The invention discloses a six-piece optical lens for capturing image and a six-piece optical module for capturing image. In order from an object side to an image side, the optical lens along the optical axis comprises a first lens with refractive power, a second lens with refractive power; a third lens with refractive power, a fourth lens with refractive power; a fifth lens with refractive power; a sixth lens with refractive power; and at least one of the image-side surface and object-side surface of each of the six lens elements is aspheric. The optical lens can increase aperture value and improve the imagining quality for use in compact cameras.

Method and system for inspecting a manufactured part supported on an optically-transparent window of a rotary actuator at an inspection station are provided. The window rotatably supports the part in a generally vertical orientation at which a bottom end surface of the part has a position and orientation for optical inspection. An illuminator is configured to illuminate the bottom end surface of the part through the window with radiant energy to obtain reflected radiation signals which are reflected off the bottom end surface of the part. The reflected radiation signals travel through the window. A lens and detector assembly is configured to form a bottom image from the reflected radiation signals at a bottom imaging location below the window and is configured to detect the bottom image. The window is made of a material which is substantially transparent to the radiant energy and the reflected radiation signals.

A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.

Systems and methods for increasing the overall throughput, decreasing the overall background radiation, or a combination thereof for imaging systems.

An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion
n.sub.i=n.sub.i(.sub.0)n.sub.i(.sub.0+1 pm)
for a wavelength variation of 1 pm from a wavelength .sub.0. The objective satisfies the relation $\frac{.Math.\underset{i=1}{\overset{N}{.Math.}}{n}_i\left(s_i-d_i\right).Math.}{{}_0{\mathrm{NA}}^4}A$
for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where s.sub.i is a geometrical path length of a ray in an ith dioptric optical element having axial thickness d.sub.i and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.

To provide a microparticle measurement technology capable of supporting excitation light in a wideband wavelength range. The present technology provides a microparticle measurement device provided with a plurality of objective lenses for excitation light irradiation used for irradiating microparticles flowing through a flow path with excitation light, in which at least one of the objective lenses for excitation light irradiation is used for detecting scattered light emitted from the microparticles by the excitation light with which the microparticles are irradiated through another one of the objective lenses for excitation light irradiation.

An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

A projection lens images a pattern of a mask arranged in the region of an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation with a work wavelength <260 nm. The projection lens has a multiplicity of optical elements with optical surfaces. The projection lens also has a wavefront manipulation system for controllable influencing of the wavefront of the projection radiation travelling from the object plane to the image plane. The wavefront manipulation system has a manipulator having a manipulator element and an actuating device or reversibly changing an optical effect of the manipulator element on radiation of the projection beam path.

An apochromatic microscope objective, including three optical sub-systems, wherein starting from the object plane, the first sub-system includes a meniscus and a convergent lens, wherein the meniscus is curved towards the object plane, the second sub-system is made up of three elements, wherein a first element includes a meniscus or a cemented element, a second element is configured as a collecting cemented element and a third element is a cemented element, and wherein either the first element or the third element is strongly scattering and the third sub-system has at least one cemented element with a collecting lens.