G02B17/0852

PROJECTION LENS SYSTEM AND IMAGE PROJECTION APPARATUS

A projection lens system (G1, G2) includes a front group (G1) disposed on a projection-plane (SC) side, a rear group (G2) disposed on a display-surface (SF) side of an image display element inclined with reference to the projection plane (SC), and an aperture stop (S) disposed on the display-surface (SF) side with reference to the front group (G1). The rear-group optical axis is tilted on the shared plane at a tilt angle ξ with reference to the display-surface normal. In projection lens system (G1, G2), when the amount of shift Δ is zero, the tilt angle ξ satisfies a conditional expression 0<ξ/ξs<1, where ξs denotes a tilt angle when Scheimpflug principle is satisfied with reference to the display surface (SF) and the projection plane (SC).

OPTICAL SYSTEM, OPTICAL APPARATUS, IMAGING APPARATUS, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM AND IMAGING APPARATUS
20220099949 · 2022-03-31 ·

There are provided an optical system having high resolution and high optical performance and reduced in size, an optical apparatus including the optical system, an imaging apparatus, and a method for manufacturing the optical system and imaging apparatus.

An optical system UL of a camera module 10, which is incorporated in an optical apparatus, such as a camera 60, is an optical system that forms an image of an object, includes a correction member having a correction surface 11a, a first reflection surface 12a, which reflects light having passed through the correction surface 11a, and a second reflection surface 13a, which reflects the light reflected off the first reflection surface 12a, and satisfies predetermined conditions.

PROJECTION SYSTEM
20220103791 · 2022-03-31 ·

A projection system can include a first modulator including a plurality of pixels in a first modulator surface, a second modulator including a plurality of pixels in a second modulator surface, and an intermediate imaging optical unit, which images the first modulator surface onto the second modulator surface, wherein the intermediate imaging optical unit includes a first lens having a convex side and wherein the convex side of the first lens is a free-form surface, which is not spherical and not rotationally symmetric and does not exhibit any mirror symmetry.

Projection optical system including movable lens groups, a non-movable lens group, and a curved mirror

There is provided a projection optical system capable of projecting an image formed on an image forming unit on a projection plane, which has an extremely short projection distance and a small size.

Telecentric lens

A telecentric lens comprises a front optical group adapted to receive rays coming from an observed object, a rear optical group, adapted to convey said rays towards an image plane of a sensor, and a lens aperture positioned between the front optical group and the rear lens group, wherein the lens aperture lies on the focal plane at least of the front optical group. The front optical group is devoid of lenses and is consists of a concave curved primary mirror adapted to receive and reflect the rays coming from the observed object, and at least one secondary mirror adapted to receive and reflect towards the rear optical group the rays coming from the primary mirror.

Projection television device and screen

A front projection display device is provided including an image-generating source configured to generate an image, a wide angle lens system adapted to receive the image, and a screen. The wide angle lens system may be configured to increase distortion of the image in a first stage and decrease distortion of the image in a second stage. The screen may be configured to receive the image from the wide angle lens system on a first side and reflect the image back to a viewer on the first side. In another embodiment, a screen is provided for a front projection system, the screen may be configured to receive light from a steep angle and may include any number of surface topographies configured to reflect light back to the viewer along a desired viewing plane.

Lens module and projector

Disclosed herein is a lens module for a projector of laser scanning type which is focus-free and has a short throw distance. In one example, a lens module includes a first optical member including a free-curved lens that passes a beam light reflected by a minute vibrating mirror; and a second optical member including a free-curved mirror to reflect the beam light which has passed through the first optical member, or a free-curved lens to pass the beam light which has passed through the first optical member. The beam light, which has been reflected by or has passed through the second optical member, has at the same position beam waists in horizontal and vertical directions perpendicular to a propagating direction of the beam light and also has beam radii coinciding in the horizontal and vertical directions.

OBSERVATION OPTICAL SYSTEM AND DISPLAY APPARATUS
20210033868 · 2021-02-04 ·

An optical system configured to guide a light beam from a display element includes a positive lens, a negative lens, and an optical element having at least three optical surfaces. The light beam from the display element is reflected a plurality of times inside the optical element via the positive lens and the negative lens, and then travels to an exit pupil. A predetermined condition is satisfied.

Ultra-small-sized 4K-resolution ultra-short-focus projection optical system
10884221 · 2021-01-05 · ·

The present invention discloses an ultra-small-sized 4K-resolution ultra-short-focus projection optical system, which is characterized by including in sequence in a projection direction: a DMD chip, an equivalent prism, a 4K oscillating mirror, a refraction lens assembly and an aspherical reflector. Through reasonable distribution of focal power, the semi-aperture size of the reflector is reduced to be less than 50 mm, and the assembling sensitivity is substantially reduced, so that batch production can be realized.

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
20200371444 · 2020-11-26 ·

A projection exposure method and apparatus are disclosed for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask under the control of an operating control system of a projection exposure apparatus, part of the pattern lying in an illumination region is imaged onto the image field on the substrate with the aid of a projection lens, wherein all rays of the projection radiation contributing to the image generation in the image field form a projection beam path.