A projection system includes a first lens group having positive power, an aperture stop, and a second lens group having positive power sequentially arranged from the enlargement side toward the reduction side. The portion at the reduction side of a reduction-side lens that forms the second lens group and is located at a position closest to the reduction side is a telecentric portion. The projection system satisfies Conditional Expressions (1) and (2) below,

ω>40°  (1)

YL1/YIM<6.0   (2)

where ω represents a maximum half angle of view of the overall projection system, YIM represents the distance from an optical axis to the largest image height of the projection image formed at an image formation device, and YL1 is the distance from the optical axis to a chief beam corresponding to the maximum image height in an imaginary plane.

A projection system includes a first lens group having refractive power, an aperture stop, and a second lens group having refractive power sequentially arranged from the enlargement side toward the reduction side. The first lens group includes a first lens disposed at a position closest to the enlargement side, a second lens disposed at the reduction side of the first lens, and a plurality of positive lenses disposed at the reduction side of the second lens and each having positive power. The portion at the reduction side of a reduction-side lens that forms the second lens group and is located at a position closest to the reduction side is a telecentric portion. The projection system satisfies Conditional Expressions (1) and (2) below,

LnθgF≥0.6  (1)

ω>40°  (2)

A projection system includes a first lens group having refractive power, an aperture stop, and a second lens group having refractive power sequentially arranged from the enlargement side toward the reduction side. The first lens group includes a first lens disposed at a position closest to the enlargement side, a second lens disposed at the reduction side of the first lens, and a plurality of positive lenses disposed at the reduction side of the second lens and each having positive power. The portion at the reduction side of a reduction-side lens that forms the second lens group and is located at a position closest to the reduction side is a telecentric portion. The projection system satisfies Conditional Expressions (1) and (2) below,

LnθgF≥0.6  (1)

ω>40°  (2)

A projection system includes a first lens group, an aperture diaphragm, and a second lens group. A reduction side of the second lens group is telecentric. The first lens group includes a first sub-lens group having negative power and a second sub-lens group having positive power. Between a lens located at the most reduction side of the first sub-lens group and a lens located at the most enlargement side of the second sub-lens group, an air gap wider than air gaps between the other lenses adjacent to each other is provided. A lens located at the most reduction side in the first lens group is a positive lens. A cemented lens of the second lens group includes a first lens having negative power, a second lens having positive power, and a third lens having negative power from an enlargement side toward a reduction side. ω>40.

A projection system includes a first lens group, an aperture diaphragm, and a second lens group. A reduction side of the second lens group is telecentric. The first lens group includes a first sub-lens group having negative power and a second sub-lens group having positive power. Between a lens located at the most reduction side of the first sub-lens group and a lens located at the most enlargement side of the second sub-lens group, an air gap wider than air gaps between the other lenses adjacent to each other is provided. A lens located at the most reduction side in the first lens group is a positive lens. A cemented lens of the second lens group includes a first lens having negative power, a second lens having positive power, and a third lens having negative power from an enlargement side toward a reduction side. ω>40.

An imaging lens for use with an operational waveband over any subset of 7.5-13.5 μm may include a first optical element of a first high-index material and a second optical element of a second high-index material, that may have a refractive index greater than 2.2 in the operational waveband, an absorption per mm of less than 75% in the operational waveband, and an absorption per mm of greater than 75% in a visible waveband of 400-650 nm. Optically powered surfaces of the imaging lens may include a sag across their respective clear apertures that are less than 10% of a largest clear aperture of the imaging lens. Respective maximum peak to peak thicknesses of the first and second optical elements may be similar in size, for example within 15 percent of each other. Ratios of maximum peak to peak thickness to clear aperture and, separately, to sag are also provided.

An imaging lens for use with an operational waveband over any subset of 7.5-13.5 μm may include a first optical element of a first high-index material and a second optical element of a second high-index material, that may have a refractive index greater than 2.2 in the operational waveband, an absorption per mm of less than 75% in the operational waveband, and an absorption per mm of greater than 75% in a visible waveband of 400-650 nm. Optically powered surfaces of the imaging lens may include a sag across their respective clear apertures that are less than 10% of a largest clear aperture of the imaging lens. Respective maximum peak to peak thicknesses of the first and second optical elements may be similar in size, for example within 15 percent of each other. Ratios of maximum peak to peak thickness to clear aperture and, separately, to sag are also provided.

A light source optical system used with an excitation light source configured to emit first color light includes a wavelength conversion unit configured to receive the first color light emitted by the excitation light source and emit second color light with a wavelength different from a wavelength of the first color light, There is a first optical system having a positive power and a second optical system having a positive power provided in this order in an optical path between the excitation light source and the wavelength conversion unit. When a ray parallel to an optical axis of the first optical system is incident on the first optical system, a ray emitted from the first optical system is incident on the second optical system while approaching the optical axis. The second optical system has under-corrected spherical aberration at a paraxial focal position of the second optical system.

A light source optical system used with an excitation light source configured to emit first color light includes a wavelength conversion unit configured to receive the first color light emitted by the excitation light source and emit second color light with a wavelength different from a wavelength of the first color light, There is a first optical system having a positive power and a second optical system having a positive power provided in this order in an optical path between the excitation light source and the wavelength conversion unit. When a ray parallel to an optical axis of the first optical system is incident on the first optical system, a ray emitted from the first optical system is incident on the second optical system while approaching the optical axis. The second optical system has under-corrected spherical aberration at a paraxial focal position of the second optical system.

A projection lens system includes two lens elements being, in order from a magnification side to a reduction side along an optical path, a first lens element, and a second lens element. Each of the two lens elements has a magnification-side surface facing the magnification side and a reduction-side surface facing the reduction side. At least one of the magnification-side surface and the reduction-side surface of at least one of the two lens elements is aspheric.