfaces.

Disclosed is an actuator unit for positioning an optical element, comprising a first reluctance actuator comprising a first stator part and a first mover part separated by a gap in a first direction. The first mover part is constructed and arranged to be connected to the optical element and for moving the optical element. The first stator part is constructed and arranged to exert a magnetic force on the first mover part along a first line of actuation. The first mover part is movable relative to the first stator part in the first direction. The first stator part and the first mover part are constructed and arranged such that the first line of actuation is, in operational use, moving along with the first mover part in a second direction perpendicular to the first direction, for at least a predetermined movement range of the first mover part in the second direction.

An optical element for a lithographic apparatus, the optical element including an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, the method including depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses including such optical elements are also described.

Compositions comprising highly reflective microcrystalline/amorphous materials are provided. In some instances, the highly reflective materials are microcrystalline or amorphous carbonate materials, which may include calcium and/or magnesium carbonate. In some instances, the materials are CO.sub.2 sequestering materials. Also provided are methods of making and using the compositions, e.g., to increase the albedo of a surface, to mitigate urban heat island effects, etc.

The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems.

A multilayer coating has a substrate, an optical layer, and a buffer layer between the substrate and the optical layer. The buffer layer has a coefficient of thermal expansion between that of the substrate and the optical layer. The multilayer coating has properties that enable its use in deep ultraviolet (DUV) wavelengths, such as for a multilayer mirror or edge filter. This multilayer coating with a buffer layer provides improved thermal stability and lifetime.

A substrate with a multilayer reflective film capable of facilitating the discovery of contaminants, scratches and other critical defects by inhibiting the detection of pseudo defects attributable to surface roughness of a substrate or film in a defect inspection using a highly sensitive defect inspection apparatus. The substrate with a multilayer reflective film has a multilayer reflective film obtained by alternately laminating a high refractive index layer and a low refractive index layer on a main surface of a mask blank substrate used in lithography, wherein an integrated value I of the power spectrum density (PSD) at a spatial frequency of 1 μm.sup.−1 to 10 μm.sup.−1 of the surface of the substrate with a multilayer reflective film, obtained by measuring a region measuring 3 μm×3 μm with an atomic force microscope, is not more than 180×10.sup.−3 nm.sup.3, and the maximum value of the power spectrum density (PSD) at a spatial frequency of 1 μm.sup.−1 to 10 μm.sup.−1 is not more than 50 nm.sup.4.