A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

A method for manufacturing an integrated circuit includes scanning a wafer with respect to a catadioptric projection objective and imaging a pattern on a mask onto a wafer while scanning the wafer. The imaging includes illuminating the mask with radiation; imaging, using the radiation, the pattern into a first intermediate image, the first intermediate image to a second intermediate image, and the second intermediate image into an image field arranged in an image surface where the wafer is arranged; and, manipulating one or more of optical elements while scanning the wafer to reduce errors in the image at the image field. A concave mirror arranged in a region of a pupil surface reflects the radiation. The projection objective also includes mirrors to deflect the radiation from the object field towards the concave mirror and to deflect the radiation from the concave mirror towards the image field. The deflection mirrors are mechanically coupled to a displacement device arranged to displace the first and second deflection mirrors.

An illumination system of a microlithographic projection exposure apparatus includes a spatial light modulator which varies an intensity distribution in a pupil surface. The modulator includes an array of mirrors that reflect impinging projection light into directions that depend on control signals applied to the mirrors. A prism, which directs the projection light towards the spatial light modulator, has a double pass surface on which the projection light impinges twice, namely a first time when leaving the prism and before it is reflected by the mirrors, and a second time when entering the prism and after it has been reflected by the mirrors. A pupil perturbation suppressing mechanism is provided that reduces reflections of projection light when it impinges the first time on the double pass surface, and/or prevents that light portions being a result of such reflections contribute to the intensity distribution in the pupil surface.

An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion
n.sub.i=n.sub.i(.sub.0)n.sub.i(.sub.0+1 pm)
for a wavelength variation of 1 pm from a wavelength .sub.0. The objective satisfies the relation $\frac{.Math.\underset{i=1}{\overset{N}{.Math.}}{n}_i\left(s_i-d_i\right).Math.}{{}_0{\mathrm{NA}}^4}A$
for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where s.sub.i is a geometrical path length of a ray in an ith dioptric optical element having axial thickness d.sub.i and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.

A catadioptric microscope objective color-corrected for any wavelength in 190 nm to 1000 nm operational range and containing primary spherical front-surface mirror devoid of a through-hole and rear-surface plane-parallel mirror, each of which mirrors has a corresponding reflective annular coating defining an aperture formed in such coating coaxially with the optical axis. The objective, devoid of a Mangin element, is configured such that for any optical field with a diameter smaller than about 50 microns the Strehl ratio is no lower than 0.0781, and/or longitudinal spherical aberration is no larger than 0.0008 mm, and/or the astigmatism is smaller than 0.0005 mm, and/or distortion is smaller than 0.012 percent within the operational range.

Provided is an imaging system suitable for imaging in a broadband ultraviolet band and including a refractive-reflective lens group; a lens barrel lens group; and an optical path folding reflective assembly. The refractive-reflective lens group includes a refractive-reflective assembly, a field lens assembly and a focusing assembly, the refractive-reflective assembly focuses light onto the field lens assembly to correct chromatic aberration, then light passes the focusing assembly, the lens barrel lens group and the optical path folding reflective assembly and is then imaged on an image surface. A magnification of the imaging system is M that satisfies M=F1/F2, where F1 denotes a focal length of the refractive-reflective lens group, and F2 denotes a focal length of the lens barrel lens group. The imaging system is suitable for imaging in a broadband ultraviolet band.

An optical projection unit includes first and second optical element modules. The first optical element module includes a first housing unit and a first optical element received within the first housing unit and having an optically used first region defining a first optical axis. The second optical element module is located adjacent to the first optical element module and includes a second optical element which defines a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is laterally offset and/or inclined with respect to the first housing axis. The first housing axis is substantially collinear with the second optical axis.

Described are optical systems for a digital micromirror device (DMD) illuminator. The optical systems include a LED array, a tapered non-imaging collection optic, a reflective stop and a telecentric lens system. The telecentric lens system is disposed along an optical axis defined between the tapered non-imaging collection optic and the reflective stop. The telecentric lens system is configured as a first half of a symmetric one to one imager for an object plane on the optical axis and as a second half of the symmetric one to one imager for optical energy reflected from the reflective aperture stop. The optical systems reclaim optical energy emitted by the LED array that does not initially pass through the reflective stop and provide an improved intensity distribution at the DMD. Reductions in stray light and the thermal loads on the illuminator and DMD are achieved relative to conventional illumination systems for DMDs.

A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0 and 30.

An optical inspection system that utilizes sub-200 nm incident light beam to inspect a surface of an object for defects is described. The sub-200 nm incident light beam is generated by combining first light having a wavelength of about 1109 nm with second light having a wavelength of approximately 234 nm. An optical system includes optical components configured to direct the incident light beam to a surface of the object, and image relay optics are configured to collect and relay at least two channels of light to a sensor, where at least one channel includes light reflected from the object, and at least one channel includes light transmitted through the object. The sensor is configured to simultaneously detect both the reflected and transmitted light. A laser for generating the sub-200 nm incident light beam includes a fundamental laser, two or more harmonic generators, a frequency doubler and a two frequency mixing stages.